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公开(公告)号：US08416526B2
公开(公告)日：2013-04-09
申请号：US12555716
申请日：2009-09-08
申请人： Robert G. Biskeborn , Cherngye Hwang , Jason Liang , Calvin S. Lo
发明人： Robert G. Biskeborn , Cherngye Hwang , Jason Liang , Calvin S. Lo
IPC分类号： G11B5/187
CPC分类号： G11B5/187 , G11B5/00826 , G11B5/102 , G11B5/255 , G11B5/3106 , Y10T29/49048 , Y10T428/11
摘要： A method according to one embodiment includes contacting an oxidant with an AlTiC portion of a magnetic head for recessing TiC grains of the AlTiC portion. A method according to another embodiment includes contacting a peroxide with an AlTiC portion of a magnetic head for recessing TiC grains of the AlTiC portion from a media bearing surface of the AlTiC portion. A magnetic head according to yet another embodiment includes an AlTiC portion having a media bearing surface; and a thin film portion coupled to the AlTiC portion, wherein TiC grains of the AlTiC portion are recessed from the media bearing surface.
摘要翻译： 根据一个实施方案的方法包括使氧化剂与磁头的AlTiC部分接触，以使AlTiC部分的TiC晶粒凹陷。 根据另一个实施方案的方法包括使过氧化物与磁头的AlTiC部分接触，用于从AlTiC部分的介质承载表面凹入AlTiC部分的TiC晶粒。 根据又一实施例的磁头包括具有介质承载表面的AlTiC部分; 以及耦合到AlTiC部分的薄膜部分，其中AlTiC部分的TiC晶粒从介质承载表面凹陷。
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公开(公告)号：US20110059336A1
公开(公告)日：2011-03-10
申请号：US12555716
申请日：2009-09-08
申请人： Robert G. Biskeborn , Cherngye Hwang , Jason Liang , Calvin S. Lo
发明人： Robert G. Biskeborn , Cherngye Hwang , Jason Liang , Calvin S. Lo
CPC分类号： G11B5/187 , G11B5/00826 , G11B5/102 , G11B5/255 , G11B5/3106 , Y10T29/49048 , Y10T428/11
摘要： A method according to one embodiment includes contacting an oxidant with an AlTiC portion of a magnetic head for recessing TiC grains of the AlTiC portion. A method according to another embodiment includes contacting a peroxide with an AlTiC portion of a magnetic head for recessing TiC grains of the AlTiC portion from a media bearing surface of the AlTiC portion. A magnetic head according to yet another embodiment includes an AlTiC portion having a media bearing surface; and a thin film portion coupled to the AlTiC portion, wherein TiC grains of the AlTiC portion are recessed from the media bearing surface.
摘要翻译： 根据一个实施方案的方法包括使氧化剂与磁头的AlTiC部分接触，以使AlTiC部分的TiC晶粒凹陷。 根据另一个实施方案的方法包括使过氧化物与磁头的AlTiC部分接触，用于从AlTiC部分的介质承载表面凹入AlTiC部分的TiC晶粒。 根据又一实施例的磁头包括具有介质承载表面的AlTiC部分; 以及耦合到AlTiC部分的薄膜部分，其中AlTiC部分的TiC晶粒从介质承载表面凹陷。
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公开(公告)号：US09349395B2
公开(公告)日：2016-05-24
申请号：US13601739
申请日：2012-08-31
CPC分类号： H01J37/32825 , G11B5/3163 , H01J37/32816 , H01J37/3411 , H01J2237/334
摘要： A method according to one embodiment includes placing a substrate in a chamber; and plasma sputtering the substrate in a presence of a non-zero pressure of a vapor, wherein the vapor at the non-zero pressure is effective to diminish an etch rate of a first material of the substrate. A plasma sputtering apparatus according to one embodiment includes a chamber; a reservoir in the chamber for releasing a vapor at an established rate; a mount for a substrate; and a plasma source.
摘要翻译： 根据一个实施例的方法包括将衬底放置在腔室中; 以及在非零压力蒸汽的存在下等离子体溅射所述衬底，其中所述非零压力下的蒸气有效地降低所述衬底的第一材料的蚀刻速率。 根据一个实施例的等离子体溅射装置包括室; 用于以确定的速率释放蒸气的室中的储存器; 用于衬底的安装件; 和等离子体源。
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公开(公告)号：US20140061033A1
公开(公告)日：2014-03-06
申请号：US13601739
申请日：2012-08-31
CPC分类号： H01J37/32825 , G11B5/3163 , H01J37/32816 , H01J37/3411 , H01J2237/334
摘要： A method according to one embodiment includes placing a substrate in a chamber; and plasma sputtering the substrate in a presence of a non-zero pressure of a vapor, wherein the vapor at the non-zero pressure is effective to diminish an etch rate of a first material of the substrate. A plasma sputtering apparatus according to one embodiment includes a chamber; a reservoir in the chamber for releasing a vapor at an established rate; a mount for a substrate; and a plasma source.
摘要翻译： 根据一个实施例的方法包括将衬底放置在腔室中; 以及在非零压力蒸汽的存在下等离子体溅射所述衬底，其中所述非零压力下的蒸气有效地降低所述衬底的第一材料的蚀刻速率。 根据一个实施例的等离子体溅射装置包括室; 用于以确定的速率释放蒸气的室中的储存器; 用于衬底的安装件; 和等离子体源。
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公开(公告)号：US08191234B2
公开(公告)日：2012-06-05
申请号：US12184357
申请日：2008-08-01
CPC分类号： G11B5/3106 , G11B5/3163 , G11B5/3169 , Y10T29/49039 , Y10T29/49041 , Y10T29/49048
摘要： A method for protecting a thin film structure including fabricating a plurality of island structures in a recording gap of a magnetic recording head, exposing a substantial portion of the plurality of island structures by removing at least a portion of the surrounding recording gap material via at least one etching process, including ion milling, coating the magnetic recording head containing the plurality of island structures with a coating material, including silicon nitride or aluminum oxide, and removing at least a portion of the coating material via a removal process, including chemical-mechanical polishing or lapping, to expose an uppermost region of at least a portion of said plurality of island structures.
摘要翻译： 一种用于保护薄膜结构的方法，包括在磁记录头的记录间隙中制造多个岛状结构，通过至少除去周围的记录间隙材料的至少一部分而暴露多个岛结构的大部分 一个蚀刻工艺，包括离子铣削，用包括氮化硅或氧化铝的涂层材料涂覆包含多个岛状结构的磁记录头，以及通过去除工艺去除至少一部分涂层材料，包括化学机械 抛光或研磨，以暴露所述多个岛结构的至少一部分的最上部区域。
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公开(公告)号：US20110256423A1
公开(公告)日：2011-10-20
申请号：US12761394
申请日：2010-04-16
CPC分类号： G11B5/255 , G11B5/127 , G11B5/3106 , G11B5/3133
摘要： A magnetic head produced at low ambient temperatures that comprise a crystalline alumina layer for increasing the durability of the head is provided. According to one embodiment, a magnetic head for at least one of reading and writing data on to a magnetic data storage media. The magnetic head comprises a substrate, an at least partially crystalline alumina layer formed on the substrate, at least one of a write transducer and a read transducer formed on the substrate, and a surface for engaging the magnetic data storage media. In another embodiment, a method for forming an at least partially crystalline alumina film. The method comprises providing a substrate, and depositing alumina onto the substrate at an ambient temperature to form the at least partially crystalline alumina film.
摘要翻译： 提供了一种在低环境温度下产生的包含结晶氧化铝层以提高头部耐久性的磁头。 根据一个实施例，一种用于读取和写入数据到磁数据存储介质中的至少一个的磁头。 磁头包括衬底，形成在衬底上的至少部分结晶的氧化铝层，形成在衬底上的写换能器和读换能器中的至少一个以及用于接合磁数据存储介质的表面。 在另一个实施方案中，形成至少部分结晶的氧化铝膜的方法。 该方法包括在环境温度下提供衬底和将氧化铝沉积到衬底上以形成至少部分结晶的氧化铝膜。
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公开(公告)号：US08679733B2
公开(公告)日：2014-03-25
申请号：US13009758
申请日：2011-01-19
IPC分类号： G03F7/20
CPC分类号： G03F1/54 , G03F1/50 , G03F7/703 , G11B5/1871 , G11B5/255 , G11B5/3106 , G11B5/60
摘要： A method according to one embodiment includes applying a photoresist to a substrate; exposing the photoresist such that a local intensity of radiation applied to the photoresist at each pixel thereof is a function of a mathematically-generated representation of a target surface shape; developing the resist; and performing a subtractive process on the developed photoresist and the substrate for creating the target surface shape on the substrate. A method according to another embodiment includes applying a photoresist to a substrate; patterning the photoresist using a machine-readable profile; and performing a subtractive process to transfer the profile onto the substrate.
摘要翻译： 根据一个实施方案的方法包括将光致抗蚀剂施加到基底上; 暴露光致抗蚀剂，使得在其每个像素处施加到光致抗蚀剂的局部辐射强度是目标表面形状的数学生成表示的函数; 开发抗蚀剂; 以及在显影的光致抗蚀剂和基板上进行减影处理，以在基板上产生目标表面形状。 根据另一实施例的方法包括将光致抗蚀剂施加到基底; 使用机器可读轮廓图案化光致抗蚀剂; 以及执行减去处理以将轮廓转移到基底上。
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公开(公告)号：US08526137B2
公开(公告)日：2013-09-03
申请号：US12761394
申请日：2010-04-16
IPC分类号： G11B5/187
CPC分类号： G11B5/255 , G11B5/127 , G11B5/3106 , G11B5/3133
摘要： A magnetic head produced at low ambient temperatures that comprise a crystalline alumina layer for increasing the durability of the head is provided. According to one embodiment, a magnetic head for at least one of reading and writing data on to a magnetic data storage media. The magnetic head comprises a substrate, an at least partially crystalline alumina layer formed on the substrate, at least one of a write transducer and a read transducer formed on the substrate, and a surface for engaging the magnetic data storage media. In another embodiment, a method for forming an at least partially crystalline alumina film. The method comprises providing a substrate, and depositing alumina onto the substrate at an ambient temperature to form the at least partially crystalline alumina film.
摘要翻译： 提供了一种在低环境温度下产生的包含结晶氧化铝层以提高头部耐用性的磁头。 根据一个实施例，一种用于读取和写入数据到磁数据存储介质中的至少一个的磁头。 磁头包括衬底，形成在衬底上的至少部分结晶的氧化铝层，形成在衬底上的写换能器和读换能器中的至少一个以及用于接合磁数据存储介质的表面。 在另一个实施方案中，形成至少部分结晶的氧化铝膜的方法。 该方法包括在环境温度下提供衬底和将氧化铝沉积到衬底上以形成至少部分结晶的氧化铝膜。
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公开(公告)号：US08444865B2
公开(公告)日：2013-05-21
申请号：US12193107
申请日：2008-08-18
IPC分类号： G11B5/3163
CPC分类号： G11B5/3106 , G11B5/3169
摘要： A method for encapsulating a magnetic recording head including coating at least a portion of a magnetic recording head containing a recording gap with a first layer of at least one coating material, including silicon nitride, the first layer of at least one coating material having a first removal rate, coating at least a portion of the magnetic recording head containing a recording gap and coated with the first layer of at least one coating material with a second layer of at least one coating material, including aluminum oxide, the second layer of at least one coating material having a second removal rate higher than the first removal rate, and removing at least a portion of the second layer of at least one coating material via a removal process, including chemical-mechanical polishing, lapping, or vacuum processing to at least partially planarize the surface of the recording gap.
摘要翻译： 一种用于封装磁记录头的方法，包括将包含记录间隙的磁记录头的至少一部分涂覆至少一层包括氮化硅的涂层材料的第一层，至少一层涂料的第一层具有第一层 涂覆至少一部分包含记录间隙的磁记录头并涂覆有第一层至少一种涂层材料的第二层至少一层包括氧化铝的涂层材料，至少第二层 一个涂层材料具有高于第一去除速率的第二去除速率，以及通过去除工艺去除至少一部分至少一种涂层材料的第二层，包括化学机械抛光，研磨或真空处理至少 部分平面化记录间隙的表面。
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公开(公告)号：US20100027163A1
公开(公告)日：2010-02-04
申请号：US12184357
申请日：2008-08-01
IPC分类号： G11B5/127
CPC分类号： G11B5/3106 , G11B5/3163 , G11B5/3169 , Y10T29/49039 , Y10T29/49041 , Y10T29/49048
摘要： A method for protecting a thin film structure including fabricating a plurality of island structures in a recording gap of a magnetic recording head, exposing a substantial portion of the plurality of island structures by removing at least a portion of the surrounding recording gap material via at least one etching process, including ion milling, coating the magnetic recording head containing the plurality of island structures with a coating material, including silicon nitride or aluminum oxide, and removing at least a portion of the coating material via a removal process, including chemical-mechanical polishing or lapping, to expose an uppermost region of at least a portion of said plurality of island structures.
摘要翻译： 一种用于保护薄膜结构的方法，包括在磁记录头的记录间隙中制造多个岛状结构，通过至少除去周围的记录间隙材料的至少一部分而暴露多个岛结构的大部分 一个蚀刻工艺，包括离子铣削，用包括氮化硅或氧化铝的涂层材料涂覆包含多个岛状结构的磁记录头，以及通过去除工艺去除至少一部分涂层材料，包括化学机械 抛光或研磨，以暴露所述多个岛结构的至少一部分的最上部区域。
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