摘要:
An apparatus and method are provided for forming one dimensional nanostructures. The method comprises ink jet printing (52) a plurality of catalyst particles (36) on a substrate (32). A gas (20) is applied (54) to the catalyst particles (36) while simultaneously applying (56) microwave radiation (38).
摘要:
A method provides a simple yet reliable technique to assemble one-dimensional nanostructures selectively in a desired pattern for device applications. The method comprises forming a plurality of spaced apart conductive elements (12, 20) in a sequential pattern (26) on a substrate (17) and immersing the plurality of spaced apart conductive elements (12, 20) in a solution (23) comprising a plurality of one-dimensional nanostructures (22). A voltage is applied to one of the plurality of spaced apart conductive elements (12, 20) formed in the sequential pattern (26), thereby causing portions of the plurality of one-dimensional nanostructures (22) to migrate between adjacent conductive elements (12, 20) in sequence beginning with the one of the plurality of spaced apart conductive elements (12, 20) to which the voltage is applied.
摘要:
An improved and novel method of selectively aligning and positioning nanometer-scale components using AC fields. The method provides for more precise manipulation of the nanometer-scale components in bridging test electrodes including the steps of: providing an alternating current (AC) field at a single electrode or between a plurality of electrodes to create an electric field in an environment containing nanometer-scale components. The electric field thereby providing for the aligning and positioning of the nanometer-scale components to the desired location.
摘要:
A method is provided that produces a good, strong organic monomolecular film having its atoms arranged in a three-dimensionally ordered manner by cleaving a III-V group compound semiconductor substrate in film formation molecules or in a solution containing them, in order to cause selective chemisorption which forms a monomolecular film and then deposits another layer of organic molecule film. In this method, the III-V group compound semiconductor substrate is cleaved in a solution containing SH groups dissolved into a solvent in order to form a self-assembled monolayer and is then placed in another solution, where metallic ions are adsorbed to the surface of the film or where the functional groups are converted by chemical treatment. The substrate is then immersed in a solution containing organic molecules that are selectively chemisorbed to the functional groups. This process is sequentially repeated to form good, strong multilayers having a three-dimensionally ordered arrangement while also controlling film thickness.