Spectral sensitization of photographic material and new spectral
sensitizers
    1.
    发明授权
    Spectral sensitization of photographic material and new spectral sensitizers 失效
    照相材料和新光谱增感剂的光谱敏化

    公开(公告)号:US4138551A

    公开(公告)日:1979-02-06

    申请号:US781383

    申请日:1977-03-25

    CPC分类号: G03C1/12 G03C1/705

    摘要: The present invention relates to light-sensitive photographic material with a light-sensitive heavy metal compound, e.g. a silver halide, and a spectral sensitizer. The spectral sensitizer is a compound in which the radicals of a sensitizing dyestuff are covalently bonded to amino, imino, hydroxyl, mercapto, carboxylic acid or carboxylic acid amide groups of a natural hydrophilic colloid, preferably gelatin.The invention also relates to new sensitizing dyes which are dinuclear cyanine dyes or merocyanine dyes which have attached either to a heterocyclic nucleus of the dye or to its methine chain a group which is reactive with a hydrophilic colloid.

    摘要翻译: 本发明涉及具有光敏重金属化合物的感光照相材料,例如, 卤化银和光谱增感剂。 光谱敏化剂是其中感光染料的自由基共价键合到天然亲水胶体(优选明胶)的氨基,亚氨基,羟基,巯基,羧酸或羧酸酰胺基团的化合物。

    Photographic negative material with at least one layer containing a
desensitized silver halide emulsion
    3.
    发明授权
    Photographic negative material with at least one layer containing a desensitized silver halide emulsion 失效
    具有至少一层含有脱敏卤化银乳剂的摄影负材料

    公开(公告)号:US4326021A

    公开(公告)日:1982-04-20

    申请号:US233411

    申请日:1981-02-11

    IPC分类号: G03C1/36

    CPC分类号: G03C1/36

    摘要: Photographic negative material which has at least one layer which contains a desensitized silver halide emulsion, the desensitizer used being a trinuclear heptamethinecyanine or a halogenated trinuclear tetramethinecyanine which has three identical heterocyclic ring systems, which can have different substituents and are linked to one another by three identical methine systems, which can be mesomeric, is suitable for processing in subdued daylight but nevertheless has an adequate sensitivity on exposure to intense light.

    摘要翻译: 具有至少一层含有脱敏卤化银乳剂的感光负片材料,所述脱敏剂是三核七甲基氰胺或具有三个相同杂环系统的卤代三核四甲基氰胺,它们可以具有不同的取代基并通过三个相互连接 相同的次甲基系统可以是中等的,适合于在柔和的日光下进行加工,但对暴露于强光下具有足够的灵敏度。