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公开(公告)号：US5887644A
公开(公告)日：1999-03-30
申请号：US801925
申请日：1997-02-14
申请人： Ryo Akiyoshi , Masayoshi Hori , Kunio Matsui , Atsushi Hirata , Koichi Fujita , Shu Ogawa
发明人： Ryo Akiyoshi , Masayoshi Hori , Kunio Matsui , Atsushi Hirata , Koichi Fujita , Shu Ogawa
IPC分类号： B22D11/06 , B22D11/128 , B22D11/124
CPC分类号： F28F5/02 , B22D11/0682
摘要： A casting roll (18) for a twin roll continuous caster comprises a roll body (19) made of a metal material having high rigidity and a sleeve (20) made of a metal material having high thermal conductivity for covering an outer periphery of the roll body (19). A plurality of load bearing members (23) with thicker width are provided peripherally on the outer periphery of the roll body (19), the load bearing members (23) being in contact with an inner periphery of the sleeve (20) and extending axially of the roll. A plurality of fins (24) with thinner width and shorter in height than the load bearing members (23) are provided on the inner periphery of the sleeve (20) between the adjacent load bearing members (23) and extending axially of the roll, cooling water passages (25) being provided in the form of gaps defined between the roll body (19) and the sleeve (20) thereby providing a roll having sufficiently high rigidity to prevent or at least minimise damage of the cooling water passages when the solidified shells are brought together between the rolls and/or having an enhanced heat transfer area.
摘要翻译： 用于双辊连铸机的铸辊（18）包括由具有高刚度的金属材料制成的辊体（19）和由用于覆盖辊的外周的具有高导热性的金属材料制成的套筒（20） 身体（19）。 多个宽度较大的承载构件（23）周向设置在辊体（19）的外周上，承载构件（23）与套筒（20）的内周接触并沿轴向延伸 的卷。 在相邻的承载构件（23）之间的套筒（20）的内周上设置有多个与承载构件（23）相比具有较薄的宽度和较短的翼片（24） 冷却水通道（25）以限定在辊体（19）和套管（20）之间的间隙的形式提供，从而提供具有足够高刚性的辊，以防止或至少最小化冷凝水通道的损伤 壳体在辊之间并且/或具有增强的传热面积被聚集在一起。
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公开(公告)号：US06623183B2
公开(公告)日：2003-09-23
申请号：US10068809
申请日：2002-02-06
IPC分类号： G03D302
CPC分类号： G03D3/00 , Y10T137/0329
摘要： The developer producing equipment of the present invention is connected via piping to working equipment in which electronic circuits, on which fine working is performed, are formed, and produces an alkali type developer used in the abovementioned working equipment. This developer producing equipment comprises a preparation tank to which a developer stock solution and pure water are supplied, and in which these are agitated, first liquid amount measuring means for measuring the amount of the alkali type developer inside the preparation tank, first alkali concentration measuring means for measuring the alkali concentration of the abovementioned alkali type developer, first liquid amount control means for adjusting the amount of the alkali type developer inside the preparation tank on the basis of the measured value obtained by the abovementioned first liquid amount measuring means the abovementioned first alkali concentration measuring means, and liquid supply control means.
摘要翻译： 本发明的显影剂生产设备通过管道连接到其上形成精细加工的电子电路的工作设备，并且生产用于上述工作设备中的碱型显影剂。 该显影剂制造装置包括：供给显影剂储备液和纯水的制剂槽，搅拌其中的第一液量测量装置，用于测量制备罐内的碱式显影剂的量，第一碱浓度测定 用于测量上述碱性显影剂的碱浓度的装置，用于根据由上述第一液量测量装置获得的测量值调节制备罐内的碱式显影剂的量的第一液量控制装置， 碱浓度测量装置和液体供应控制装置。
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公开(公告)号：US06302600B1
公开(公告)日：2001-10-16
申请号：US09577045
申请日：2000-05-24
申请人： Hideo Nagase , Shu Ogawa , Kiyoshi Kamibayashi , Makoto Kikukawa , Takahiro Houzan , Toshimoto Nakagawa , Mitsumoto Nakagawa
发明人： Hideo Nagase , Shu Ogawa , Kiyoshi Kamibayashi , Makoto Kikukawa , Takahiro Houzan , Toshimoto Nakagawa , Mitsumoto Nakagawa
IPC分类号： G03D500
CPC分类号： G03D5/04 , G03F7/3071 , G03F7/3092 , G03F7/422
摘要： The apparatus for treating surface of boards includes treating means for treating surface of boards by supplying sequentially a treating solution and a rinse liquid on boards placed on a treating table; solution collecting means for collecting waste treating solution separately from waste rinse liquid; waste solution storing, concentrating detecting and solution supplementing means for storing the waste treating solution, detecting the concentration of at least one ingredient in the waste treating solution by an electric conductivity meter and/or an absorption photometer, supplementing treating solution for adjusting containing necessary ingredients depending on the detected value, and adjusting the treating solution; and treating solution feed means for feeding the adjusted treating solution into the treating means. By thus constructing, the treating solution can be recycled, and if recycling is repeated, the performance of the treating solution itself can be maintained.
摘要翻译： 用于处理板表面的设备包括处理装置，用于通过在放置在处理台上的板上依次提供处理溶液和冲洗液来处理板的表面; 用于从废液冲洗液中分离收集废物处理液的溶液收集装置; 用于存储废物处理溶液的废液储存，浓缩检测和溶液补充装置，通过电导率计和/或吸收光度计检测废物处理溶液中至少一种成分的浓度，补充处理溶液以调节含有必需成分 取决于检测值，并调整处理液; 以及处理溶液进料装置，用于将经调节的处理溶液进料到处理装置中。 通过这样构成，处理溶液可以再循环，如果重复循环，则可以维持处理液本身的性能。
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公开(公告)号：US07109037B2
公开(公告)日：2006-09-19
申请号：US10183833
申请日：2002-06-25
申请人： Toshimoto Nakagawa , Yuko Katagiri , Shu Ogawa , Satoru Morita , Makoto Kikukawa
发明人： Toshimoto Nakagawa , Yuko Katagiri , Shu Ogawa , Satoru Morita , Makoto Kikukawa
CPC分类号： H01L21/67253 , G03F7/422 , Y10T436/12
摘要： The water-based resist stripping liquid management apparatus according to the present invention manages in an adjusting bath a water-based resist stripping liquid that is used in resist stripping equipment. In this apparatus, an absorptiometer that measures the water concentration in the water-based resist stripping liquid and an electrical conductivity meter that measures the degraded component concentration in the water-based resist stripping liquid are connected to a resist stripping treatment bath (adjusting bath) via pipelines, and at least one of a resist stripping stock liquid, a resist stripping reclaimed liquid, pure water, and a premixed resist stripping new liquid are fed into the resist stripping treatment bath in accordance with the measurement values obtained. As a result, the resist stripping performance of the water-based resist stripping liquid can be stably maintained, the amount of liquid used can be reduced, and the time for which operation is shut down can be reduced.
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公开(公告)号：US5810070A
公开(公告)日：1998-09-22
申请号：US773946
申请日：1996-12-30
申请人： Shiro Osada , Heiji Kato , Shuzo Takahashi , Shu Ogawa
发明人： Shiro Osada , Heiji Kato , Shuzo Takahashi , Shu Ogawa
IPC分类号： B22D11/06
CPC分类号： B22D11/066
摘要： To suppress wear of side surfaces of end closures due to rotation of cooling rolls in a twin roll strip caster, a pair of housings 11 are provided, each arranged to face on end faces of one or the other ends of cooling rolls 1a and 1b, which are arranged substantially horizontally and in parallel with each other, so that it may be displaced toward and away from the end faces, rolling members 12 rotatably supported by each of said housings 11 so that they may contact the corresponding end faces of the rolls 1a and 1b, a thruster body 21 supported on each of the housings 11 so that it may be displaced toward and away from the corresponding end faces of the rolls 1a and 1b, and an end closure 3 loaded on each of the thruster bodies 21 so that it may closely contact upper portions of the end faces of the rolls 1a and 1b. When the end closure 3 is worn to a predetermined extent, then the rolling members 12 contact the end faces of the rolls 1a and 1b to thereby suppress wear of the end closure 3.
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公开(公告)号：US5896874A
公开(公告)日：1999-04-27
申请号：US810816
申请日：1997-03-06
IPC分类号： G03F7/42 , G05D11/13 , H01L21/027 , H01L21/306 , B08B3/04
CPC分类号： G03F7/425 , G05D11/138
摘要： In a semiconductor manufacturing process or a liquid crystal board manufacturing process, a resist stripping solution blending an organic alkali and an organic solvent is used for stripping the resist completely from the board. An apparatus for controlling this resist stripping solution comprises a resist stripping solution discharge device for discharging the resist stripping solution by detecting the dissolved resist concentration in the resist stripping solution by using an absorption photometer, a source solution and water replenishing device for replenishing the resist stripping source solution and pure water by detecting the liquid level of the resist stripping solution by a liquid level gauge, and a source solution and/or water replenishing device for replenishing at least one of the resist stripping source solution pure water by detecting the water concentration of the resist stripping solution by using an another absorption photometer. As a result, in an apparatus for controlling a resist stripping solution used in resist stripping in a semiconductor manufacturing process or a liquid crystal board manufacturing process, the quality of the resist stripping solution is controlled constantly, the solution consumption is saved, the operation down time is reduced, and the cost is lowered.
摘要翻译： 在半导体制造工艺或液晶板制造工艺中，使用混合有机碱和有机溶剂的抗蚀剂剥离溶液来完全剥离抗蚀剂。 用于控制该抗蚀剂剥离溶液的装置包括：抗蚀剂剥离溶液排出装置，用于通过使用吸收光度计，用于补充抗蚀剂剥离的源溶液和水补充装置检测抗蚀剂剥离溶液中溶解的抗蚀剂浓度来排出抗蚀剂剥离溶液 源液和纯水，通过液位计检测抗蚀剂剥离溶液的液面，以及源溶液和/或水补充装置，用于通过检测抗蚀剂剥离源溶液纯水中的至少一种来补充至少一种抗蚀剂剥离源溶液纯水 通过使用另一种吸收光度计的抗蚀剂剥离溶液。 结果，在半导体制造工序或液晶板制造工序中，在抗蚀剂剥离中使用的抗蚀剂剥离液的控制装置中，不断地控制抗蚀剂剥离液的质量，节省溶液消耗，降低操作 时间缩短，成本降低。
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公开(公告)号：US5871039A
公开(公告)日：1999-02-16
申请号：US979479
申请日：1997-11-26
申请人： Shiro Osada , Heiji Kato , Shuzo Takahashi , Shu Ogawa
发明人： Shiro Osada , Heiji Kato , Shuzo Takahashi , Shu Ogawa
IPC分类号： B22D11/06
CPC分类号： B22D11/066
摘要： To suppress wear of side surfaces of end closures due to rotation of cooling rolls in a twin roll strip caster, a pair of housings 11 are provided, each arranged to face on end faces of one or the other ends of cooling rolls 1a and 1b, which are arranged substantially horizontally and in parallel with each other, so that it may be displaced toward and away from the end faces, rolling members 12 rotatably supported by each of said housings 11 so that they may contact the corresponding end faces of the rolls 1a and 1b, a thruster body 21 supported on each of the housings 11 so that it may be displaced toward and away from the corresponding end faces of the rolls 1a and 1b, and an end closure 3 loaded on each of the thruster bodies 21 so that it may closely contact upper portions of the end faces of the rolls 1a and 1b. When the end closure 3 is worn to a predetermined extent, then the rolling members 12 contact the end faces of the rolls 1a and 1b to thereby suppress wear of the end closure 3.
摘要翻译： 为了抑制由于双辊带式连铸机中的冷却辊的旋转导致的端盖的侧面的磨损，设置有一对壳体11，每个壳体11布置成面对冷却辊1a和1b的一端或另一端的端面， 它们基本上水平并且彼此平行地布置，使得其可以朝向和远离端面移动，滚动构件12由每个所述壳体11可旋转地支撑，使得它们可以接触辊1a的相应端面 1b是支撑在每个壳体11上的推进器主体21，使得其可以朝向和远离辊1a和1b的相应端面移动，并且装在每个推进器主体21上的端盖3，使得 它可能紧密接触辊1a和1b的端面的上部。 当端盖3被磨损到预定的程度时，滚动体12接触辊1a和1b的端面，从而抑制端盖3的磨损。
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公开(公告)号：US5671760A
公开(公告)日：1997-09-30
申请号：US352739
申请日：1994-12-02
摘要： A resist stripping solution is used in the stripping of resist in a liquid crystal board manufacturing process or semiconductor manufacturing process. The apparatus for controlling the resist stripping solution comprises a resist stripping solution discharge device for discharging resist stripping solution by detecting the dissolved resist concentration in the resist stripping solution using an absorption photometer, first replenishing device for replenishing organic solvent and alkanolamine such as MEA or the like by detecting the liquid level of the resist stripping solution using a liquid level gauge, and second replenishing device for replenishing at least one of organic solvent and alkanolamine such as MEA or the like by detecting the concentration of alkanolamine such as MEA or the like of the resist stripping solution by an absorption photometer. As a result, the quality of the resist stripping solution can always be constant, and the consumption volume of the solution, the operation down time and the cost can be notably reduced.
摘要翻译： 抗蚀剂剥离溶液用于液晶板制造工艺或半导体制造工艺中的抗蚀剂剥离。 用于控制抗蚀剂剥离溶液的装置包括用于通过使用吸收光度计检测抗蚀剂剥离溶液中的溶解的抗蚀剂浓度来排出抗蚀剂剥离溶液的抗蚀剂剥离溶液放电装置，用于补充有机溶剂的第一补充装置和诸如MEA的链烷醇胺或 例如通过使用液位计检测抗蚀剂剥离溶液的液面，以及通过检测诸如MEA等的链烷醇胺的浓度等来补充有机溶剂和链烷醇胺如MEA等中的至少一种的第二补充装置 抗蚀剂剥离溶液由吸收光度计。 因此，抗蚀剂剥离溶液的质量始终是恒定的，并且可以显着降低溶液的消耗量，操作停机时间和成本。
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公开(公告)号：US07134481B2
公开(公告)日：2006-11-14
申请号：US10550412
申请日：2003-11-11
申请人： Shiro Osada , Osamu Takeuchi , Shu Ogawa
发明人： Shiro Osada , Osamu Takeuchi , Shu Ogawa
IPC分类号： B22D11/06
CPC分类号： B22D11/0622 , B22D11/0671
摘要： A casting roll unit (U) with side weirs (6) and a delivery nozzle (8) being detachably attached thereto is fixed at a casting position. Side-weir and delivery-nozzle preheating furnaces (29, 30) are arranged away from the casting roll unit (U). Arranged adjacent to the roll unit (U) are replacing robots (31, 32) which can selectively clamp the side weirs (6) or the delivery nozzle or nozzles (8) and which can move between the roll unit (U) and the side-weir or delivery-nozzle preheating furnace (29 or 30) for installation/removal of the side weirs (6) or delivery nozzle or nozzles (8).
摘要翻译： 具有可拆卸地附接到其上的侧堰（6）和输送喷嘴（8）的铸辊单元（U）固定在铸造位置。 侧浇口和输送喷嘴预热炉（29,30）远离铸辊单元（U）布置。 邻近轧辊单元（U）布置的是更换可以选择性地夹紧侧堰（6）或输送喷嘴或喷嘴（8）的机器人（31,32），并可在辊单元（U）和侧 - 用于安装/拆卸侧堰（6）或输送喷嘴或喷嘴（8）的装置或输送喷嘴预热炉（29或30）。
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公开(公告)号：US20060196628A1
公开(公告)日：2006-09-07
申请号：US10550412
申请日：2003-11-11
申请人： Shiro Osada , Osamu Takeuchi , Shu Ogawa
发明人： Shiro Osada , Osamu Takeuchi , Shu Ogawa
IPC分类号： B22D11/06
CPC分类号： B22D11/0622 , B22D11/0671
摘要： A casting roll unit (U) with side weirs (6) and a delivery nozzle (8) being detachably attached thereto is fixed at a casting position. Side-weir and delivery-nozzle preheating furnaces (29, 30) are arranged away from the casting roll unit (U). Arranged adjacent to the roll unit (U) are replacing robots (31, 32) which can selectively clamp the side weirs (6) or the delivery nozzle or nozzles (8) and which can move between the roll unit (U) and the side-weir or delivery-nozzle preheating furnace (29 or 30) for installation/removal of the side weirs (6) or delivery nozzle or nozzles (8).
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