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公开(公告)号：US07379156B2
公开(公告)日：2008-05-27
申请号：US11023630
申请日：2004-12-29
CPC分类号： G03F7/70725
摘要： A lithographic apparatus includes an illumination system for conditioning a radiation beam. A support structure supports a patterning device, which is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. A substrate table holds a substrate. A projection system projects the patterned radiation beam onto a target portion of the substrate. A motion control system includes a controller having a transfer function. The controller controls a position of the support structure and or the substrate table along a series of positions. The transfer function consists of a sum of a plurality of positional transfer functions, each determined in one of the positions, and each multiplied by a weighing function.
摘要翻译： 光刻设备包括用于调节辐射束的照明系统。 支撑结构支撑图案形成装置，其能够使辐射束在其横截面上具有图案以形成图案化的辐射束。 衬底台保持衬底。 投影系统将图案化的辐射束投影到基板的目标部分上。 运动控制系统包括具有传递函数的控制器。 控制器沿着一系列位置控制支撑结构和/或衬底台的位置。 传递函数由多个位置传递函数之和组成，每个位置传递函数在位置之一中确定，并且每一位乘以称重函数。
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公开(公告)号：US07657334B2
公开(公告)日：2010-02-02
申请号：US11227445
申请日：2005-09-16
CPC分类号： G03F7/70725 , Y02P90/265
摘要： A lithographic apparatus includes a movable part and a controller to control a position quantity of the movable part. The controller includes a first controller transfer function and a second controller transfer function. A selector selects the first controller transfer function or the second controller transfer function depending on a state of the movable part. The first controller transfer function may be chosen in a substantially stationary state of the movable part, while in a substantially non-stationary state of the movable part, the second controller transfer function may be chosen.
摘要翻译： 光刻设备包括可移动部件和用于控制可移动部件的位置量的控制器。 控制器包括第一控制器传递功能和第二控制器传递功能。 选择器根据可动部件的状态选择第一控制器传递功能或第二控制器传递功能。 可以在可移动部件的基本静止状态下选择第一控制器传递功能，而在可移动部件的基本上非静止状态下，可以选择第二控制器传递功能。
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公开(公告)号：US20080212054A1
公开(公告)日：2008-09-04
申请号：US11712555
申请日：2007-03-01
申请人： Ramidin Izair Kamidi , Henrikus Herman Marie Cox , Ronald Casper Kunst , Youssef Karel Maria De Vos
发明人： Ramidin Izair Kamidi , Henrikus Herman Marie Cox , Ronald Casper Kunst , Youssef Karel Maria De Vos
IPC分类号： G03B27/42
CPC分类号： G03F7/709 , G03F7/70725 , G03F7/70758
摘要： A stage system for a lithographic apparatus includes a stage, an over-determined number of actuators to act on the stage, at least two sensors to measure a position dependent parameter of the stage and to provide a respective sensor signal. The at least two sensors are arranged to measure the respective position dependent parameters in a same degree of freedom. A controller is provided to provide a controller output signal to at least one of the actuators in response to a setpoint and the position dependent parameter as measured by at least one of the sensors. A further controller is provided with the position dependent parameters measured by the sensors. The further controller is configured to determine a difference between the position dependent parameters from the sensors and to provide a further controller output signal to at least one of the actuators in response to the determined difference.
摘要翻译： 用于光刻设备的舞台系统包括舞台，作用在舞台上的超过数量的致动器，至少两个传感器，用于测量舞台的位置相关参数并提供相应的传感器信号。 至少两个传感器被布置成以相同的自由度来测量相应的位置相关参数。 提供控制器以响应于由至少一个传感器测量的设定点和位置相关参数来向至少一个致动器提供控制器输出信号。 另一控制器具有由传感器测量的位置相关参数。 另外的控制器被配置为确定来自传感器的与位置有关的参数之间的差异，并响应于所确定的差异向至少一个致动器提供另外的控制器输出信号。
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公开(公告)号：US20100214548A1
公开(公告)日：2010-08-26
申请号：US12699544
申请日：2010-02-03
申请人： Michael Johannes Vervoordeldonk , Ronald Casper Kunst , Youssef Karel Maria De Vos , Johannes Hubertus Antonius Van De Rijdt , Robertus Jacobus Theodorus Van Kempen
发明人： Michael Johannes Vervoordeldonk , Ronald Casper Kunst , Youssef Karel Maria De Vos , Johannes Hubertus Antonius Van De Rijdt , Robertus Jacobus Theodorus Van Kempen
CPC分类号： G03F7/70758 , G03F7/70783 , Y10T74/20354
摘要： A lithographic apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate on a central area; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate in a first direction. The apparatus further includes a positioning device to position the substrate table, wherein the positioning device includes a plurality of actuators arranged to, in use, exert forces to position the substrate table, the forces substantially being directed in a plane substantially perpendicular to the first direction and wherein the plurality of actuators are arranged outside a central volume of the substrate table, the central volume being obtained by projecting the central area along the first direction.
摘要翻译： 光刻设备包括构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束; 衬底台，其被构造成将衬底保持在中心区域上; 以及投影系统，被配置为将图案化的辐射束在第一方向上投影到基板的目标部分上。 该装置还包括定位装置以定位衬底台，其中定位装置包括多个致动器，其布置成在使用中施加力以定位衬底台，该力基本上被引导在基本上垂直于第一方向的平面 并且其中所述多个致动器布置在所述衬底台的中心体积的外侧，所述中心体积通过沿着所述第一方向突出所述中心区域而获得。
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5.发明授权公开(公告)号：US07742149B2
公开(公告)日：2010-06-22
申请号：US12155109
申请日：2008-05-29
申请人： Youssef Karel Maria De Vos , Ronald Casper Kunst , Patricia Vreugdewater , Peter Paul Hempenius
发明人： Youssef Karel Maria De Vos , Ronald Casper Kunst , Patricia Vreugdewater , Peter Paul Hempenius
IPC分类号： G03B27/58
CPC分类号： G03F7/70758 , G03F7/70725 , G03F7/70783
摘要： A stage system for a lithographic apparatus includes a stage, an over-determined number of actuators arranged to act on the stage, and an electric power supply configured to provide a current to the actuators, wherein the current is supplied to a coil associated with a first actuator of the actuators and to a coil associated with a second actuator of the actuators.
摘要翻译： 用于光刻设备的舞台系统包括舞台，被布置为作用在舞台上的超过数量的致动器以及被配置为向致动器提供电流的电源，其中电流被提供给与 致动器的第一致动器和与致动器的第二致动器相关联的线圈。
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6.发明申请公开(公告)号：US20080309911A1
公开(公告)日：2008-12-18
申请号：US12155109
申请日：2008-05-29
申请人： Youssef Karel Maria De Vos , Ronald Casper Kunst , Patricia Vreugdewater , Peter Paul Hempenius
发明人： Youssef Karel Maria De Vos , Ronald Casper Kunst , Patricia Vreugdewater , Peter Paul Hempenius
CPC分类号： G03F7/70758 , G03F7/70725 , G03F7/70783
摘要： A stage system for a lithographic apparatus includes a stage, an over-determined number of actuators arranged to act on the stage, and an electric power supply configured to provide a current to the actuators, wherein the current is supplied to a coil associated with a first actuator of the actuators and to a coil associated with a second actuator of the actuators.
摘要翻译： 用于光刻设备的舞台系统包括舞台，被布置为作用在舞台上的超过数量的致动器以及被配置为向致动器提供电流的电源，其中电流被提供给与 致动器的第一致动器和与致动器的第二致动器相关联的线圈。
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公开(公告)号：US08885147B2
公开(公告)日：2014-11-11
申请号：US12699544
申请日：2010-02-03
申请人： Michael Johannes Vervoordeldonk , Ronald Casper Kunst , Youssef Karel Maria De Vos , Johannes Hubertus Antonius Van De Rijdt , Robertus Jacobus Theodorus Van Kempen
发明人： Michael Johannes Vervoordeldonk , Ronald Casper Kunst , Youssef Karel Maria De Vos , Johannes Hubertus Antonius Van De Rijdt , Robertus Jacobus Theodorus Van Kempen
CPC分类号： G03F7/70758 , G03F7/70783 , Y10T74/20354
摘要： A lithographic apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate on a central area; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate in a first direction. The apparatus further includes a positioning device to position the substrate table, wherein the positioning device includes a plurality of actuators arranged to, in use, exert forces to position the substrate table, the forces substantially being directed in a plane substantially perpendicular to the first direction and wherein the plurality of actuators are arranged outside a central volume of the substrate table, the central volume being obtained by projecting the central area along the first direction.
摘要翻译： 光刻设备包括构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束; 衬底台，其被构造成将衬底保持在中心区域上; 以及投影系统，被配置为将图案化的辐射束在第一方向上投影到基板的目标部分上。 该装置还包括定位装置以定位衬底台，其中定位装置包括多个致动器，其布置成在使用中施加力以定位衬底台，该力基本上被引导在基本上垂直于第一方向的平面 并且其中所述多个致动器布置在所述衬底台的中心体积的外侧，所述中心体积通过沿着所述第一方向突出所述中心区域而获得。
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公开(公告)号：US08830442B2
公开(公告)日：2014-09-09
申请号：US12247411
申请日：2008-10-08
申请人： Youssef Karel Maria De Vos , Dirk-Jan Bijvoet , Ronald Casper Kunst , Ramidin Izair Kamidi , Khalid Manssouri
发明人： Youssef Karel Maria De Vos , Dirk-Jan Bijvoet , Ronald Casper Kunst , Ramidin Izair Kamidi , Khalid Manssouri
CPC分类号： G03F7/70725 , H01L21/682
摘要： A servo control system to control a position of an object supported by a movable support includes a first measurement system to measure a position of the movable support, a comparative device to provide an error signal based on the comparison between a measured movable support position and a desired movable support position, a controller unit to provide a control signal based on the error signal, and an actuator configured to actuate the movable support based on the control signal. The servo control system further includes a slip compensation device to compensate a slip between the object and the movable support, the slip compensation device including a second measurement system to measure an object position with respect to the movable support, and an addition device to add a slip compensation signal to the measured movable support position or the error signal based on the measured object position.
摘要翻译： 用于控制由可移动支撑件支撑的物体的位置的伺服控制系统包括：第一测量系统，用于测量可移动支撑件的位置;比较装置，用于基于测量的可移动支撑位置和 期望的可移动支撑位置，基于误差信号提供控制信号的控制器单元和被配置为基于控制信号致动可移动支撑件的致动器。 所述伺服控制系统还包括滑差补偿装置，用于补偿所述物体与所述可移动支撑件之间的滑动，所述滑移补偿装置包括用于测量相对于所述可移动支撑件的物体位置的第二测量系统，以及添加装置 滑差补偿信号到被测量的可移动支撑位置或基于测量对象位置的误差信号。
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公开(公告)号：US07782446B2
公开(公告)日：2010-08-24
申请号：US11712555
申请日：2007-03-01
申请人： Ramidin Izair Kamidi , Henrikus Herman Marie Cox , Ronald Casper Kunst , Youssef Karel Maria De Vos
发明人： Ramidin Izair Kamidi , Henrikus Herman Marie Cox , Ronald Casper Kunst , Youssef Karel Maria De Vos
CPC分类号： G03F7/709 , G03F7/70725 , G03F7/70758
摘要： A stage system for a lithographic apparatus includes a stage, an over-determined number of actuators to act on the stage, at least two sensors to measure a position dependent parameter of the stage and to provide a respective sensor signal. The at least two sensors are arranged to measure the respective position dependent parameters in a same degree of freedom. A controller is provided to provide a controller output signal to at least one of the actuators in response to a setpoint and the position dependent parameter as measured by at least one of the sensors. A further controller is provided with the position dependent parameters measured by the sensors. The further controller is configured to determine a difference between the position dependent parameters from the sensors and to provide a further controller output signal to at least one of the actuators in response to the determined difference.
摘要翻译： 用于光刻设备的舞台系统包括舞台，作用在舞台上的超过数量的致动器，至少两个传感器，用于测量舞台的位置相关参数并提供相应的传感器信号。 至少两个传感器被布置成以相同的自由度来测量相应的位置相关参数。 提供控制器以响应于由至少一个传感器测量的设定点和位置相关参数来向至少一个致动器提供控制器输出信号。 另一控制器具有由传感器测量的位置相关参数。 另外的控制器被配置为确定来自传感器的与位置有关的参数之间的差异，并响应于所确定的差异向至少一个致动器提供另外的控制器输出信号。
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公开(公告)号：US20090147236A1
公开(公告)日：2009-06-11
申请号：US12247411
申请日：2008-10-08
申请人： Youssef Karel Maria De Vos , Dirk-Jan Bijvoet , Ronald Casper Kunst , Ramidin Izair Kamidi , Khalid Manssouri
发明人： Youssef Karel Maria De Vos , Dirk-Jan Bijvoet , Ronald Casper Kunst , Ramidin Izair Kamidi , Khalid Manssouri
IPC分类号： G03B27/58
CPC分类号： G03F7/70725 , H01L21/682
摘要： A servo control system to control a position of an object supported by a movable support includes a first measurement system to measure a position of the movable support, a comparative device to provide an error signal based on the comparison between a measured movable support position and a desired movable support position, a controller unit to provide a control signal based on the error signal, and an actuator configured to actuate the movable support based on the control signal. The servo control system further includes a slip compensation device to compensate a slip between the object and the movable support, the slip compensation device including a second measurement system to measure an object position with respect to the movable support, and an addition device to add a slip compensation signal to the measured movable support position or the error signal based on the measured object position.
摘要翻译： 用于控制由可移动支撑件支撑的物体的位置的伺服控制系统包括：第一测量系统，用于测量可移动支撑件的位置;比较装置，用于基于测量的可移动支撑位置和 期望的可移动支撑位置，基于误差信号提供控制信号的控制器单元和被配置为基于控制信号致动可移动支撑件的致动器。 所述伺服控制系统还包括滑差补偿装置，用于补偿所述物体与所述可移动支撑件之间的滑动，所述滑移补偿装置包括用于测量相对于所述可移动支撑件的物体位置的第二测量系统，以及添加装置 滑差补偿信号到被测量的可移动支撑位置或基于测量对象位置的误差信号。
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