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公开(公告)号：US06302600B1
公开(公告)日：2001-10-16
申请号：US09577045
申请日：2000-05-24
申请人： Hideo Nagase , Shu Ogawa , Kiyoshi Kamibayashi , Makoto Kikukawa , Takahiro Houzan , Toshimoto Nakagawa , Mitsumoto Nakagawa
发明人： Hideo Nagase , Shu Ogawa , Kiyoshi Kamibayashi , Makoto Kikukawa , Takahiro Houzan , Toshimoto Nakagawa , Mitsumoto Nakagawa
IPC分类号： G03D500
CPC分类号： G03D5/04 , G03F7/3071 , G03F7/3092 , G03F7/422
摘要： The apparatus for treating surface of boards includes treating means for treating surface of boards by supplying sequentially a treating solution and a rinse liquid on boards placed on a treating table; solution collecting means for collecting waste treating solution separately from waste rinse liquid; waste solution storing, concentrating detecting and solution supplementing means for storing the waste treating solution, detecting the concentration of at least one ingredient in the waste treating solution by an electric conductivity meter and/or an absorption photometer, supplementing treating solution for adjusting containing necessary ingredients depending on the detected value, and adjusting the treating solution; and treating solution feed means for feeding the adjusted treating solution into the treating means. By thus constructing, the treating solution can be recycled, and if recycling is repeated, the performance of the treating solution itself can be maintained.
摘要翻译： 用于处理板表面的设备包括处理装置，用于通过在放置在处理台上的板上依次提供处理溶液和冲洗液来处理板的表面; 用于从废液冲洗液中分离收集废物处理液的溶液收集装置; 用于存储废物处理溶液的废液储存，浓缩检测和溶液补充装置，通过电导率计和/或吸收光度计检测废物处理溶液中至少一种成分的浓度，补充处理溶液以调节含有必需成分 取决于检测值，并调整处理液; 以及处理溶液进料装置，用于将经调节的处理溶液进料到处理装置中。 通过这样构成，处理溶液可以再循环，如果重复循环，则可以维持处理液本身的性能。
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公开(公告)号：US5896874A
公开(公告)日：1999-04-27
申请号：US810816
申请日：1997-03-06
IPC分类号： G03F7/42 , G05D11/13 , H01L21/027 , H01L21/306 , B08B3/04
CPC分类号： G03F7/425 , G05D11/138
摘要： In a semiconductor manufacturing process or a liquid crystal board manufacturing process, a resist stripping solution blending an organic alkali and an organic solvent is used for stripping the resist completely from the board. An apparatus for controlling this resist stripping solution comprises a resist stripping solution discharge device for discharging the resist stripping solution by detecting the dissolved resist concentration in the resist stripping solution by using an absorption photometer, a source solution and water replenishing device for replenishing the resist stripping source solution and pure water by detecting the liquid level of the resist stripping solution by a liquid level gauge, and a source solution and/or water replenishing device for replenishing at least one of the resist stripping source solution pure water by detecting the water concentration of the resist stripping solution by using an another absorption photometer. As a result, in an apparatus for controlling a resist stripping solution used in resist stripping in a semiconductor manufacturing process or a liquid crystal board manufacturing process, the quality of the resist stripping solution is controlled constantly, the solution consumption is saved, the operation down time is reduced, and the cost is lowered.
摘要翻译： 在半导体制造工艺或液晶板制造工艺中，使用混合有机碱和有机溶剂的抗蚀剂剥离溶液来完全剥离抗蚀剂。 用于控制该抗蚀剂剥离溶液的装置包括：抗蚀剂剥离溶液排出装置，用于通过使用吸收光度计，用于补充抗蚀剂剥离的源溶液和水补充装置检测抗蚀剂剥离溶液中溶解的抗蚀剂浓度来排出抗蚀剂剥离溶液 源液和纯水，通过液位计检测抗蚀剂剥离溶液的液面，以及源溶液和/或水补充装置，用于通过检测抗蚀剂剥离源溶液纯水中的至少一种来补充至少一种抗蚀剂剥离源溶液纯水 通过使用另一种吸收光度计的抗蚀剂剥离溶液。 结果，在半导体制造工序或液晶板制造工序中，在抗蚀剂剥离中使用的抗蚀剂剥离液的控制装置中，不断地控制抗蚀剂剥离液的质量，节省溶液消耗，降低操作 时间缩短，成本降低。
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公开(公告)号：US06623183B2
公开(公告)日：2003-09-23
申请号：US10068809
申请日：2002-02-06
IPC分类号： G03D302
CPC分类号： G03D3/00 , Y10T137/0329
摘要： The developer producing equipment of the present invention is connected via piping to working equipment in which electronic circuits, on which fine working is performed, are formed, and produces an alkali type developer used in the abovementioned working equipment. This developer producing equipment comprises a preparation tank to which a developer stock solution and pure water are supplied, and in which these are agitated, first liquid amount measuring means for measuring the amount of the alkali type developer inside the preparation tank, first alkali concentration measuring means for measuring the alkali concentration of the abovementioned alkali type developer, first liquid amount control means for adjusting the amount of the alkali type developer inside the preparation tank on the basis of the measured value obtained by the abovementioned first liquid amount measuring means the abovementioned first alkali concentration measuring means, and liquid supply control means.
摘要翻译： 本发明的显影剂生产设备通过管道连接到其上形成精细加工的电子电路的工作设备，并且生产用于上述工作设备中的碱型显影剂。 该显影剂制造装置包括：供给显影剂储备液和纯水的制剂槽，搅拌其中的第一液量测量装置，用于测量制备罐内的碱式显影剂的量，第一碱浓度测定 用于测量上述碱性显影剂的碱浓度的装置，用于根据由上述第一液量测量装置获得的测量值调节制备罐内的碱式显影剂的量的第一液量控制装置， 碱浓度测量装置和液体供应控制装置。
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公开(公告)号：US07109037B2
公开(公告)日：2006-09-19
申请号：US10183833
申请日：2002-06-25
申请人： Toshimoto Nakagawa , Yuko Katagiri , Shu Ogawa , Satoru Morita , Makoto Kikukawa
发明人： Toshimoto Nakagawa , Yuko Katagiri , Shu Ogawa , Satoru Morita , Makoto Kikukawa
CPC分类号： H01L21/67253 , G03F7/422 , Y10T436/12
摘要： The water-based resist stripping liquid management apparatus according to the present invention manages in an adjusting bath a water-based resist stripping liquid that is used in resist stripping equipment. In this apparatus, an absorptiometer that measures the water concentration in the water-based resist stripping liquid and an electrical conductivity meter that measures the degraded component concentration in the water-based resist stripping liquid are connected to a resist stripping treatment bath (adjusting bath) via pipelines, and at least one of a resist stripping stock liquid, a resist stripping reclaimed liquid, pure water, and a premixed resist stripping new liquid are fed into the resist stripping treatment bath in accordance with the measurement values obtained. As a result, the resist stripping performance of the water-based resist stripping liquid can be stably maintained, the amount of liquid used can be reduced, and the time for which operation is shut down can be reduced.
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公开(公告)号：US06588927B2
公开(公告)日：2003-07-08
申请号：US10068810
申请日：2002-02-06
IPC分类号： B01F1502
CPC分类号： G03F7/30 , B01F3/088 , B01F15/00155 , B01F15/0022 , B01F15/0408 , B01F2003/0896 , B01F2215/0093
摘要： The developer producing equipment of the present invention is equipped with a preparation tank to which a developer stock solution and pure water are supplied, and in which these ingredients are agitated, and a leveling tank which is connected to this preparation tank. The leveling tank is connected via piping to working equipment in which electronic circuits are formed. Furthermore, the preparation tank and leveling tank have first and second alkali concentration measuring means for measuring the alkali concentrations of the alkali type developer inside the respective tanks. In the preparation tank, either the amount of developer stock solution that is supplied to the tank or the amount of pure water that is supplied to the tank, or both, are adjusted on the basis of the measured value obtained by the first alkali concentration measuring means, so that an alkali type developer is prepared. This alkali type developer is fed into the leveling tank, where the alkali concentration is evened out, after which the alkali type developer is fed into the working equipment via piping.
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公开(公告)号：US07101517B2
公开(公告)日：2006-09-05
申请号：US10342769
申请日：2003-01-15
申请人： Toshimoto Nakagawa , Yuko Katagiri , Shu Ogawa , Yasuyuki Kobayakawa , Makoto Kikukawa , Yutaka Saito , Yoshitaka Nishijima
发明人： Toshimoto Nakagawa , Yuko Katagiri , Shu Ogawa , Yasuyuki Kobayakawa , Makoto Kikukawa , Yutaka Saito , Yoshitaka Nishijima
IPC分类号： B01J19/08
摘要： A processing solution preparation and supply apparatus includes a dissolving preparation bath to which a material powder and ultrapure water are supplied. This dissolving preparation bath is connected to a substrate processing apparatus via a pipe, and a processing solution prepared from the material powder on-site is supplied to the processing apparatus. To reduce an increase in the microorganism concentration in the ultrapure water, this ultrapure water is circulated substantially constantly. This suppresses deterioration and concentration fluctuations of a processing solution for use in processing of a semiconductor substrate, when this processing solution is supplied to the use side. This also reduces particles and improves the economical efficiency.
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7.发明授权Alkali-based treating liquid, treating liquid adjusting method and equipment, treating liquid supplying method and equipment 有权碱处理液，处理液体调节方法和设备，处理液体供应方法和设备公开(公告)号：US06752545B2
公开(公告)日：2004-06-22
申请号：US10216661
申请日：2002-08-09
申请人： Toshimoto Nakagawa , Yuko Katagiri , Shu Ogawa , Satoru Morita , Makoto Kikukawa , Takahiro Hozan
发明人： Toshimoto Nakagawa , Yuko Katagiri , Shu Ogawa , Satoru Morita , Makoto Kikukawa , Takahiro Hozan
IPC分类号： G03D500
CPC分类号： G03F7/30 , G03F7/3021 , G03F7/322
摘要： A treating liquid adjusting equipment for adjusting an alkali-based treating liquid for use in treating an organic film applied onto a substrate, which includes an adjusting portion. The adjusting portion for adjusting an alkalinity of the alkali-based treating liquid is such that a concentration of a first component contained in the alkali-based treating liquid and constituting an organic film of a same type as or different type from the organic film is in a range of 0.0001 to 2.0 mass %, and a concentration of an alkali component contained in the alkali-based treating liquid is in a range of 0.05 to 2.5 mass %.
摘要翻译： 一种处理液体调节设备，用于调节用于处理施加到基底上的有机膜的碱性处理液，其包括调节部分。 用于调节碱处理液的碱度的调节部分使得碱性处理液中包含的和构成与有机膜相同类型或不同类型的有机膜的第一成分的浓度为 0.0001〜2.0质量％的范围，碱系处理液中所含的碱成分浓度在0.05〜2.5质量％的范围。
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公开(公告)号：US5671760A
公开(公告)日：1997-09-30
申请号：US352739
申请日：1994-12-02
摘要： A resist stripping solution is used in the stripping of resist in a liquid crystal board manufacturing process or semiconductor manufacturing process. The apparatus for controlling the resist stripping solution comprises a resist stripping solution discharge device for discharging resist stripping solution by detecting the dissolved resist concentration in the resist stripping solution using an absorption photometer, first replenishing device for replenishing organic solvent and alkanolamine such as MEA or the like by detecting the liquid level of the resist stripping solution using a liquid level gauge, and second replenishing device for replenishing at least one of organic solvent and alkanolamine such as MEA or the like by detecting the concentration of alkanolamine such as MEA or the like of the resist stripping solution by an absorption photometer. As a result, the quality of the resist stripping solution can always be constant, and the consumption volume of the solution, the operation down time and the cost can be notably reduced.
摘要翻译： 抗蚀剂剥离溶液用于液晶板制造工艺或半导体制造工艺中的抗蚀剂剥离。 用于控制抗蚀剂剥离溶液的装置包括用于通过使用吸收光度计检测抗蚀剂剥离溶液中的溶解的抗蚀剂浓度来排出抗蚀剂剥离溶液的抗蚀剂剥离溶液放电装置，用于补充有机溶剂的第一补充装置和诸如MEA的链烷醇胺或 例如通过使用液位计检测抗蚀剂剥离溶液的液面，以及通过检测诸如MEA等的链烷醇胺的浓度等来补充有机溶剂和链烷醇胺如MEA等中的至少一种的第二补充装置 抗蚀剂剥离溶液由吸收光度计。 因此，抗蚀剂剥离溶液的质量始终是恒定的，并且可以显着降低溶液的消耗量，操作停机时间和成本。
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公开(公告)号：US5223881A
公开(公告)日：1993-06-29
申请号：US907665
申请日：1992-07-02
IPC分类号： G03F7/30 , H01L21/027 , H01L21/30
CPC分类号： G03F7/30
摘要： An alkaline developing solution is used in development of photosensitive organic resin (photoresist) in liquid crystal board manufacturing process or printed board manufacturing process. The apparatus for controlling developing solution comprises developing solution discharge device for discharging developing solution by detecting the dissolved resin concentration in the developing solution by means of an absorption photometer (16), first replenishing device for replenishing undiluted developing solution and pure water by detecting the liquid level of the developing solution by means of a liquid level gauge (3), and second replenishing device for replenishing undiluted developing solution or pure water by detecting the alkali concentration of the developing solution by an electric conductivity meter (15). By thus constituting, the developing performance of the developing solution may be always kept constant, and the operation down time may be notably shortened.
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公开(公告)号：US06875359B2
公开(公告)日：2005-04-05
申请号：US10305796
申请日：2002-11-27
IPC分类号： C02F1/44 , B01D61/00 , B01D61/14 , B01D61/58 , B01D63/06 , H01L21/027 , H01L21/306
CPC分类号： B01D61/142 , B01D63/063
摘要： A developer liquid regenerating system is provided with a storage tank storing a TAAH (such as TMAH)- and photoresist-containing developer waste liquid, first separating means with NF membrane, connected to the waste liquid storage tank through conduits, a storage tank connected to the first separating means through a conduit, and second separating means with NF membrane, connected to the storage tank through conduits. The developer liquid regenerating system is also connected to a developing apparatus through a conduit connected to the storage tank, and to a developer liquid control/supply apparatus through a conduit connected to the storage tank.
摘要翻译： 显影液再生系统设有储存有TAAH（例如TMAH）和含光致抗蚀剂的显影剂废液的储罐，具有NF膜的第一分离装置，通过导管连接到废液储罐，储罐连接到 通过管道的第一分离装置和具有NF膜的第二分离装置通过管道连接到储存罐。 显影剂液体再生系统还通过连接到储罐的导管连接到显影装置，并且通过连接到储罐的导管连接到显影剂液体控制/供给装置。
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