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公开(公告)号：US08830442B2
公开(公告)日：2014-09-09
申请号：US12247411
申请日：2008-10-08
申请人： Youssef Karel Maria De Vos , Dirk-Jan Bijvoet , Ronald Casper Kunst , Ramidin Izair Kamidi , Khalid Manssouri
发明人： Youssef Karel Maria De Vos , Dirk-Jan Bijvoet , Ronald Casper Kunst , Ramidin Izair Kamidi , Khalid Manssouri
CPC分类号： G03F7/70725 , H01L21/682
摘要： A servo control system to control a position of an object supported by a movable support includes a first measurement system to measure a position of the movable support, a comparative device to provide an error signal based on the comparison between a measured movable support position and a desired movable support position, a controller unit to provide a control signal based on the error signal, and an actuator configured to actuate the movable support based on the control signal. The servo control system further includes a slip compensation device to compensate a slip between the object and the movable support, the slip compensation device including a second measurement system to measure an object position with respect to the movable support, and an addition device to add a slip compensation signal to the measured movable support position or the error signal based on the measured object position.
摘要翻译： 用于控制由可移动支撑件支撑的物体的位置的伺服控制系统包括：第一测量系统，用于测量可移动支撑件的位置;比较装置，用于基于测量的可移动支撑位置和 期望的可移动支撑位置，基于误差信号提供控制信号的控制器单元和被配置为基于控制信号致动可移动支撑件的致动器。 所述伺服控制系统还包括滑差补偿装置，用于补偿所述物体与所述可移动支撑件之间的滑动，所述滑移补偿装置包括用于测量相对于所述可移动支撑件的物体位置的第二测量系统，以及添加装置 滑差补偿信号到被测量的可移动支撑位置或基于测量对象位置的误差信号。
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公开(公告)号：US20090147236A1
公开(公告)日：2009-06-11
申请号：US12247411
申请日：2008-10-08
申请人： Youssef Karel Maria De Vos , Dirk-Jan Bijvoet , Ronald Casper Kunst , Ramidin Izair Kamidi , Khalid Manssouri
发明人： Youssef Karel Maria De Vos , Dirk-Jan Bijvoet , Ronald Casper Kunst , Ramidin Izair Kamidi , Khalid Manssouri
IPC分类号： G03B27/58
CPC分类号： G03F7/70725 , H01L21/682
摘要： A servo control system to control a position of an object supported by a movable support includes a first measurement system to measure a position of the movable support, a comparative device to provide an error signal based on the comparison between a measured movable support position and a desired movable support position, a controller unit to provide a control signal based on the error signal, and an actuator configured to actuate the movable support based on the control signal. The servo control system further includes a slip compensation device to compensate a slip between the object and the movable support, the slip compensation device including a second measurement system to measure an object position with respect to the movable support, and an addition device to add a slip compensation signal to the measured movable support position or the error signal based on the measured object position.
摘要翻译： 用于控制由可移动支撑件支撑的物体的位置的伺服控制系统包括：第一测量系统，用于测量可移动支撑件的位置;比较装置，用于基于测量的可移动支撑位置和 期望的可移动支撑位置，基于误差信号提供控制信号的控制器单元和被配置为基于控制信号致动可移动支撑件的致动器。 所述伺服控制系统还包括滑差补偿装置，用于补偿所述物体与所述可移动支撑件之间的滑动，所述滑移补偿装置包括用于测量相对于所述可移动支撑件的物体位置的第二测量系统，以及添加装置 滑差补偿信号到被测量的可移动支撑位置或基于测量对象位置的误差信号。
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公开(公告)号：US20080212054A1
公开(公告)日：2008-09-04
申请号：US11712555
申请日：2007-03-01
申请人： Ramidin Izair Kamidi , Henrikus Herman Marie Cox , Ronald Casper Kunst , Youssef Karel Maria De Vos
发明人： Ramidin Izair Kamidi , Henrikus Herman Marie Cox , Ronald Casper Kunst , Youssef Karel Maria De Vos
IPC分类号： G03B27/42
CPC分类号： G03F7/709 , G03F7/70725 , G03F7/70758
摘要： A stage system for a lithographic apparatus includes a stage, an over-determined number of actuators to act on the stage, at least two sensors to measure a position dependent parameter of the stage and to provide a respective sensor signal. The at least two sensors are arranged to measure the respective position dependent parameters in a same degree of freedom. A controller is provided to provide a controller output signal to at least one of the actuators in response to a setpoint and the position dependent parameter as measured by at least one of the sensors. A further controller is provided with the position dependent parameters measured by the sensors. The further controller is configured to determine a difference between the position dependent parameters from the sensors and to provide a further controller output signal to at least one of the actuators in response to the determined difference.
摘要翻译： 用于光刻设备的舞台系统包括舞台，作用在舞台上的超过数量的致动器，至少两个传感器，用于测量舞台的位置相关参数并提供相应的传感器信号。 至少两个传感器被布置成以相同的自由度来测量相应的位置相关参数。 提供控制器以响应于由至少一个传感器测量的设定点和位置相关参数来向至少一个致动器提供控制器输出信号。 另一控制器具有由传感器测量的位置相关参数。 另外的控制器被配置为确定来自传感器的与位置有关的参数之间的差异，并响应于所确定的差异向至少一个致动器提供另外的控制器输出信号。
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4.发明申请LITHOGRAPHIC APPARATUS HAVING A CHUCK WITH A VISCO-ELASTIC DAMPING LAYER 有权具有VISCO-ELASTIC DAMPING LAYER的卡盘的平面设备公开(公告)号：US20090231567A1
公开(公告)日：2009-09-17
申请号：US12370741
申请日：2009-02-13
CPC分类号： G03F7/7095 , G03F7/707 , G03F7/70783
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a chuck configured to hold and position an object, for example, the patterning device onto the support or the substrate onto the substrate table, the chuck including a base and a constraining layer. A damping layer including a viscoelastic material is provided between the base and the constraining layer.
摘要翻译： 光刻设备包括配置成调节辐射束的照明系统，构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束，衬底 被构造成保持基板的工作台，被配置为将图案化的辐射束投影到基板的目标部分上的投影系统，配置成将物体（例如，图案形成装置）保持和定位到支撑件或基板上的基板上的卡盘 桌子，卡盘包括基座和约束层。 包括粘弹性材料的阻尼层设置在基部和约束层之间。
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公开(公告)号：US07657334B2
公开(公告)日：2010-02-02
申请号：US11227445
申请日：2005-09-16
CPC分类号： G03F7/70725 , Y02P90/265
摘要： A lithographic apparatus includes a movable part and a controller to control a position quantity of the movable part. The controller includes a first controller transfer function and a second controller transfer function. A selector selects the first controller transfer function or the second controller transfer function depending on a state of the movable part. The first controller transfer function may be chosen in a substantially stationary state of the movable part, while in a substantially non-stationary state of the movable part, the second controller transfer function may be chosen.
摘要翻译： 光刻设备包括可移动部件和用于控制可移动部件的位置量的控制器。 控制器包括第一控制器传递功能和第二控制器传递功能。 选择器根据可动部件的状态选择第一控制器传递功能或第二控制器传递功能。 可以在可移动部件的基本静止状态下选择第一控制器传递功能，而在可移动部件的基本上非静止状态下，可以选择第二控制器传递功能。
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公开(公告)号：US07782446B2
公开(公告)日：2010-08-24
申请号：US11712555
申请日：2007-03-01
申请人： Ramidin Izair Kamidi , Henrikus Herman Marie Cox , Ronald Casper Kunst , Youssef Karel Maria De Vos
发明人： Ramidin Izair Kamidi , Henrikus Herman Marie Cox , Ronald Casper Kunst , Youssef Karel Maria De Vos
CPC分类号： G03F7/709 , G03F7/70725 , G03F7/70758
摘要： A stage system for a lithographic apparatus includes a stage, an over-determined number of actuators to act on the stage, at least two sensors to measure a position dependent parameter of the stage and to provide a respective sensor signal. The at least two sensors are arranged to measure the respective position dependent parameters in a same degree of freedom. A controller is provided to provide a controller output signal to at least one of the actuators in response to a setpoint and the position dependent parameter as measured by at least one of the sensors. A further controller is provided with the position dependent parameters measured by the sensors. The further controller is configured to determine a difference between the position dependent parameters from the sensors and to provide a further controller output signal to at least one of the actuators in response to the determined difference.
摘要翻译： 用于光刻设备的舞台系统包括舞台，作用在舞台上的超过数量的致动器，至少两个传感器，用于测量舞台的位置相关参数并提供相应的传感器信号。 至少两个传感器被布置成以相同的自由度来测量相应的位置相关参数。 提供控制器以响应于由至少一个传感器测量的设定点和位置相关参数来向至少一个致动器提供控制器输出信号。 另一控制器具有由传感器测量的位置相关参数。 另外的控制器被配置为确定来自传感器的与位置有关的参数之间的差异，并响应于所确定的差异向至少一个致动器提供另外的控制器输出信号。
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7.发明授权公开(公告)号：US08928860B2
公开(公告)日：2015-01-06
申请号：US12370741
申请日：2009-02-13
CPC分类号： G03F7/7095 , G03F7/707 , G03F7/70783
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a chuck configured to hold and position an object, for example, the patterning device onto the support or the substrate onto the substrate table, the chuck including a base and a constraining layer. A damping layer including a viscoelastic material is provided between the base and the constraining layer.
摘要翻译： 光刻设备包括配置成调节辐射束的照明系统，构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束，衬底 被构造成保持基板的工作台，被配置为将图案化的辐射束投影到基板的目标部分上的投影系统，配置成将物体（例如，图案形成装置）保持和定位到支撑件或基板上的基板上的卡盘 桌子，卡盘包括基座和约束层。 包括粘弹性材料的阻尼层设置在基部和约束层之间。
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公开(公告)号：US08279407B2
公开(公告)日：2012-10-02
申请号：US12408936
申请日：2009-03-23
申请人： Ramidin Izair Kamidi , Henrikus Herman Marie Cox , Emiel Jozef Melanie Eussen , Ronald Casper Kunst , Engelbertus Antonius Fransiscus Van Der Pasch , Marcel François Heertjes , Mark Constant Johannes Baggen
发明人： Ramidin Izair Kamidi , Henrikus Herman Marie Cox , Emiel Jozef Melanie Eussen , Ronald Casper Kunst , Engelbertus Antonius Fransiscus Van Der Pasch , Marcel François Heertjes , Mark Constant Johannes Baggen
CPC分类号： G03F7/70775
摘要： A stage system includes a movable stage, at least two encoder heads each constructed to provide an encoder signal representative of a position of the movable stage with respect to an encoder target structure, and a controller to control a position of the stage. The controller is provided with the encoder signals of each of the encoder heads. The controller is arranged to apply a weighting function to the encoder signals and to derive a position of the stage from the weighted encoder signals.
摘要翻译： 舞台系统包括可移动舞台，至少两个编码器头，每个编码器头被构造成提供代表可移动平台相对于编码器目标结构的位置的编码器信号，以及控制器来控制舞台的位置。 控制器具有每个编码器头的编码器信号。 控制器被布置为对编码器信号应用加权函数并且从加权的编码器信号导出级的位置。
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9.发明申请Controller, Lithographic Apparatus, Method of Controlling the Position of an Object and Device Manufacturing Method 有权控制器，平版印刷设备，控制对象位置的方法和设备制造方法公开(公告)号：US20120127449A1
公开(公告)日：2012-05-24
申请号：US13275737
申请日：2011-10-18
申请人： Ramidin Izair Kamidi , Hans Butler , Martijn Houkes , Marinus Maria Johannes Van De Wal , Jeroen Johan Maarten Van De Wijdeven
发明人： Ramidin Izair Kamidi , Hans Butler , Martijn Houkes , Marinus Maria Johannes Van De Wal , Jeroen Johan Maarten Van De Wijdeven
CPC分类号： G03F7/70725 , G05B19/402 , G05B2219/41017 , G05B2219/45028 , Y02P90/265
摘要： A controller is provided that controls an actuator system having a plurality of actuators arranged to act on an object. The controller uses a gain balancing matrix to convert a first control signal, representing a set of forces desired to be provided to the centre of gravity of the object into a second control signal, representing an equivalent set of forces to be provided by the plurality of actuators. The system is further configured such that a first gain balancing matrix is used at a first frequency band and a second gain balancing matrix is used at a second frequency band.
摘要翻译： 提供了一种控制器，其控制具有布置成作用在物体上的多个致动器的致动器系统。 控制器使用增益平衡矩阵来转换第一控制信号，其表示期望被提供给对象的重心的一组力到第二控制信号中，第一控制信号表示将由多个 执行器。 该系统还被配置为使得在第一频带使用第一增益平衡矩阵，并且在第二频带使用第二增益平衡矩阵。
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公开(公告)号：US08014881B2
公开(公告)日：2011-09-06
申请号：US11706422
申请日：2007-02-15
申请人： Mark Constant Johannes Baggen , Petrus Marinus Christianus Maria Van Den Biggelaar , Yin Tim Tso , Marcel François Heertjes , Ramidin Izair Kamidi , Dennis Andreas Petrus Hubertina Houben , Constant Paul Marie Jozef Baggen , Marinus Jacobus Gerardus Van De Molengraft
发明人： Mark Constant Johannes Baggen , Petrus Marinus Christianus Maria Van Den Biggelaar , Yin Tim Tso , Marcel François Heertjes , Ramidin Izair Kamidi , Dennis Andreas Petrus Hubertina Houben , Constant Paul Marie Jozef Baggen , Marinus Jacobus Gerardus Van De Molengraft
CPC分类号： G05B5/01 , G03F7/70725 , G05B13/0265
摘要： In a lithographic apparatus, a feedforward transfer function of a control system is determined by: a) iteratively learning a feedforward output signal of the control system by iterative learning control for a given setpoint signal; b) determining a relation between the learned feedforward output signal and the setpoint signal; and c) applying the relation as the feedforward transfer function of the control system. A learned feedforward, which has been learned for one or more specific setpoint signals only, can be adapted to provide a setpoint signal dependent feedforward output signal. The learned feedforward can be made more robust against setpoint variations.
摘要翻译： 在光刻设备中，通过以下步骤来确定控制系统的前馈传递函数：a）通过针对给定设定点信号的迭代学习控制迭代地学习控制系统的前馈输出信号; b）确定所学习的前馈输出信号和设定点信号之间的关系; 和c）应用该关系作为控制系统的前馈传递函数。 已经学习的一个或多个特定设定点信号的学习前馈可以被适配成提供一个设定点信号相关的前馈输出信号。 学习的前馈可以使设定值变化更加鲁棒。
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