Developing treatment apparatus and developing treatment method
    2.
    发明申请
    Developing treatment apparatus and developing treatment method 有权
    开发治疗仪器和开发治疗方法

    公开(公告)号:US20070031145A1

    公开(公告)日:2007-02-08

    申请号:US11495732

    申请日:2006-07-31

    IPC分类号: G03D5/00

    摘要: In the present invention, a substrate transfer unit into/from which a substrate is transferred from/to the outside of a treatment container and a developing treatment unit in which development of the substrate is performed are arranged side by side in the treatment container, and a carrier mechanism is provided which carries the substrate while grasping an outside surface of the substrate from both sides, between the substrate transfer unit and the developing treatment unit. A developing solution supply nozzle for supplying a developing solution onto the substrate and a gas blow nozzle for blowing a gas to the substrate, are provided between the substrate transfer unit and the developing treatment unit and above a carriage path along which the substrate is carried, and a cleaning solution supply nozzle is provided in the developing treatment unit for supplying a cleaning solution onto the substrate. According to the present invention, since the substrate is carried with its outside surface being grasped, spread of contamination can be prevented to restrain generation of particles in the treatment container.

    摘要翻译: 在本发明中,在处理容器中并排设置有将基板从处理容器的外部转移到基板转移单元和进行基板的显影的显影处理单元,并且 提供了一种承载机构,其承载基板,同时从基板转印单元和显影处理单元之间的两侧抓住基板的外表面。 用于将显影液供给到基板上的显影液供给喷嘴和用于将气体吹送到基板的气体吹出喷嘴设置在基板转印单元和显影处理单元之间以及载置基板的滑架路径上方, 并且在显影处理单元中设置清洁液供给喷嘴,用于将清洗液供给到基板上。 根据本发明,由于基板的外表面被抓住,因此可以防止污染物的扩散,从而抑制处理容器中的颗粒的产生。

    Apparatus for removing developing solution
    3.
    发明申请
    Apparatus for removing developing solution 有权
    去除显影液的装置

    公开(公告)号:US20050238350A1

    公开(公告)日:2005-10-27

    申请号:US11111141

    申请日:2005-04-20

    摘要: An apparatus (3) for removing developing solution from a substrate (30) includes a working table (36) for placing the substrate, a supporting frame (33) positioned on the working table, a gas dispensing nozzle (31) mounted on the supporting frame, and a water dispensing nozzle (32) mounted on the supporting frame. The apparatus can remove the residual developing solution from the substrate and needs not to lift the substrate. The substrate is safely processed and the working time is improved.

    摘要翻译: 一种用于从基板(30)去除显影液的装置(3),包括:放置基板的工作台(36),位于工作台上的支撑框架(33),安装在支撑件上的气体分配喷嘴 框架和安装在支撑框架上的水分配喷嘴(32)。 该装置可以从基板上除去残留的显影液,并且不需要提起基板。 基板被安全处理,工作时间得到改善。

    PHOTOGRAPHIC PROCESSING SYSTEM HAVING A VERTICAL STACKER ARRANGEMENT
    4.
    发明申请
    PHOTOGRAPHIC PROCESSING SYSTEM HAVING A VERTICAL STACKER ARRANGEMENT 失效
    具有垂直堆叠机布置的摄影处理系统

    公开(公告)号:US20050180745A1

    公开(公告)日:2005-08-18

    申请号:US10780305

    申请日:2004-02-17

    CPC分类号: G03D5/04

    摘要: The present invention relates to a photographic processor and a method of processing photographic material. The photographic processor is adapted to achieve a high speed processing of photographic material by utilizing the combination of a vacuum platen and a stacker arrangement that is adapted to hold the media for a time necessary to process and/or dry the media. The system of the present invention permits media to be fed to a first vacuum platen where a first solution is applied. The platen is adapted transport the media to a first vertical stacker arrangement, which holds the media for a desired processing time for the first solution. The media can then be pushed through a stop solution, if needed, and onto a second vacuum platen where a second solution can be applied. The media is then delivered to second vertical stacker arrangement that is designed to assure the proper amount of processing time for the second solution.

    摘要翻译: 本发明涉及一种照相处理器和一种处理照相材料的方法。 照相处理器适于通过利用真空压板和堆叠器装置的组合来实现照相材料的高速处理,该组合适于将介质保持在处理和/或干燥介质所需的时间。 本发明的系统允许将介质供给到施加第一溶液的第一真空压板。 压板适于将介质输送到第一垂直堆叠器装置,其将介质保持用于第一解决方案的期望处理时间。 然后,如果需要,可以将介质推入停止溶液,并且可以将第二溶液施加到第二真空压板上。 然后将介质输送到第二垂直堆叠器布置,其被设计为确保第二解决方案的适当的处理时间量。

    Maintenance cartridge or device for a film developing system field of the invention
    5.
    发明申请
    Maintenance cartridge or device for a film developing system field of the invention 审中-公开
    用于本发明的薄膜显影系统领域的维护盒或装置

    公开(公告)号:US20050175336A1

    公开(公告)日:2005-08-11

    申请号:US10776747

    申请日:2004-02-11

    IPC分类号: G03D5/04 G03D13/00 G03D13/02

    CPC分类号: G03D5/04 G03D13/02

    摘要: A digital film processing system and film processing solution or development cartridge are disclosed. The cartridge comprises a housing and a chamber for storing a film processing fluid. The cartridge may also include an applicator nozzle for coating the processing solution onto undeveloped film. The system includes a cleaning and capping device or arrangement that is adapted to clean and seal an opening of the applicator nozzle.

    摘要翻译: 公开了一种数字胶片处理系统和胶片处理解决方案或显影盒。 盒包括壳体和用于存储膜处理流体的室。 墨盒还可以包括用于将处理溶液涂覆到未显影的薄膜上的涂抹器喷嘴。 该系统包括适于清洁和密封施用喷嘴的开口的清洁和封盖装置或装置。

    Photographic film developing apparatus
    7.
    发明授权
    Photographic film developing apparatus 失效
    摄影胶片显影装置

    公开(公告)号:US06739769B2

    公开(公告)日:2004-05-25

    申请号:US10316846

    申请日:2002-12-12

    IPC分类号: G03D500

    CPC分类号: G03D5/04

    摘要: A photographic film developing apparatus maintains a photographic film, a developer solution and a second processing solution at a specific temperature while performing film development operation by directly applying the individual solutions to an emulsion side of the photographic film. After the developer solution and the second processing solution have been applied from respective processing solution application heads to the emulsion side of the photographic film, the quantity of each solution on the emulsion side is adjusted to form a layer of a specified thickness. While transfer belts advance each successive portion of the photographic film up to a processing solution wipe-out device, heaters provided close to the transfer belts heat the individual solutions applied to the photographic film through the transfer belts to maintain the solutions at the specific temperature.

    摘要翻译: 照相胶片显影装置在通过将各溶液直接施加到照相胶片的乳剂侧的同时进行膜显影操作的同时,在特定温度下保持照相胶片,显影剂溶液和第二处理溶液。 在显影剂溶液和第二处理溶液已经从相应的处理溶液施加头施加到照相胶片的乳液侧之后,调节乳液侧上的每个溶液的量以形成指定厚度的层。 当转印带将照相胶片的每个连续部分推进到处理溶液擦拭装置时,靠近转印带的加热器通过转印带加热施加到照相胶片上的各溶液,以将溶液保持在特定温度。

    Photographic film developing apparatus
    8.
    发明申请
    Photographic film developing apparatus 失效
    摄影胶片显影装置

    公开(公告)号:US20030113113A1

    公开(公告)日:2003-06-19

    申请号:US10316846

    申请日:2002-12-12

    IPC分类号: G03B013/00

    CPC分类号: G03D5/04

    摘要: A photographic film developing apparatus maintains a photographic film, a developer solution and a second processing solution at a specific temperature while performing film development operation by directly applying the individual solutions to an emulsion side of the photographic film. After the developer solution and the second processing solution have been applied from respective processing solution application heads to the emulsion side of the photographic film, the quantity of each solution on the emulsion side is adjusted to form a layer of a specified thickness. While transfer belts advance each successive portion of the photographic film up to a processing solution wipe-out device, heaters provided close to the transfer belts heat the individual solutions applied to the photographic film through the transfer belts to maintain the solutions at the specific temperature.

    摘要翻译: 照相胶片显影装置在通过将各溶液直接施加到照相胶片的乳剂侧的同时进行膜显影操作的同时,在特定温度下保持照相胶片,显影剂溶液和第二处理溶液。 在显影剂溶液和第二处理溶液已经从相应的处理溶液施加头施加到照相胶片的乳液侧之后,调节乳液侧上的每个溶液的量以形成指定厚度的层。 当转印带将照相胶片的每个连续部分推进到处理溶液擦拭装置时,靠近转印带的加热器通过转印带加热施加到照相胶片上的各溶液,以将溶液保持在特定温度。

    Apparatus for processing photosensitive material
    9.
    发明授权
    Apparatus for processing photosensitive material 失效
    感光材料处理设备

    公开(公告)号:US06478483B2

    公开(公告)日:2002-11-12

    申请号:US09738980

    申请日:2000-12-19

    IPC分类号: G03D500

    CPC分类号: G03D5/04

    摘要: There are disclosed a processing apparatus for a photosensitive material having a coating device of a processing liquid to a photosensitive material, which comprises using a slot die having a manifold and a slot at the inside of the die as a coating device, and a processing apparatus for a photosensitive material which comprises a photosensitive material transferring device, a photosensitive material detecting device, a slot die for coating a processing liquid to the photosensitive material and having a manifold and a slot at the inside of the die, and a device for supplying a predetermined amount of the processing liquid to the slot die, wherein a detection result at the detecting device of the photosensitive material is fed back to the supplying device of the processing liquid to control operation of the processing liquid supplying device.

    摘要翻译: 公开了一种用于感光材料的处理装置,其具有对感光材料的处理液的涂布装置,其包括使用具有歧管的槽模和在模具内部的狭缝作为涂布装置,以及处理装置 用于感光材料,其包括感光材料转印装置,感光材料检测装置,用于将处理液涂覆到感光材料并且具有歧管和在模具内部的狭槽的狭缝模头,以及用于提供 预定量的处理液到槽模,其中在感光材料的检测装置处的检测结果被反馈到处理液的供给装置,以控制处理液供应装置的操作。

    Developing process and developing unit
    10.
    发明授权
    Developing process and developing unit 有权
    开发过程和开发单位

    公开(公告)号:US06419408B1

    公开(公告)日:2002-07-16

    申请号:US09262865

    申请日:1999-03-05

    申请人: Hiroichi Inada

    发明人: Hiroichi Inada

    IPC分类号: G03D504

    CPC分类号: G03D5/04

    摘要: When a developing process is performed, a mixture of developing solution and pure water is supplied while the ratio of developing solution and pure water is gradually increased from pure water to developing solution. Thus, a developing solution component and a resist component gradually react. Even if a resist component dissolves in the mixture of pure water and developing solution, the equality of the concentration of the developing solution can be maintained. Thus, the developing process can be suppressed from being unequally performed. When a rinsing process is performed, a mixture of developing solution and pure water is supplied while the ratio of developing solution against pure water is gradually decreased from developing solution to pure water. Consequently, the substitution from developing solution to pure water can be gradually performed. As a result, particles due to the solidification of unsolved resist can be prevented.

    摘要翻译: 当进行显影处理时,供应显影液和纯水的混合物,同时显影液和纯水的比例从纯水逐渐增加到显影溶液。 因此,显影液成分和抗蚀剂成分逐渐反应。 即使抗蚀剂成分溶解在纯水和显影液的混合物中,也能够保持显影液的浓度相等。 因此,可以抑制显影过程的不均匀性。 当进行漂洗处理时,提供显影液和纯水的混合物,同时显影液与纯水的比例从显影液逐渐降低至纯水。 因此,可以逐渐进行从显影液到纯水的取代。 结果,可以防止由于未溶解的抗蚀剂凝固而产生的颗粒。