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    Process for the preparation or organosilicon compounds carrying sulfur-containing organic radicals
    1.
    发明授权
    Process for the preparation or organosilicon compounds carrying sulfur-containing organic radicals 失效
    用于制备含有机硅基团的有机硅化合物的方法

    公开(公告)号：US5532399A

    公开(公告)日：1996-07-02

    申请号：US190132

    申请日：1994-02-03

    申请人： Rudolf Hager ,  Josef Wolferseder ,  Bernward Deubzer

    发明人： Rudolf Hager ,  Josef Wolferseder ,  Bernward Deubzer

    IPC分类号： C07F7/08 ,  C07F7/18 ,  C08G77/00 ,  C08G77/06 ,  C08G77/28 ,  C08G77/38 ,  C08G77/392

    CPC分类号： C07F7/1868 ,  C07F7/0874 ,  C07F7/0889 ,  C08G77/28 ,  C08G77/392

    摘要： The invention relates to a process by which organosilicon compounds carrying sulfur-containing organic radicals can easily be prepared by reacting organosilicons of the general formulaR.sub.a (R.sup.1 O).sub.b R.sup.2.sub.c SiO.sub.(4-a-b-c)/2(I)in whichR can be identical or different and is a monovalent organic radical,R.sup.1 can be identical or different and is a hydrogen atom or a monovalent organic radical,R.sup.2 can be identical or different and is a radical --QX, where Q is a divalent hydrocarbon radical and X is a halogen atom,a is 0, 1, 2 or 3,b is 0, 1, 2 or 3 andc is 0, 1, 2 or 3,with the proviso that the organosilicon compound has at least one radical R.sup.2 per molecule and the sum of a, b and c is less than or equal to 4, with sulfite in the presence of water.

    摘要翻译： PCT No.PCT / EP92 / 02215 Sec。 371日期：1994年2月3日 102（e）日期1994年2月3日PCT提交1992年9月24日PCT公布。 出版物WO93 / 08228 日期：1993年04月29日本发明涉及一种通过使通式Ra（R1O）bR2cSiO（4-abc）/ 2（I）的有机硅反应生成含硫有机基团的有机硅化合物容易地制备的方法。 其中R可相同或不同，为一价有机基团，R 1可相同或不同，为氢原子或一价有机基团，R 2可相同或不同，为基团-QX，其中Q为二价烃 基团，X是卤素原子，a是0,1,2或3，b是0,1,2或3，c是0,1,2或3，条件是有机硅化合物具有至少一个基团 每个分子的R2和a，b和c的总和小于或等于4，在水存在下用亚硫酸盐。

    Radiation-curing or heat-curing organosiloxane compositions containing (methyl) styrene groups
    2.
    发明授权
    Radiation-curing or heat-curing organosiloxane compositions containing (methyl) styrene groups 失效
    含有（甲基）苯乙烯基团的辐射固化或热固化有机硅氧烷组合物

    公开(公告)号：US6068929A

    公开(公告)日：2000-05-30

    申请号：US72211

    申请日：1998-05-04

    申请人： Jochen Dauth ,  Josef Wolferseder ,  Bernward Deubzer

    发明人： Jochen Dauth ,  Josef Wolferseder ,  Bernward Deubzer

    IPC分类号： C08F299/08 ,  C08F290/14 ,  C08G77/38 ,  C08G77/46 ,  C08G77/50 ,  C08L83/07 ,  C09D155/00 ,  C09D183/07 ,  C09D183/12 ,  C09D183/14 ,  C08F283/12 ,  B32B27/00

    CPC分类号： C09D183/12 ,  C08G77/46 ,  C08G77/50 ,  C09D183/14

    摘要： Novel organosiloxane compositions which contain (methyl)styrene groups and can be prepared on the basis ofA) oligomeric or polymeric organosilicon compounds comprising at least one unit of the formulaGR.sub.c SiO.sub.(4-c-1)/2 (I)or at least one unit of the formula (I) and at least one unit of the formulaO.sub.(4-c-1)/2) R.sub.c Si--G.sup.1 --R.sub.c SiO.sub.(4-c-1)/2(II)B) monomeric alkenyloxy compounds, maleates, fumarates, maleimides, (meth)acrylates, (methyl)styrenes, acrylamides, itaconic esters and/or oligomeric or polymeric organosilicon compounds containing on average more than one alkenyloxy, maleate, fumarate, maleimide or (meth)acrylate group, where R are identical or different hydrocarbon radicals which may be halogenated or unhalogenated or a radical of the formula--R.sup.1 --[OCH.sub.2 CH.sub.2 ].sub.o --[OCH(CH.sub.3)CH.sub.2 ].sub.p --[O(CH.sub.2).sub.4 ].sub.q --OR.sup.2,whereR.sup.1 is a linear or branched alkylene radical,R.sup.2 is a hydrogen atom, an alkyl radical or a radical of the formula --CO--R.sup.3, where R.sup.3 is an alkyl radical,G is a radical of the formula (IV) --R.sup.4 -(phenyl) which is substituted by [--Y.sub.(5-d) ] and (--R.sup.5.sub.d), with the proviso that at least one radical R.sup.5 is present andG.sup.1 is a radical of the formula (V) --(phenyl)-(R.sup.4).sub.d -- which is substituted by [--Y.sub.4-d ], whereR.sup.4 is a linear or branched, substituted or unsubstituted alkylene radical,R.sup.5 is a vinyl radical or isopropenyl radical,Y can be identical or different and each Y is a hydrogen atom or is as defined for R, or is a radical of the formula --OR.sup.6, whereR.sup.6 is a C.sub.1-8 alkyl radical optionally interrupted by an ether oxygen atom, andc is 0, 1 or 2, on average from 0.0 to 2.0,d is 1, 2 or 3,o is 0 or an integer from 1 to 100,p is 0 or an integer from 1 to 100, andq is 0 or an integer from 1 to 100, with the proviso that the sum o+p+q is >0.

    摘要翻译： 含有（甲基）苯乙烯基团的新型有机硅氧烷组合物并且可以基于A）包含至少一种式GRcO（4-c-1）/ 2（I）单元的低聚或聚合有机硅化合物或至少一个单元 （4-c-1）/ 2）RcSi-G1-RcSiO（4-c-1）/ 2（II）B）单体链烯氧基化合物，马来酸酯，富马酸酯的至少一个单元 ，马来酰亚胺，（甲基）丙烯酸酯，（甲基）苯乙烯，丙烯酰胺，衣康酸酯和/或低聚或聚合的有机硅化合物，其平均含有多于一个烯氧基，马来酸酯，富马酸酯，马来酰亚胺或（甲基）丙烯酸酯基团，其中R相同或 可以被卤化或未卤化的不同烃基或式-R1- [OCH2CH2] o- [OCH（CH3）CH2]对 - [O（CH2）4] q-OR2的基团，其中R1是直链或支链 亚烷基，R2是氢原子，烷基或式-CO-R3的基团，其中R3是烷基，G是式（IV）-R4-（苯基） h被[-Y（5-d）]和（-R5d）取代，条件是存在至少一个基团R 5，并且G 1是式（Ⅴ） - （苯基） - （R 4）d - 被[-Y4-d]取代，其中R4是直链或支链的取代或未取代的亚烷基，R5是乙烯基或异丙烯基，Y可以相同或不同，并且每个Y是氢原子或是 如R所定义，或者是式-OR 6的基团，其中R 6是任选被醚氧原子中断的C 1-8烷基，c是0,1或2，平均为0.0至2.0，d为 1,2或3，o为0或1〜100的整数，p为0或1〜100的整数，q为0或1〜100的整数，条件是+ o + p + q是> 0。

    Process for preparing organosilicon compounds containing (meth)acryloxy groups
    3.
    发明授权
    Process for preparing organosilicon compounds containing (meth)acryloxy groups 失效
    制备含有（甲基）丙烯酰氧基的有机硅化合物的方法

    公开(公告)号：US5869726A

    公开(公告)日：1999-02-09

    申请号：US931723

    申请日：1997-09-16

    申请人： Jochen Dauth ,  Bernward Deubzer ,  Petra Gratzl ,  Josef Wolferseder

    发明人： Jochen Dauth ,  Bernward Deubzer ,  Petra Gratzl ,  Josef Wolferseder

    IPC分类号： C08G77/12 ,  C08G77/20 ,  C08G77/38 ,  C09D183/06 ,  C09D183/07 ,  C07F7/08

    CPC分类号： C09D183/06 ,  C08G77/38

    摘要： A novel process for preparing organosilicon compounds containing (meth)acxyloxy groups is described, in which alkoxylated alk-2-yne 1,4-di(meth)acrylates (1) of the formula ##STR1## where R.sup.2 is a hydrogen atom or a methyl radical,R.sup.3 is a linear or branched alkylene radical having from 1 to 6 carbon atoms per radical andR.sub.4 is a linear or branched alkylene radical having from 1 to 6 carbon atoms per radical, andz is an integer from 1 to 12,are reacted with organosilicon compounds (2) comprising units of the formula ##STR2## where R is an identical or different monovalent, optionally halogenated hydrocarbon radical having from 1 to 18 carbon atoms per radical, ande is 0 or 1, on average from 0.01 to 1.0,f is 0, 1, 2 or 3, on average from 0.0 to 3.0, andhaving at least one Si-bonded hydrogen atom per molecule in the presence of catalysts (3) which promote the addition Si-bonded hydrogen onto aliphatic multiple bonds and also in the presence of polymerization inhibitors (4), where alkoxylated alk-2-yne 1,4-di(meth)acrylates (1) are used in amounts of from 1.01 to 1.5 mole per gram atom of Si-bonded hydrogen in organosilicon compound (2).

    摘要翻译： 描述了制备含有（甲基）丙氧基的有机硅化合物的新方法，其中式（II）的烷氧基​​化烷基-2-炔基1,4-二（甲基）丙烯酸酯（1）其中R2是氢 原子或甲基，R3是每个基团具有1至6个碳原子的直链或支链亚烷基，R4是每个基团具有1至6个碳原子的直链或支链亚烷基，z是1至 12与包含式（III）的单元的有机硅化合物（2）反应，其中R是相对或不同的每个基团具有1至18个碳原子的单价，任选卤代烃基，e是0或1 平均为0.01〜1.0，f为0,1,2或3，平均为0.0〜3.0，在催化剂（3）的存在下，每分子具有至少一个Si键合的氢原子，促进Si的添加 键合的氢键到脂族多重键上，并且在聚合抑制剂的存在下（4）， 其中烷氧基化的烷基-2-炔1,4-二（甲基）丙烯酸酯（1）的用量为有机硅化合物（2）中每克原子的Si键合氢的1.01至1.5摩尔。

    Organosilicon compounds having fluorescent groups, their preparation and use
    5.
    发明授权
    Organosilicon compounds having fluorescent groups, their preparation and use 失效
    具有荧光基团的有机硅化合物，其制备和用途

    公开(公告)号：US6160149A

    公开(公告)日：2000-12-12

    申请号：US150888

    申请日：1998-09-10

    申请人： Jochen Dauth ,  Bernward Deubzer ,  Josef Wolferseder

    发明人： Jochen Dauth ,  Bernward Deubzer ,  Josef Wolferseder

    IPC分类号： G01N21/91 ,  C07F7/08 ,  C07F7/10 ,  C07F7/18 ,  C08F299/08 ,  C08G77/20 ,  C08G77/38 ,  C08G77/388 ,  C08G77/392 ,  C08J3/24 ,  C08L83/07 ,  C09B69/10 ,  C09D5/00 ,  C09D5/22 ,  C09D183/07 ,  C09D183/08 ,  C09K11/00 ,  C09K11/06

    CPC分类号： C08G77/388 ,  C08G77/392 ,  C09D183/08

    摘要： The invention describes novel organosilicon compounds having fluorescent groups, containing units of the formula ##EQU1## where R is an identical or different, a monovalent, optionally substituted hydrocarbon radical having from 1 to 18 carbon atom(s) per radical, which may be interrupted by one or more oxygen atom(s),X is identical or different, and is a chlorine atom or a radical of the formula OR.sup.1,whereR.sup.1 is a hydrogen atom, or an alkyl radical having from 1 to 8 carbon atom(s) per radical which may be substituted by an ether oxygen atom,E is an organic radical having one or more (meth)acrylate groups,A is a radical of the formula--R.sup.2 [--NR.sup.3 --L].sub.x or --R.sup.2 [--S--L].sub.x(II),whereR.sup.2 is a divalent or trivalent, optionally substituted hydrocarbon radical having from 2 to 50 carbon atoms per radical, which is substituted by one or more groups of the formulae ##STR1## x is 1 or 2, R.sup.3 is as defined for R.sup.1 or is a radical of the formula --C(.dbd.O)--R.sup.1, andL is a fluorescent, organic radical,a is 0, 1 or 2, b is 0, 1, 2 or 3, c is 0, 1, 2 or 3, d is 0, 1 or 2 and the sum a+b+c+d.ltoreq.4,with the proviso that at least one radical A is present per molecule.

    摘要翻译： 本发明描述了具有荧光基团的新型有机硅化合物，其含有下式的单元，其中R是相同或不同的，每个基团具有1至18个碳原子的单价任选取代的烃基，其可被一个或多个 更多的氧原子，X是相同或不同的，并且是氯原子或式OR1的基团，其中R1是氢原子或每个基团具有1至8个碳原子的烷基，其中 可以被醚氧原子取代，E是具有一个或多个（甲基）丙烯酸酯基团的有机基团，A是式-R 2 [-NR 3 -L] x或-R 2 [-SL] x（II ），其中R 2是每个基团具有2至50个碳原子的二价或三价任选取代的烃基，其被一个或多个式x所代表的基团取代为1或2，R 3如对R 1所定义或是 式-C（= O）-R1的基团，L是荧光的有机基团，a是0,1或2，b是0,1或2， 2或3，c是0,1,2或3，d是0,1或2，并且和a + b + c + d 4，条件是每个分子存在至少一个基团A.

    Radiation-curing compositions
    7.
    发明授权
    Radiation-curing compositions 失效
    辐射固化组合物

    公开(公告)号：US06437015B2

    公开(公告)日：2002-08-20

    申请号：US09775767

    申请日：2001-02-02

    申请人： Jochen Dauth ,  Christian Herzig ,  Josef Wolferseder ,  Oliver Zoellner

    发明人： Jochen Dauth ,  Christian Herzig ,  Josef Wolferseder ,  Oliver Zoellner

    IPC分类号： C08J328

    CPC分类号： C09D183/06 ,  C09D183/14 ,  C08L2666/28

    摘要： Radiation-curable compositions containing linear organopolysiloxanes bearing (meth)acryloxy groups and a photosensitizer are useful for release coatings particularly release coatings with enhanced adhesion to the substrate onto which they are coated, for example those used for adhesives such as pressure sensitive adhesive labels.

    摘要翻译： 含有带有（甲基）丙烯酰氧基的线性有机聚硅氧烷和光敏剂的可辐射固化组合物可用于脱模涂层，特别是具有增强的与其所涂覆的基材的粘附性的剥离涂层，例如用于粘合剂如压敏粘合剂标签的那些。