CASSEGRAIN MICROWAVE ANTENNA
    1.
    发明申请

    公开(公告)号:US20150364828A1

    公开(公告)日:2015-12-17

    申请号:US14235058

    申请日:2011-11-24

    CPC classification number: H01Q19/062 H01Q15/0086 H01Q15/10 H01Q19/065

    Abstract: Disclosed is a Cassegrain microwave antenna, which comprises a radiation source, a first metamaterial panel used for radiating an electromagnetic wave emitted by the radiation source, and a second metamaterial panel having an electromagnetic wave convergence feature and used for converting into plane wave the electromagnetic wave radiated by the first metamaterial panel. Employment of the principle of metamaterial for manufacturing the antenna allows the antenna to break away from restrictions of conventional concave lens shape, convex lens shape, and parabolic shape, thereby allowing the shape of the Cassegrain microwave antenna to be panel-shaped or any shape as desired, while allowing for reduced thickness, reduced size, and facilitated processing and manufacturing, thus providing beneficial effects of reduced costs and improved gain effect.

    Abstract translation: 公开了一种卡塞格伦微波天线,其包括辐射源,用于辐射由辐射源发射的电磁波的第一超材料面板和具有电磁波会聚特征的第二超材料面板,用于将电磁波转换为平面波 由第一个超材料面板辐射。 采用超材料制造天线的原理可以使天线脱离常规凹透镜形状,凸透镜形状和抛物线形状的限制,从而使卡塞格伦微波天线的形状成为面板形或任何形状 期望,同时允许减小厚度,减小尺寸,并且促进加工和制造,从而提供降低成本和改善增益效果的有益效果。

    FRONT FEED MICROWAVE ANTENNA
    2.
    发明申请
    FRONT FEED MICROWAVE ANTENNA 有权
    前馈麦克风天线

    公开(公告)号:US20140320361A1

    公开(公告)日:2014-10-30

    申请号:US14235079

    申请日:2011-11-24

    Abstract: A front feed microwave antenna, which comprises a radiation source, a first metamaterial panel used for radiating an electromagnetic wave emitted by the radiation source, a second metamaterial panel, and a reflective panel affixed to the back of the first metamaterial panel. The electromagnetic wave is emitted via the first metamaterial panel, refracted by entering the second metamaterial panel, reflected by the reflective panel, and finally re-refracted by reentering the second metamaterial panel, then finally parallel-emitted. Employment of the principle of metamaterial for manufacturing the antenna allows the antenna to break away from restrictions of conventional concave lens shape, convex lens shape, and parabolic shape, thereby allowing the shape of the antenna to be panel-shaped or any shape as desired, while allowing for reduced thickness, reduced size, facilitated processing and manufacturing, reduced costs, and improved gain effect.

    Abstract translation: 一种前馈微波天线,其包括辐射源,用于辐射由辐射源发射的电磁波的第一超材料面板,第二超材料面板和固定到第一超材料面板背面的反射面板。 电磁波通过第一超材料面板发射,通过进入第二超材料面板进行折射,由反射板反射,最后通过重新进入第二超材料面板再次折射,然后最终平行发射。 采用超材料制造天线的原理可以使天线摆脱常规凹透镜形状,凸透镜形状和抛物线形状的限制,从而使天线的形状成为面板形状或任意形状, 同时允许减小厚度,减小尺寸,促进加工和制造,降低成本和改善增益效果。

    Cassegrain microwave antenna
    3.
    发明授权

    公开(公告)号:US09666953B2

    公开(公告)日:2017-05-30

    申请号:US14235058

    申请日:2011-11-24

    CPC classification number: H01Q19/062 H01Q15/0086 H01Q15/10 H01Q19/065

    Abstract: Disclosed is a Cassegrain microwave antenna, which comprises a radiation source, a first metamaterial panel used for radiating an electromagnetic wave emitted by the radiation source, and a second metamaterial panel having an electromagnetic wave convergence feature and used for converting into plane wave the electromagnetic wave radiated by the first metamaterial panel. Employment of the principle of metamaterial for manufacturing the antenna allows the antenna to break away from restrictions of conventional concave lens shape, convex lens shape, and parabolic shape, thereby allowing the shape of the Cassegrain microwave antenna to be panel-shaped or any shape as desired, while allowing for reduced thickness, reduced size, and facilitated processing and manufacturing, thus providing beneficial effects of reduced costs and improved gain effect.

    Overlay alignment system using polarization schemes
    5.
    发明授权
    Overlay alignment system using polarization schemes 失效
    使用偏振方案的覆盖对准系统

    公开(公告)号:US06525818B1

    公开(公告)日:2003-02-25

    申请号:US09500110

    申请日:2000-02-08

    CPC classification number: G03F9/7065 G03F9/7069

    Abstract: An optical alignment system used in the manufacture of semiconductor integrated circuits determines and adjusts the alignment between features which have been formed on a semiconductor wafer and features on a mask which is being projected onto the semiconductor wafer. Light which illuminates the semiconductor wafer is scattered and diffracted into a dark-field detector system. This results in the generation of electrical signals which are used to position the mask relative to the semiconductor wafer. The use of polarized light in the present system results in an increase in the magnitude of the desired signals and a decrease in the magnitude of the spurious signals. To improve the quality of the signals, the angle of polarization of the light is adjusted to a specific relationship with respect to the geometry of the alignment marks on the semiconductor wafer.

    Abstract translation: 在半导体集成电路的制造中使用的光学对准系统确定并调整已经形成在半导体晶片上的特征之间的对准以及投射到半导体晶片上的掩模上的特征。 照射半导体晶片的光被散射并衍射成暗场检测器系统。 这导致产生用于将掩模相对于半导体晶片定位的电信号。 在本系统中使用偏振光导致期望信号的幅度增加和寄生信号的幅度的减小。 为了提高信号的质量,将光的偏振角相对于半导体晶片上的对准标记的几何形状调整为特定的关系。

    Controlled selectivity etch for use with optical component fabrication
    6.
    发明授权
    Controlled selectivity etch for use with optical component fabrication 有权
    用于光学元件制造的受控选择性蚀刻

    公开(公告)号:US07005247B1

    公开(公告)日:2006-02-28

    申请号:US10345709

    申请日:2003-01-15

    Abstract: A method of fabricating an optical component includes forming a mask on an optical component precursor. The method also includes etching through at least a portion of the mask so as to etch an underlying medium concurrently with remaining mask and transfer a feature of an upper surface of the mask onto an upper surface of the underlying medium. The etch can be configured such that a ratio of the underlying medium etch rate to the mask etch rate is less than about 1.5:1. In some instances, the underlying medium is silicon and the mask is a photoresist.

    Abstract translation: 制造光学部件的方法包括在光学部件前体上形成掩模。 该方法还包括蚀刻通过掩模的至少一部分,以便与剩余的掩模同时蚀刻下面的介质,并将掩模的上表面的特征转移到下面的介质的上表面上。 蚀刻可以被配置为使得下面的介质蚀刻速率与掩模蚀刻速率的比值小于约1.5:1。 在一些情况下,下面的介质是硅,掩模是光致抗蚀剂。

    Tunable add/drop node
    7.
    发明授权
    Tunable add/drop node 有权
    可调节添加/删除节点

    公开(公告)号:US06810168B1

    公开(公告)日:2004-10-26

    申请号:US10158399

    申请日:2002-05-30

    Abstract: An add/drop node is disclosed. The add/drop node includes a first filter configured to receive a light beam having a plurality of channels. The first filter is also configured to direct channels having wavelengths falling within a plurality of first wavelength bands to a transition waveguide. The add/drop node also includes a second filter configured to receive the channels directed to the transition waveguide. The second filter is configured to direct channels having wavelengths falling within a plurality of second wavelength bands to a drop waveguide. The first filter and/or the second filter can be tunable.

    Abstract translation: 公开了一种添加/删除节点。 添加/分出节点包括被配置为接收具有多个信道的光束的第一滤波器。 第一滤波器还被配置为将具有落入多个第一波长带内的波长的信道引导到过渡波导。 添加/分出节点还包括被配置为接收指向过渡波导的信道的第二滤波器。 第二滤波器被配置为将具有落入多个第二波长带内的波长的信道引导到液滴波导。 第一过滤器和/或第二过滤器可以是可调谐的。

    Waveguide tap monitor
    8.
    发明授权
    Waveguide tap monitor 有权
    波导龙头监视器

    公开(公告)号:US06885795B1

    公开(公告)日:2005-04-26

    申请号:US10161208

    申请日:2002-05-31

    CPC classification number: G02B6/125 G02B6/12004 G02B6/122 G02B2006/12097

    Abstract: An optical component is disclosed. The optical component includes a tap waveguide and a primary waveguide positioned on a base. The tap waveguide is configured to receive a portion of a light signal traveling along the primary waveguide. The portion of the light signal received by the tap waveguide is the tapped portion of the light signal. A direction changing region is configured to receive the tapped portion of the light signal from the tap waveguide and to direct the tapped portion of the light signal travels away from the base. A light sensor is configured to receive the tapped portion of the light signal from the direction changing region.

    Abstract translation: 公开了一种光学部件。 光学部件包括位于基座上的抽头波导和主波导。 抽头波导被配置为接收沿着主波导行进的光信号的一部分。 由抽头波导接收的光信号的部分是光信号的抽头部分。 方向改变区域被配置为接收来自分接波导的光信号的抽头部分,并且引导光信号的抽头部分离开基极行进。 光传感器被配置为从方向改变区域接收光信号的抽头部分。

    Enhanced overlay measurement marks for overlay alignment and exposure tool condition control
    9.
    发明授权
    Enhanced overlay measurement marks for overlay alignment and exposure tool condition control 失效
    增强覆盖测量标记,用于覆盖对齐和曝光工具条件控制

    公开(公告)号:US06727989B1

    公开(公告)日:2004-04-27

    申请号:US09597123

    申请日:2000-06-20

    CPC classification number: G03F7/70633

    Abstract: In an overlay measurement mark comprising an inner box and an outer box located at a predetermined area on a mask through which patterns are formed on a semiconductor device, the improvement of an overlay mark that extends the overlay measurement range comprising: in-focused marks means printed at an optimal or ideal focal plane level from an illumination source, and de-focused marks means located at a different focus level from the optimal focal plane to provide image placement shift of the de-focused marks larger than that of the in-focused marks means to enable measurement of the shift of de-focused marks that are not attributable to a mechanical alignment error to be determined with greater accuracy.

    Abstract translation: 在覆盖测量标记中,包括位于掩模上的预定区域的内盒和外箱,通过图形形成在半导体器件上的预定区域,扩展重叠测量范围的重叠标记的改进包括:聚焦内标记装置 以最佳或理想的焦平面级别从照明源打印,以及去焦点标记装置,其位于与最佳焦平面不同的聚焦水平上,以提供去焦点标记的图像放置位移大于聚焦点 标记意味着能够更准确地确定不归因于机械对准误差的脱焦标记的偏移的测量。

    Efficient coupling of optical fiber to optical component

    公开(公告)号:US06614965B2

    公开(公告)日:2003-09-02

    申请号:US09854425

    申请日:2001-05-11

    Applicant: Xiaoming Yin

    Inventor: Xiaoming Yin

    CPC classification number: G02B6/30 G02B6/4207

    Abstract: A method of preparing an optical component for coupling with an optical fiber is disclosed. The method includes determining a thickness of a buffer layer formed on the optical component. The method also includes forming an anti reflective coating adjacent to the buffer layer. The anti reflective coating is formed to a thickness selected in response to the determined buffer layer thickness.

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