摘要:
Provided is a novel system for delivery of a gas from a liquefied state. The system includes: (a) a cabinet having a first and second panel disposed therein; (b) at least one compressed liquefied gas cylinder corresponding to each panel disposed in the cabinet; (c) temperature and/or pressure sensors disposed on each the cylinder; and (d) a controller for monitoring and adjusting the energy input into each of the cylinders based on the temperature and/or pressure in each of the cylinders sensed by the temperature and/or pressure sensors.
摘要:
Provided is a portable system useful for sampling both particulate and vapor phase metallic impurities from gases that cannot by hydrolyzed. The system comprises valves for introducing and controlling the exhaust of the gas to be sampled from the system. The metallic impurities are entrapped on filters, with one filter being operated at ambient temperature to remove particulate metallic impurities, and with another filter being operated at a temperature below ambient in order to remove vapor phase metallic impurities. In operating the system, the system is first back-filled to create a pressure equilibrium across the valve which introduces the gas to the first filter means. The flow of gas through the entire sampling system is controlled by means of a critical orifice located between the filters and the valve for controlling exhaust of the gas from the system. The entire system is portable and allows for transport of the system with its filters to a laboratory in order to permit the most sophisticated and effective analysis of the metallic impurities in the filters under controlled laboratory conditions.
摘要:
A device and a method for its use for the removal of contaminants from a gas cylinder valve assembly. The valve assembly output is fed to the device which in turn has inlet and outlet connections to receive and to pass purge gas therethrough. The device is sized and positioned so that contaminants can be purged and a vacuum drawn from the gas cylinder valve assembly at the assembly location itself thus increasing the efficiency of contaminant removal.
摘要:
Disclosed herein is an apparatus for providing a chemical gas comprising a fabrication plant, a first vessel having a volume and proximate to the fabrication plant, the first vessel adapted to receive a liquefied chemical gas and to communicate a vaporized chemical gas to the fabrication plant, a source container located at a distance from the fabrication plant, the source container having a volume and adapted to communicate a liquefied chemical gas to the first vessel, and wherein the source container volume is substantially larger than the first vessel volume. Other embodiments and methods are described herein.
摘要:
Provided is a portable system useful for sampling both particulate and vapor phase metallic impurities from gases that cannot by hydrolyzed. The system comprises a valve for introducing and controlling the exhaust of the gas to be sampled from the system. The metallic impurities are entrapped on a filter, with one filter being operated at ambient temperature to remove particulate metallic impurities, and with another filter being operated at a temperature below ambient in order to remove vapor phase metallic impurities. In operating the system, the system is first back-filled to create a pressure equilibrium across the valve which introduces the gas to the first filter. The flow of gas through the entire sampling system is controlled by means of a critical orifice located between the filter and the valve for controlling exhaust of the gas from the system. The entire system is portable and allows for transport of the system with its filters to a laboratory in order to permit the most sophisticated and effective analysis of the metallic impurities in the filters under controlled laboratory conditions.
摘要:
A system for analyzing particles from compressed gas. The system employs a back-filling technique to slowly balance the pressures on both sides of a control valve before operation. Use of a critical orifice as a flow control device for compressed gases of varying pressure is employed to provide a constant volumetric flow rate and thus a constant residence time within an impurity sensor.
摘要:
A system and a method for analyzing impurities in compressed gas, a method for controlling the particle growth in the monitored gas and a method for determining the optimum monitoring temperature for an individual gas are disclosed.
摘要:
A system and a method for analyzing impurities in compressed gas, a method for controlling the particle growth in the monitored gas and a method for determining the optimum monitoring temperature for an individual gas are disclosed. The system includes a source of compressed gas, a sensor for measuring particle impurity within the gas, a temperature controller for controlling the temperature of the gas prior to said gas entering the sensor, with the temperature being controlled to eliminate particle formation from molecular clustering and condensation, and a pressure balancer.
摘要:
Disclosed herein is an apparatus for supplying a liquefied chemical gas comprising a vaporizer disposed within a fabrication plant, the vaporizer adapted to receive the liquefied chemical gas and output a vaporized chemical gas, a purge vessel connected to and in fluid communication with the vaporizer, and wherein the vaporizer is adapted to purge a volume of the liquefied chemical gas and the purge vessel is adapted to receive the volume of liquefied chemical gas. Other embodiments and methods are described herein.
摘要:
Provided is a novel system and method for delivery of gas from a liquefied state. The system includes (a) a delivery vessel holding a bulk quantity of liquefied gas therein; (b) a heat exchanger disposed on the delivery vessel to provide or remove energy from the liquefied gas only; and (c) a pressure controller for monitoring and adjusting the energy delivered to the vessel. The system and method allow for controlled delivery of liquefied gas from a delivery vessel at a predetermined flow rate. Particular applicability is found in the delivery of gases to semiconductor process tools.