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公开(公告)号：US07147983B1
公开(公告)日：2006-12-12
申请号：US08726613
申请日：1996-10-07
申请人： James Michael Mori , James W. Thackeray , Roger F. Sinta , Rosemary Bell , Robin L. Miller-Fahey , Timothy G. Adams , Thomas M. Zydowsky , Edward K. Pavelchek , Manuel doCanto
发明人： James Michael Mori , James W. Thackeray , Roger F. Sinta , Rosemary Bell , Robin L. Miller-Fahey , Timothy G. Adams , Thomas M. Zydowsky , Edward K. Pavelchek , Manuel doCanto
IPC分类号： G03F7/04
CPC分类号： G03F7/091 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111 , Y10S430/127
摘要： The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.
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公开(公告)号：US5886102A
公开(公告)日：1999-03-23
申请号：US665019
申请日：1996-06-11
IPC分类号： G03F7/11 , C09D5/00 , C09D7/12 , C09D133/14 , C09D201/02 , G02B1/11 , G03F7/09 , H01L21/027 , C08L33/04 , C08L33/08 , C08L33/10
CPC分类号： G03F7/091
摘要： The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly for deep UV applications. The ARCs of the invention in general comprise a crosslinker and novel ARC resin binders that effectively absorb reflected deep UV exposure radiation.
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公开(公告)号：US20090220888A1
公开(公告)日：2009-09-03
申请号：US12316578
申请日：2008-12-12
申请人： James Michael Mori , James W. Thackeray , Roger F. Sinta , Rosemary Bell , Robin L. Miller-Fahey , Timothy G. Adams , Thomas M. Zydowsky , Edward K. Pavelchek , Manual doCanto
发明人： James Michael Mori , James W. Thackeray , Roger F. Sinta , Rosemary Bell , Robin L. Miller-Fahey , Timothy G. Adams , Thomas M. Zydowsky , Edward K. Pavelchek , Manual doCanto
IPC分类号： G03F7/004
CPC分类号： G03F7/091 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111 , Y10S430/127
摘要： The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.
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公开(公告)号：US06033830A
公开(公告)日：2000-03-07
申请号：US966006
申请日：1997-11-07
IPC分类号： G03F7/11 , C09D5/00 , C09D7/12 , C09D133/14 , C09D201/02 , G02B1/11 , G03F7/09 , H01L21/027 , G03F7/38
CPC分类号： G03F7/091
摘要： The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly for deep UV applications. The ARCs of the invention in general comprise a crosslinker and novel ARC resin binders that effectively absorb reflected deep UV exposure radiation.
摘要翻译： 本发明提供适合用作抗反射组合物（ARC）的新的光吸收交联组合物，特别是用于深UV应用。 本发明的ARC通常包含有效吸收反射的深紫外线照射辐射的交联剂和新型ARC树脂粘合剂。
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5.发明授权公开(公告)号：US07632630B2
公开(公告)日：2009-12-15
申请号：US11418520
申请日：2006-05-03
申请人： James Michael Mori , James W. Thackeray , Roger F. Sinta , Rosemary Bell , Robin L. Miller-Fahey , Timothy G. Adams , Thomas M. Zydowsky , Edward K. Pavelchek , Manual doCanto
发明人： James Michael Mori , James W. Thackeray , Roger F. Sinta , Rosemary Bell , Robin L. Miller-Fahey , Timothy G. Adams , Thomas M. Zydowsky , Edward K. Pavelchek , Manual doCanto
CPC分类号： G03F7/091 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111 , Y10S430/127
摘要： The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.
摘要翻译： 本发明提供了新的光致抗蚀剂组合物，其包含树脂粘合剂，光活性组分，特别是酸发生剂，以及含有一种或多种可以减少曝光辐射的不希望的反射的发色团的染料。 优选的染料化合物是包括一种或多种发色团，例如蒽和其它有效吸收深紫外线照射辐射的多环部分的聚合材料。
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6.发明授权Photoresist compositions and methods and articles of manufacture comprising same 有权光致抗蚀剂组合物及其制造方法及其制造方法公开(公告)号：US07704668B1
公开(公告)日：2010-04-27
申请号：US09129113
申请日：1998-08-04
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0048 , Y10S430/114 , Y10S430/115
摘要： The invention provides positive-acting chemically-amplified photoresist compositions that can provide excellent lithographic performance as well as significantly enhanced storage stability. In one aspect, photoresist compositions are provided that comprise a solvent that is free of hydroxy groups (i.e. non-hydroxylic solvent), a resin binder and a photoactive compound that exhibits enhanced and long-term solubility in the solvent. In a further aspect, resists are provided that are formulated in a hydroxyl-containing solvent such as ethyl lactate and that contains a sulfonium salt photoactive compound that includes a sulfonate counter anion that can provide enhanced storage stability for the resist.
摘要翻译： 本发明提供了可以提供优异的平版印刷性能以及显着增强的储存稳定性的正性化学扩增的光致抗蚀剂组合物。 在一个方面，提供了包含不含羟基的溶剂（即非羟基溶剂）的光致抗蚀剂组合物，在溶剂中表现出增强的和长期溶解度的树脂粘合剂和光活性化合物。 在另一方面，提供抗蚀剂，其配制在含羟基的溶剂如乳酸乙酯中，并且含有锍盐光活性化合物，其包含可提供抗蚀剂的增强的储存稳定性的磺酸盐抗衡阴离子。
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公开(公告)号：US06800422B2
公开(公告)日：2004-10-05
申请号：US10142732
申请日：2002-05-10
IPC分类号： G03F726
CPC分类号： G03F7/0392 , G03F7/168 , G03F7/38
摘要： New methods and compositions are provided that enable application and processing of photoresist as thick coating layers, e.g. at dried layer (post soft-bake) thicknesses of in excess of 2 microns. Resists can be imaged at short wavelengths in accordance with the invention, including 248 nm.
摘要翻译： 提供了新的方法和组合物，其使得能够应用和加工光致抗蚀剂作为厚涂层。 在干燥层（软后烘烤）上的厚度超过2微米。 根据本发明，抗蚀剂可以以短波长成像，包括248nm。
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公开(公告)号：US06200728B1
公开(公告)日：2001-03-13
申请号：US09253171
申请日：1999-02-20
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , Y10S430/114 , Y10S430/115 , Y10S430/122
摘要： The invention provides new photoresist compositions that contain a resin binder and a blend of photoacid generators. Photoacid generator blends of the invention produce photoacids that differ in acid strength and/or size.
摘要翻译： 本发明提供了含有树脂粘合剂和光致酸发生剂的混合物的新的光致抗蚀剂组合物。 本发明的光酸发生剂共混物产生酸强度和/或尺寸不同的光酸。
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公开(公告)号：US06803169B2
公开(公告)日：2004-10-12
申请号：US09788106
申请日：2001-02-17
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , Y10S430/114 , Y10S430/115 , Y10S430/122
摘要： The invention provides new photoresist compositions that contain a resin binder and a blend of photoacid generators. Photoacid generator blends of the invention produce photoacids that differ in acid strength and/or size.
摘要翻译： 本发明提供了含有树脂粘合剂和光致酸发生剂的混合物的新的光致抗蚀剂组合物。 本发明的光酸发生剂共混物产生酸强度和/或尺寸不同的光酸。
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公开(公告)号：US06203965B1
公开(公告)日：2001-03-20
申请号：US09552211
申请日：2000-04-19
申请人： James F. Cameron , James Michael Mori , George W. Orsula , James W. Thackeray , Wu-Song Huang , Ronald A. DellaGuardia , Kuang-Jung Chen , Hiroshi Ito , Wayne M. Moreau
发明人： James F. Cameron , James Michael Mori , George W. Orsula , James W. Thackeray , Wu-Song Huang , Ronald A. DellaGuardia , Kuang-Jung Chen , Hiroshi Ito , Wayne M. Moreau
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , Y10S430/114 , Y10S430/115 , Y10S430/122
摘要： The invention provides new photoresist compositions that contain a resin binder and a blend of photoacid generators. Photoacid generator blends of the invention produce photoacids that differ in acid strength and/or size. A specific composition comprises a terpolymer having units of hydroxystyrene, styrene and t-butyl acrylate with the photoacid generators di-(4-tbutylphenyl)iodonium camphorsulfonate and di-(4-t-butylphenyl)iodonium o-trifluoromethylbenzene sulfonate.
摘要翻译： 本发明提供了含有树脂粘合剂和光致酸发生剂的混合物的新的光致抗蚀剂组合物。 本发明的光酸发生剂共混物产生酸强度和/或尺寸不同的光酸。 特定组合物包含具有羟基苯乙烯，苯乙烯和丙烯酸叔丁酯与光酸产生剂二（4-叔丁基苯基）鏻樟脑磺酸盐和邻 - 三氟甲基苯磺酸二（4-叔丁基苯基）碘的单元的三元共聚物。
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