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公开(公告)号:US20130033548A1
公开(公告)日:2013-02-07
申请号:US13640241
申请日:2010-04-09
申请人: Rio Rivas , Siddhartha Bhowmik , Ed Friesen
发明人: Rio Rivas , Siddhartha Bhowmik , Ed Friesen
CPC分类号: B41J2/05 , B41J2/1404 , B41J2/14145
摘要: Thermal inkjet print head, comprising a fluid feed channel for delivering fluid, fluid chambers arranged near the fluid feed channel for receiving fluid from the fluid feed channel, resistors for actuating the fluid in the chambers, arranged in a staggered pattern with respect to a fluid feed channel wall, and a cantilever extending over the fluid feed channel wall, having a staggered edge that follows the staggered pattern of the resistors.
摘要翻译: 热喷墨打印头,包括用于输送流体的流体供给通道,布置在流体供给通道附近的流体室,用于从流体供给通道接收流体,用于致动腔室中的流体的电阻器,其以相对于流体的交错图案布置 进料通道壁和在流体供给通道壁上延伸的悬臂,具有跟随电阻器的交错图案的交错边缘。
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公开(公告)号:US08714710B2
公开(公告)日:2014-05-06
申请号:US13640241
申请日:2010-04-09
申请人: Rio Rivas , Siddhartha Bhowmik , Ed Friesen
发明人: Rio Rivas , Siddhartha Bhowmik , Ed Friesen
IPC分类号: B41J2/05
CPC分类号: B41J2/05 , B41J2/1404 , B41J2/14145
摘要: Thermal inkjet print head, comprising a fluid feed channel for delivering fluid, fluid chambers arranged near the fluid feed channel for receiving fluid from the fluid feed channel, resistors for actuating the fluid in the chambers, arranged in a staggered pattern with respect to a fluid feed channel wall, and a cantilever extending over the fluid feed channel wall, having a staggered edge that follows the staggered pattern of the resistors.
摘要翻译: 热喷墨打印头,包括用于输送流体的流体供给通道,布置在流体供给通道附近的流体室,用于从流体供给通道接收流体,用于致动腔室中的流体的电阻器,其以相对于流体的交错图案布置 进料通道壁和在流体供给通道壁上延伸的悬臂,具有跟随电阻器的交错图案的交错边缘。
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公开(公告)号:US08585180B2
公开(公告)日:2013-11-19
申请号:US13389709
申请日:2009-10-28
IPC分类号: B41J2/135
CPC分类号: B41J2/135 , B41J2/1404 , B41J2/1603 , B41J2/1623 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1646 , B41J2/17563
摘要: A method of method of making a corrosion resistant print head die comprises creating a self-ionized plasma (SIP) of a coating material; establishing a bias on a print head die comprising a plurality of feed slots (40), each feed slot (40) comprising side wall surfaces (61); and causing the coating material plasma to be deposited on the surfaces to form a protective coating, wherein at least a portion of the coating material is deposited on at least a portion of the surfaces by resputtering. In some cases, the feed slots have an aspect ratio greater than 2. In some cases, the feed slot comprises at least one rib (41), each rib (41) comprising a top surface (68), two side surfaces (66), and an under surface (69), and the formed protective coating is deposited on the top surface (68), two side surfaces (66), and under surface (69) of each rib (41).
摘要翻译: 一种制造耐腐蚀印刷头模头的方法包括制造涂覆材料的自离子等离子体(SIP); 在包括多个进料槽(40)的打印头模头上建立偏压,每个进料槽(40)包括侧壁表面(61); 并且使涂层材料等离子体沉积在表面上以形成保护涂层,其中至少一部分涂层材料通过再溅射沉积在表面的至少一部分上。 在一些情况下,进料槽包括至少一个肋(41),每个肋(41)包括顶表面(68),两个侧表面(66) 和下表面(69),并且形成的保护涂层沉积在每个肋(41)的顶表面(68),两个侧表面(66)和下表面(69)处。
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公开(公告)号:US08333459B2
公开(公告)日:2012-12-18
申请号:US12933218
申请日:2008-04-29
申请人: Rio Rivas , Jon A. Crabtree , Eric L. Nikkel , Siddhartha Bhowmik , Bradley D. Chung , Samson Berhane
发明人: Rio Rivas , Jon A. Crabtree , Eric L. Nikkel , Siddhartha Bhowmik , Bradley D. Chung , Samson Berhane
IPC分类号: B41J2/135
CPC分类号: B41J2/1606 , B41J2/1603 , B41J2/1628 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1642 , B41J2/1643 , Y10T29/49401 , Y10T428/277
摘要: A printing device (10) including a substrate (22) having an aperture (20) extending therethrough, wherein the aperture includes a side wall and defines a liquid ink flow path, an ink firing chamber (24) fluidically connected to the aperture, and a coating positioned on the side wall of the aperture, the coating being impervious to etching by liquid ink, and wherein the coating is chosen from one of silicon dioxide, aluminum oxide, hafnium oxide and silicon nitride.
摘要翻译: 一种包括具有延伸穿过其中的孔(20)的基底(22)的印刷装置(10),其中所述孔包括侧壁并限定液体墨流动路径,与所述孔流体连接的喷墨室(24),以及 位于所述孔的侧壁上的涂层,所述涂层不受液体油墨的蚀刻,并且其中所述涂层选自二氧化硅,氧化铝,氧化铪和氮化硅之一。
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公开(公告)号:US08573740B2
公开(公告)日:2013-11-05
申请号:US13640239
申请日:2010-04-09
申请人: Rio Rivas , Robert Messenger , Becky Clark , Rob Pugliese , Siddhartha Bhowmik
发明人: Rio Rivas , Robert Messenger , Becky Clark , Rob Pugliese , Siddhartha Bhowmik
IPC分类号: B41J2/135
CPC分类号: B41J2/135 , B41J2/1603 , B41J2/1606 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1634 , B41J2/1639 , B41J2/1642 , B41J2/1645
摘要: Manufacturing method for an inkjet print head, comprising forming a nozzle layer onto a substrate, depositing an LSE (low surface energy) coating onto the nozzle layer, depositing a sacrificial film onto the LSE coating, post processing the substrate, and removing the sacrificial film from the LSE coating, the LSE coating having a water contact angle of at least 50° after removal of the sacrificial film.
摘要翻译: 喷墨打印头的制造方法,包括在基材上形成喷嘴层,在喷嘴层上沉积LSE(低表面能)涂层,在LSE涂层上沉积牺牲膜,对基材进行后处理,并除去牺牲膜 从LSE涂层中,LSE涂层在去除牺牲膜之后具有至少50°的水接触角。
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公开(公告)号:US20120139997A1
公开(公告)日:2012-06-07
申请号:US13389709
申请日:2009-10-28
CPC分类号: B41J2/135 , B41J2/1404 , B41J2/1603 , B41J2/1623 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1646 , B41J2/17563
摘要: A method of method of making a corrosion resistant print head die comprises creating a self-ionized plasma (SIP) of a coating material; establishing a bias on a print head die comprising a plurality of feed slots (40), each feed slot (40) comprising side wall surfaces (61); and causing the coating material plasma to be deposited on the surfaces to form a protective coating, wherein at least a portion of the coating material is deposited on at least a portion of the surfaces by resputtering. In some cases, the feed slots have an aspect ratio greater than 2. In some cases, the feed slot comprises at least one rib (41), each rib (41) comprising a top surface (68), two side surfaces (66), and an under surface (69), and the formed protective coating is deposited on the top surface (68), two side surfaces (66), and under surface (69) of each rib (41).
摘要翻译: 一种制造耐腐蚀印刷头模头的方法包括制造涂覆材料的自离子等离子体(SIP); 在包括多个进料槽(40)的打印头模头上建立偏压,每个进料槽(40)包括侧壁表面(61); 并且使涂层材料等离子体沉积在表面上以形成保护涂层,其中至少一部分涂层材料通过再溅射沉积在表面的至少一部分上。 在一些情况下,进料槽包括至少一个肋(41),每个肋(41)包括顶表面(68),两个侧表面(66) 和下表面(69),并且形成的保护涂层沉积在每个肋(41)的顶表面(68),两个侧表面(66)和下表面(69)处。
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公开(公告)号:US20110018938A1
公开(公告)日:2011-01-27
申请号:US12933218
申请日:2008-04-29
申请人: Rio Rivas , Jon A. Crabtree , Eric L. Nikkel , Siddhartha Bhowmik , Bradley D. Chung , Samson Berhane
发明人: Rio Rivas , Jon A. Crabtree , Eric L. Nikkel , Siddhartha Bhowmik , Bradley D. Chung , Samson Berhane
CPC分类号: B41J2/1606 , B41J2/1603 , B41J2/1628 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1642 , B41J2/1643 , Y10T29/49401 , Y10T428/277
摘要: A printing device (10) including a substrate (22) having an aperture (20) extending therethrough, wherein the aperture includes a side wall and defines a liquid ink flow path, an ink firing chamber (24) fluidically connected to the aperture, and a coating positioned on the side wall of the aperture, the coating being impervious to etching by liquid ink, and wherein the coating is chosen from one of silicon dioxide, aluminum oxide, hafnium oxide and silicon nitride.
摘要翻译: 一种包括具有延伸穿过其中的孔(20)的基底(22)的印刷装置(10),其中所述孔包括侧壁并限定液体墨流动路径,与所述孔流体连接的喷墨室(24),以及 位于所述孔的侧壁上的涂层,所述涂层不受液体油墨的蚀刻,并且其中所述涂层选自二氧化硅,氧化铝,氧化铪和氮化硅之一。
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公开(公告)号:US20130027471A1
公开(公告)日:2013-01-31
申请号:US13640239
申请日:2010-04-09
申请人: Rio Rivas , Robert Messenger , Becky Clark , Rob Pugliese , Siddhartha Bhowmik
发明人: Rio Rivas , Robert Messenger , Becky Clark , Rob Pugliese , Siddhartha Bhowmik
CPC分类号: B41J2/135 , B41J2/1603 , B41J2/1606 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1634 , B41J2/1639 , B41J2/1642 , B41J2/1645
摘要: Manufacturing method for an inkjet print head, comprising forming a nozzle layer onto a substrate, depositing an LSE (low surface energy) coating onto the nozzle layer, depositing a sacrificial film onto the LSE coating, post processing the substrate, and removing the sacrificial film from the LSE coating, the LSE coating having a water contact angle of at least 50° after removal of the sacrificial film.
摘要翻译: 喷墨打印头的制造方法,包括在基材上形成喷嘴层,在喷嘴层上沉积LSE(低表面能)涂层,在LSE涂层上沉积牺牲膜,对基材进行后处理,并除去牺牲膜 从LSE涂层中,LSE涂层在去除牺牲膜之后具有至少50°的水接触角。
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公开(公告)号:US09463485B2
公开(公告)日:2016-10-11
申请号:US14375672
申请日:2012-04-24
申请人: Rio Rivas , Corey Deyo , Ed Friesen
发明人: Rio Rivas , Corey Deyo , Ed Friesen
CPC分类号: B05B17/0615 , B23K26/361 , B23K26/362 , B41J2/1601 , B41J2/1603 , B41J2/1607 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1634 , B41J2/164 , B41J2/1642 , B41J2/17553
摘要: A method of forming a substrate for a fluid ejection device includes forming an opening through the substrate, with the opening having a long axis profile and a short axis profile, and with the long axis profile including a first portion extending from a minimum dimension of the long axis profile to a first side of the substrate, and a second portion including and extending from the minimum dimension of the long axis profile to a second side of the substrate opposite the first side. The method also includes forming a protective layer on sidewalls of the second portion of the long axis profile of the opening and excluding the protective layer from sidewalls of the first portion of the long axis profile of the opening.
摘要翻译: 一种形成用于流体喷射装置的基板的方法包括:通过所述基板形成开口,所述开口具有长轴轮廓和短轴轮廓,并且所述长轴轮廓包括从所述基板的最小尺寸延伸的第一部分 长轴轮廓到所述基底的第一侧,以及第二部分,其包括并从所述长轴轮廓的最小尺寸延伸到所述基底的与所述第一侧相对的第二侧。 该方法还包括在开口的长轴轮廓的第二部分的侧壁上形成保护层,并且从开口的长轴轮廓的第一部分的侧壁排除保护层。
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公开(公告)号:US09352568B2
公开(公告)日:2016-05-31
申请号:US14397151
申请日:2012-07-24
申请人: Rio Rivas , Ed Friesen , Kellie Susanne Jensen
发明人: Rio Rivas , Ed Friesen , Kellie Susanne Jensen
CPC分类号: B41J2/14427 , B41J2/1404 , B41J2/14201 , B41J2/1433 , B41J2002/14403 , B41J2002/14467
摘要: In an embodiment, a fluid ejection device includes a thin-film layer formed over a substrate, a chamber layer formed over the thin-film layer, the chamber layer defining a fluidic channel that leads to a firing chamber, a slot extending through the substrate and into the chamber layer through an ink feed hole in the thin-film layer, and a particle tolerant thin-film extension of the thin-film layer that protrudes into the slot from between the substrate and the chamber layer.
摘要翻译: 在一个实施例中,流体喷射装置包括在衬底上形成的薄膜层,形成在薄膜层上的室层,室层限定通向烧制室的流体通道,延伸穿过衬底的槽 并通过薄膜层中的供墨孔进入腔室层,以及从衬底和室层之间突出到槽中的薄膜层的耐粒子薄膜延伸。
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