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公开(公告)号：US11150283B2
公开(公告)日：2021-10-19
申请号：US16743492
申请日：2020-01-15
IPC分类号： G01R25/04 , H01L21/67 , H01L21/3065 , H01J37/32 , H03J7/02
摘要： In one embodiment, a phase detection circuit includes a current signal input to receive a current signal indicative of a current amplitude of an RF signal and a voltage signal input to receive a voltage signal indicative of a voltage amplitude of the RF signal. A high-pass filter and a low-pass filter are each configured to filter one of (i) the current signal from the current signal input or (ii) the voltage signal from the voltage signal input, wherein the high-pass filter and the low-pass filter collectively cause a substantially 90 degree offset between a phase angle of the current signal and a phase angle of the voltage signal. A phase difference circuit receives the filtered current signal and the filtered voltage signal to determine a phase angle difference between the current signal and the voltage signal.
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公开(公告)号：US20200058471A1
公开(公告)日：2020-02-20
申请号：US16665778
申请日：2019-10-28
摘要： In one embodiment, an RF impedance matching circuit is disclosed. The matching circuit is coupled between a plasma chamber and an RF source providing an RF signal having a frequency. The matching circuit includes a first electronically variable capacitor having a first variable capacitance and a second electronically variable capacitor having a second variable capacitance. A control circuit determines a first parameter related to the plasma chamber, and then determines, based on the first parameter, a first capacitance value for the first electronically variable capacitor and a second capacitance value for the second electronically variable capacitor. The control circuit then generates a control signal to alter the first variable capacitance and the second variable capacitance accordingly, causing the RF power reflected back to the RF source to decrease while the frequency of the RF source is not altered.
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公开(公告)号：US10460912B2
公开(公告)日：2019-10-29
申请号：US16111776
申请日：2018-08-24
IPC分类号： H01J37/32 , H03H11/28 , H01G7/00 , H01L21/02 , H01L21/311 , H03H7/38 , H05K7/20 , H01L23/473
摘要： In one embodiment, a semiconductor processing tool includes a plasma chamber and an impedance matching circuit. The matching circuit includes a first electronically variable capacitor having a first variable capacitance, a second electronically variable capacitor having a second variable capacitance, and a control circuit. The control circuit is configured to determine a variable impedance of the plasma chamber, determine a first capacitance value for the first electronically variable capacitor and a second capacitance value for the second electronically variable capacitor, and generate a control signal to alter at least one of the first variable capacitance and the second variable capacitance to the first capacitance value and the second capacitance value, respectively. An elapsed time between determining the variable impedance of the plasma chamber to when RF power reflected back to the RF source decreases is less than about 150 μsec.
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公开(公告)号：US10431428B2
公开(公告)日：2019-10-01
申请号：US15637271
申请日：2017-06-29
IPC分类号： H01J37/32 , H03H11/28 , H01G7/00 , H01L21/02 , H01L21/311 , H03H7/38 , H05K7/20 , H01L23/473
摘要： In one embodiment, a radio frequency (RF) impedance matching network includes electronically variable capacitors (EVCs), each EVC including discrete capacitors operably coupled in parallel. The discrete capacitors include fine capacitors each having a capacitance value substantially similar to a fine capacitance value, and coarse capacitors each having a capacitance value substantially similar to a coarse capacitance value. The increase of the variable total capacitance of each EVC is achieved by switching in more of the coarse capacitors or more of the fine capacitors than are already switched in without switching out a coarse capacitor that is already switched in.
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公开(公告)号：US10984986B2
公开(公告)日：2021-04-20
申请号：US16654788
申请日：2019-10-16
IPC分类号： H01J37/32 , H03H7/38 , H01L21/3213
摘要： In one embodiment, an RF impedance matching network for a plasma chamber is disclosed. The matching network includes at least one electronically variable capacitor (EVC), each EVC comprising discrete capacitors each having a corresponding switching circuit. Each switching circuit is configured to switch in and out its corresponding discrete capacitor to alter a total capacitance of the EVC. Each switching circuit include a first diode operably coupled to the discrete capacitor, a capacitor coupled in series with the first diode, and a second diode operably coupled to the discrete capacitor. The second diode parallel to the first diode and the capacitor coupled in series.
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公开(公告)号：US10692699B2
公开(公告)日：2020-06-23
申请号：US16415764
申请日：2019-05-17
摘要： In one embodiment, an RF impedance matching network for a plasma chamber is disclosed. It includes a variable capacitor comprising a plurality of capacitors comprising first coarse capacitors each having a substantially similar first coarse capacitance, second coarse capacitors each having a substantially similar second coarse capacitance, and fine capacitors having different capacitances that increase in value. At least one of the fine capacitors has a capacitance greater than the first coarse capacitance. A control circuit is configured cause a gradual increase in the total capacitance of the variable capacitor by switching in, in a predetermined order, each of the first coarse capacitors, followed by each of the second coarse capacitors, only switching in the fine capacitors whose capacitance is less than a capacitance of a next coarse capacitor of the coarse capacitors predetermined to be switched in next.
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公开(公告)号：US10679824B2
公开(公告)日：2020-06-09
申请号：US15450495
申请日：2017-03-06
IPC分类号： H01J37/32 , H03H11/28 , H03H7/38 , H01L21/02 , H01L21/285 , H01L21/3065 , H01L21/311 , H01L21/3213 , H01L21/67
摘要： In one embodiment, the invention can be a variable capacitor that includes a plurality of capacitors operably coupled in parallel, and a plurality of switches coupled in series with corresponding capacitors. The plurality of capacitors can include first capacitors increasing in capacitance, and second capacitors having a substantially similar capacitance. Further, for each first capacitor increasing in capacitance, the change to the total capacitance that is provided by the first capacitor when its corresponding switch is closed can increase by a factor of about two.
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公开(公告)号：US20180076788A1
公开(公告)日：2018-03-15
申请号：US15816351
申请日：2017-11-17
CPC分类号： H03H7/38 , H01F27/18 , H01F27/28 , H01J37/3211 , H01J37/32174 , H01J37/32183 , H01J2237/002 , H05K7/20154 , H05K7/20172 , H05K7/20336
摘要： In one embodiment, the invention may be an impedance matching network including an input configured to operably couple to a radio frequency source, an output configured to operably couple to a load, and a first variable capacitor. The matching network may further include an inductor formed from a heat pipe that is wound in a three-dimensional shape. A first heat sink may be coupled adjacent to a first end of the heat pipe, and a second heat sink may be coupled adjacent to a second, opposite end of the heat pipe.
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公开(公告)号：US11521831B2
公开(公告)日：2022-12-06
申请号：US16879969
申请日：2020-05-21
摘要： In one embodiment, the present disclosure is directed to a method for impedance matching. A matching network includes a first reactance element and a second reactance element. A sensor detects a value related to the plasma chamber or the matching network, and a system parameter is determined based on the detected value. For the determined system parameter, an error-related value is calculated for each of a plurality of potential first reactance element positions or for each of a plurality of potential second reactance element positions. A new first reactance element position and a new second reactance element position are calculated based on the error-related values calculated in the prior step. The first reactance element and the second reactance element are then altered to their new positions to reduce a reflected power.
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公开(公告)号：US11195698B2
公开(公告)日：2021-12-07
申请号：US16922228
申请日：2020-07-07
IPC分类号： H01J37/32 , H03H11/28 , H01G7/00 , H01L21/02 , H01L21/311 , H03H7/38 , H05K7/20 , H01L23/473
摘要： In one embodiment, an RF impedance matching network utilizing at least one electronically variable capacitors (EVC) is disclosed. Each EVC includes discrete capacitors operably coupled in parallel, the discrete capacitors including fine capacitors and coarse capacitors. A control circuit determines a parameter related to the plasma chamber and, based on the parameter, determines which of the coarse capacitors and which of the fine capacitors to have switched in to cause an impedance match. The increase of the variable total capacitance of each EVC is achieved by switching in more of the coarse capacitors or more of the fine capacitors than are already switched in without switching out a coarse capacitor that is already switched in.
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