公开(公告)号：US08933629B2

公开(公告)日：2015-01-13

申请号：US14075026

申请日：2013-11-08

Applicant: Ruhr-Universität Bochum

Inventor： Brian George Heil ,  Uwe Czarnetzki ,  Ralf Peter Brinkmann ,  Thomas Mussenbrock

IPC: H01J7/24 ,  H01J31/26 ,  H01J13/48 ,  H01J15/04 ,  H01J17/36 ,  H05B37/00 ,  H05B39/00 ,  H05B41/00 ,  H01J37/32 ,  H01J37/04 ,  B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00

CPC classification number: H01J37/04 ,  H01J37/32009 ,  H01J37/32091 ,  H01J37/32146 ,  H01J37/32165 ,  H01J37/32706

Abstract: A method of establishing a DC bias in front of at least one electrode in a plasma operating apparatus by applying an RF voltage with at least two harmonic frequency components with a controlled relative phase between the components, where at least one of the higher frequency components is established as an even multiple of the lower frequency component.

Abstract translation: 一种在等离子体操作装置中在至少一个电极前面建立直流偏压的方法，该方法是通过施加具有至少两个谐波频率分量的RF电压，该至少两个谐波频率分量与组件之间具有受控的相对相位，其中至少一个较高频率分量为 建立为低频分量的偶数倍。