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    POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS
    1.
    发明申请
    POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS 有权
    积极的组合物和绘图过程

    公开(公告)号：US20080008960A1

    公开(公告)日：2008-01-10

    申请号：US11773706

    申请日：2007-07-05

    申请人： Ryosuke TANIGUCHI ,  Tsunehiro NISHI ,  Tomohiro KOBAYASHI

    发明人： Ryosuke TANIGUCHI ,  Tsunehiro NISHI ,  Tomohiro KOBAYASHI

    IPC分类号： G03C1/10 ,  G03C5/38

    CPC分类号： G03F7/0397 ,  G03F7/0046 ,  G03F7/0395 ,  G03F7/2041 ,  Y10S430/111 ,  Y10S430/12 ,  Y10S430/122 ,  Y10S430/126

    摘要： In a positive resist composition comprising (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) a photoacid generator, component (A) is a polymer of formula (1) wherein R1 is H, methyl or trifluoromethyl, R2 and R3 are alkyl, R4 is a monovalent hydrocarbon group, X1 is O, S or CH2CH2, X2 is O, S, CH2 or CH2CH2, n is 1 or 2, a1, a2, c, d1 and d2 each are from 0 to less than 1, b is from 0.01 to less than 1, and a1+a2+b+c+d1+d2=1. The resist composition forms a pattern with high rectangularity at an enhanced resolution when processed by ArF lithography.

    摘要翻译： 在包含（A）在酸的作用下变得可溶于碱性显影剂的树脂组分和（B）光酸产生剂的正型抗蚀剂组合物中，组分（A）是式（1）的聚合物，其中R 1是H，甲基或三氟甲基，R 2和R 3是烷基，R 4是一价烃基，X O，S或CH 2 CH 2，X 2是O，S，CH 2， 2或CH 2 CH 2，n为1或2，a1，a2，c，d1和d2各自为0至小于1，b 为0.01〜小于1，a1 + a2 + b + c + d1 + d2 = 1。 当通过ArF光刻处理时，抗蚀剂组合物以增强的分辨率形成具有高矩形性的图案。

    Silver halide photosensitive material and image forming method therefor
    2.
    发明授权
    Silver halide photosensitive material and image forming method therefor 失效
    卤化银感光材料及其成像方法

    公开(公告)号：US07163785B2

    公开(公告)日：2007-01-16

    申请号：US10534608

    申请日：2002-11-20

    申请人： Toshiya Kondo ,  Koichiro Kuroda

    发明人： Toshiya Kondo ,  Koichiro Kuroda

    IPC分类号： G03C1/10 ,  G03C7/407

    CPC分类号： G03C1/035 ,  G03C1/346 ,  G03C5/04 ,  G03C7/30 ,  G03C7/407 ,  G03C2001/03517 ,  G03C2001/03535 ,  G03C2200/40

    摘要： A silver halide photographic material, including a support having thereon a silver halide emulsion layer, the silver halide emulsion layer containing silver halide particles having a silver chloride content of more than or equal to 90 mol %, wherein a compound represented by Formula (S) is contained in the interior and on a surface of the silver halide particles and in a binder of the silver halide emulsion layer, and the silver halide particles have more than two silver halide phases therein having different concentration of the compound represented by Formula (S):

    摘要翻译： 一种卤化银照相材料，其包含其上具有卤化银乳剂层的载体，所述卤化银乳剂层含有氯化银粒子含量大于或等于90mol％的卤化银颗粒，其中由式（S）表示的化合物， 包含在卤化银颗粒的内部和表面以及卤化银乳剂层的粘合剂中，并且卤化银颗粒具有不同浓度的由式（S）表示的化合物的卤化银相， ：

    Silver halide photographic lightsensitive material
    4.
    发明授权
    Silver halide photographic lightsensitive material 失效
    卤化银照相感光材料

    公开(公告)号：US06924091B2

    公开(公告)日：2005-08-02

    申请号：US10034607

    申请日：2002-01-03

    申请人： Yoichi Hosoya ,  Kiyoshi Morimoto ,  Tadashi Inaba

    发明人： Yoichi Hosoya ,  Kiyoshi Morimoto ,  Tadashi Inaba

    IPC分类号： G03C1/005 ,  G03C1/10 ,  G03C1/34 ,  G03C1/38 ,  G03C7/30 ,  G03C7/305 ,  G03C7/388 ,  G03C7/392 ,  G03C1/08 ,  G03C7/26 ,  G03C7/32

    CPC分类号： G03C7/30541 ,  G03C1/0051 ,  G03C1/0053 ,  G03C1/10 ,  G03C1/34 ,  G03C1/38 ,  G03C7/3003 ,  G03C7/3022 ,  G03C7/3885 ,  G03C7/392 ,  G03C2001/0056 ,  G03C2001/03552 ,  G03C2200/03 ,  G03C2200/24 ,  Y10S430/156 ,  Y10S430/158

    摘要： A silver halide photographic lightsensitive material comprising a support having thereon at least one lightsensitive silver halide emulsion layer, wherein the lightsensitive material contains at least one compound represented by general formula (I) and at least one photographically useful group-releasing compound represented by general formula (II) or (III) that is capable of forming a compound having substantially no contribution to a dye after its coupling with an oxidized form of a developing agent: (X)k—(L)m—(A—B)n  (I) COUP1—D1  (II) COUP2—C—E—D2  (III) The definitions of the substituents are set forth in the specification.

    摘要翻译： 一种卤化银照相感光材料，其包括其上具有至少一种感光卤化银乳剂层的载体，其中所述光敏材料含有至少一种由通式（I）表示的化合物和至少一种由通式 （II）或（III），其能够在与显影剂的氧化形式偶联之后形成对染料基本上没有贡献的化合物：<？in-line-formula description =“In-line Formulas”end = （X）k-（L）m-（AB）n（I）<？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line- 公式描述=“内联公式”end =“lead”？> COUP1-D1（II）<？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line- 公式描述=“在线公式”end =“lead”？> COUP2-CE-D2（III）<？in-line-formula description =“In-line Formulas”end =“tail”？> 取代基在规定中列出 ication。

    Silver halide photographic material
    7.
    发明授权
    Silver halide photographic material 失效
    卤化银照相材料

    公开(公告)号：US6150082A

    公开(公告)日：2000-11-21

    申请号：US170075

    申请日：1998-10-13

    申请人： Tetsuo Nakamura ,  Ryuji Abe ,  Takanori Hioki

    发明人： Tetsuo Nakamura ,  Ryuji Abe ,  Takanori Hioki

    IPC分类号： G03C1/18 ,  G03C1/10 ,  G03C1/29 ,  G03C1/34

    CPC分类号： G03C1/29 ,  G03C1/10

    摘要： A silver halide photographic material is disclosed which contains at least one compound represented by the following formula (I) and at least one dye having the absorption maximum in a methanol solution at from 510 to 535 nm: ##STR1## wherein R.sup.1 and R.sup.2 each represents an alkyl group; Y represents an aryl group or a heterocyclic group; V.sup.1, V.sup.2, V.sup.3 and V.sup.4 each represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxyl group, a hydroxyl group, an alkylthio group, a mercapto group, a cyano group, an acyl group, a carboxyl group, or an alkoxycarbonyl group; X.sup.1 represents a counter ion; and m.sup.1 represents a number of 0 or more necessary for neutralizing a charge in the molecule.

    摘要翻译： 公开了一种卤化银照相材料，其含有至少一种由下式（I）表示的化合物和至少一种在510至535nm的甲醇溶液中具有最大吸收的染料：其中R1和R2各自表示烷基 ; Y表示芳基或杂环基; V1，V2，V3和V4各自表示氢原子，卤素原子，烷基，烷氧基，羟基，烷硫基，巯基，氰基，酰基，羧基或 烷氧基羰基; X1表示抗衡离子; m1表示中和分子中的电荷所需的0以上的数。

    Silver halide photographic light-sensitive material
    8.
    发明授权
    Silver halide photographic light-sensitive material 失效
    卤化银照相感光材料

    公开(公告)号：US06057089A

    公开(公告)日：2000-05-02

    申请号：US784919

    申请日：1997-01-16

    申请人： Jun Matsumoto ,  Takanori Hioki ,  Tetsuo Nakamura

    发明人： Jun Matsumoto ,  Takanori Hioki ,  Tetsuo Nakamura

    IPC分类号： G03C7/00 ,  G03C1/00 ,  G03C1/005 ,  G03C1/10 ,  G03C1/12 ,  G03C1/14 ,  G03C1/22 ,  G03C1/26 ,  G03C1/34 ,  G03C7/30 ,  G03C1/33

    CPC分类号： G03C7/3041 ,  G03C1/12 ,  G03C1/0051 ,  G03C1/10 ,  G03C1/34

    摘要： A silver halide photographic light-sensitive material having at least one silver halide emulsion layer formed on a support, wherein silver halide grains in the emulsion layer are reduction-sensitized and contain at least one compound represented by formula (I) below. ##STR1## In formula (I), R is an alkyl group represented as follows. ##STR2## Each of R.sub.a, R.sub.b, R.sub.c, ad R.sub.d represents an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, or an amino group, each of Q.sub.a, Q.sub.b, Q.sub.c, and Q.sub.d represents a methylene group, and each of r, s, t, and u represents an integer from 1 to 10.Each of L.sub.1 and L.sub.2 represents a methine group. p1 represents 0 or 1. Z.sub.1 represents atom groups required to neutralize a 5- or 6-membered nitrogen-containing heterocyclic ring. M.sub.1 represents a charge-balancing counterion, and m.sub.1 represents a number from 0 to 10 required to form electric charge of a molecule. Q represents a methine group or a polymethine group substituted by a heterocyclic group or an aromatic group.

    摘要翻译： 一种卤化银摄影感光材料，其在支持体上形成有至少一个卤化银乳剂层，其中乳剂层中的卤化银颗粒被还原致敏并含有至少一种由下式（I）表示的化合物。 在式（I）中，R是如下所示的烷基。 Ra，Rb，Rc，ad Rd分别表示烷基，芳基，杂环基，烷氧基，芳氧基或氨基，Qa，Qb，Qc和Qd各自表示亚甲基 ，r，s，t和u分别表示1〜10的整数.L 1和L 2各自表示次甲基。 p1表示0或1.Z1表示中和5或6元含氮杂环所需的原子团。 M1表示电荷平衡抗衡离子，m1表示形成分子电荷所需的0〜10的数。 Q表示被杂环基或芳基取代的次甲基或多元胺基。

    High bromide emulsions containing a restricted high iodide epitaxial phase on (111) major faces of tabular grains beneath surface silver halide
    10.
    发明授权
    High bromide emulsions containing a restricted high iodide epitaxial phase on (111) major faces of tabular grains beneath surface silver halide 失效
    在溴化银表面下方的片状颗粒的（111）主面上含有限制性高碘化物外延相的高溴化物乳剂

    公开(公告)号：US5698387A

    公开(公告)日：1997-12-16

    申请号：US706081

    申请日：1996-08-30

    申请人： Kenneth Joseph Reed ,  Jeffrey Christen Hansen

    发明人： Kenneth Joseph Reed ,  Jeffrey Christen Hansen

    IPC分类号： G03C1/005 ,  G03C1/10 ,  G03C1/16 ,  G03C1/035 ,  G03C1/09

    CPC分类号： G03C1/0051 ,  G03C1/10 ,  G03C1/16

    摘要： A photographic emulsion is disclosed comprised of a dispersing medium and radiation-sensitive grains with greater than 50 percent of total grain projected area being accounted for by tabular grains comprised of (1) a tabular host portion containing greater than 50 mole percent bromide, based on silver, and having spaced parallel {111} major faces, (2) a first epitaxial phase containing greater than 90 mole percent iodide, based on silver, accounting for less than 60 percent of total silver and overlying from 15 to 90 percent of the major faces, and (3) surface silver halide of a face centered cubic crystal lattice structure overlying at least a portion of the first epitaxial phase.

    摘要翻译： 公开了一种照相乳剂，其由分散介质和具有大于总颗粒投影面积的50％的辐射敏感颗粒组成，片状颗粒由（1）包含大于50摩尔百分比的溴化物的片状主体部分 银，并且具有平行的{111}主面间隔，（2）基于银的含有大于90摩尔％碘化物的第一外延相，占银总量的不到60％，覆盖在主体的15％至90％ 面和（3）覆盖至少部分第一外延相的面心立方晶格结构的表面卤化银。