公开(公告)号：US08488125B2

公开(公告)日：2013-07-16

申请号：US12865171

申请日：2009-05-12

申请人： Kentaro Furusawa ,  Natsuhiko Mizutani ,  Ryo Kuroda

发明人： Kentaro Furusawa ,  Natsuhiko Mizutani ,  Ryo Kuroda

IPC分类号： G01B9/02

CPC分类号： G01B9/02014 ,  G01B9/02004 ,  G01B9/02069 ,  G01B9/02091

摘要： An optical tomography imaging a tomogram by using a coherent light by a backscattering light of a measured object and a reflected light of a reference mirror, which has supercontinuum light sources, an optical system having group velocity dispersion connected to the supercontinuum light source, an optical detection element detecting a coherent light by a backscattering light of the measured object and a reflected light of the reference mirror, a timing detection element detecting a timing of each wavelength component in an output light from the optical system having the group velocity dispersion, and a unit sampling a signal from the optical detector by using a timing signal from the timing detection element with a signal from the supercontinuum light source as a trigger, and detecting an optical tomogram signal imaging a tomogram, thereby acquiring an optical tomogram at a higher speed than a conventional SS-OCT.

摘要翻译： 光学断层摄影通过使用具有超连续光源的测量对象的反向散射光和参考反射镜的反射光使用相干光来成像断层图像，具有连接到超连续光源的组速度色散的光学系统，光学 检测元件通过测量对象的后向散射光和参考反射镜的反射光来检测相干光，定时检测元件，检测来自具有组速度色散的光学系统的输出光中的每个波长分量的定时，以及 通过使用来自定时检测元件的来自超连续光源的信号的定时信号作为触发来对来自光学检测器的信号进行采样，并且检测成像断层图像的光学层析图像信号，从而以更高的速度获取光学层析图像 常规的SS-OCT。

公开(公告)号：US20120038995A1

公开(公告)日：2012-02-16

申请号：US13279119

申请日：2011-10-21

申请人： Tomohiro Yamada ,  Ryo Kuroda

发明人： Tomohiro Yamada ,  Ryo Kuroda

IPC分类号： G02B5/22

CPC分类号： G02B5/204 ,  B82Y20/00 ,  G02B5/008

摘要： An optical filter includes a light-shielding conductive layer provided with a plurality of apertures on a substrate surface that selectively transmits light of a first wavelength, and a dielectric layer in contact with the conductive layer. A size of the apertures is a size equal to or less than the first wavelength, and a ratio of a surface area of the conductive layer to a surface area of the substrate surface is within a range of equal to or greater than 36% and equal to or less than 74%. A transmissivity of the first wavelength is increased by surface plasmons induced in the apertures by light falling on the conductive layer.

摘要翻译： 光学滤波器包括在衬底表面上设置有选择性透射第一波长的光的多个孔的光屏蔽导电层和与导电层接触的电介质层。 孔的尺寸为等于或小于第一波长的尺寸，并且导电层的表面积与基板表面的表面积的比率在等于或大于36％的范围内并且等于 至或小于74％。 第一波长的透射率通过落在导电层上的光在孔中引起的表面等离子体激元而增加。

公开(公告)号：US07915053B2

公开(公告)日：2011-03-29

申请号：US12088023

申请日：2006-12-20

申请人： Junta Yamamichi ,  Satoru Nishiuma ,  Tomohiro Yamada ,  Masaya Ogino ,  Ryo Kuroda ,  Hidenori Shiotsuka

发明人： Junta Yamamichi ,  Satoru Nishiuma ,  Tomohiro Yamada ,  Masaya Ogino ,  Ryo Kuroda ,  Hidenori Shiotsuka

IPC分类号： G01N33/551

CPC分类号： G01N21/554 ,  G01N21/648 ,  G01N21/658 ,  Y10S436/805

摘要： A substrate for forming a target substance detecting device includes a supporting member, an underlying layer disposed on a surface of the supporting member, and a metal pattern layer, disposed on a surface of the underlying layer, for being bound to a target substance trapping substance capable of trapping a target substance in a specimen solution at least containing water as a liquid medium to detect the target substance by utilizing plasmon resonance. The underlying layer has a refractive index nb satisfying the following relationship: 0.90 na≦nb≦1.05 na, wherein na represents a refractive index of water.

摘要翻译： 用于形成目标物质检测装置的基板包括支撑构件，设置在支撑构件的表面上的下层和设置在下层的表面上的金属图案层，用于与目标物质捕获物质结合 能够将至少含有水作为液体介质的样品溶液中的目标物质捕获，以通过利用等离子体共振来检测目标物质。 下层具有满足以下关系的折射率nb：0.90 na＆nlE; nb＆nlE; 1.05na，其中na表示水的折射率。

公开(公告)号：US20100328587A1

公开(公告)日：2010-12-30

申请号：US12824067

申请日：2010-06-25

申请人： Tomohiro Yamada ,  Ryo Kuroda

发明人： Tomohiro Yamada ,  Ryo Kuroda

IPC分类号： G02F1/1335

CPC分类号： G02B5/1809 ,  G02B5/203

摘要： An optical filter includes a substrate, and a periodic structure in which a plurality of members formed of silicon are periodically arranged on a surface of the substrate. The filter selectively transmits light of a first wavelength included in light incident on the periodic structure in the direction of the substrate. The members are two-dimensionally arranged with a period of 400 nm to 500 nm. The dimension of the members in the direction parallel to the surface is of 120 nm to 160 nm. A local maximum value of the transmission spectrum of the first wavelength is within the range of 400 nm to 500 nm.

摘要翻译： 光学滤波器包括衬底，并且周期性结构，其中由硅形成的多个构件周期性地布置在衬底的表面上。 滤光器选择性地透射入射在周期性结构上的光在基板的方向上包括的第一波长的光。 构件以400nm至500nm的周期二维排列。 构件在平行于表面的方向上的尺寸为120nm至160nm。 第一波长的透射光谱的局部最大值在400nm至500nm的范围内。

公开(公告)号：US20080297800A1

公开(公告)日：2008-12-04

申请号：US12045335

申请日：2008-03-10

申请人： Tomohiro Yamada ,  Yoichiro Handa ,  Satoru Nishiuma ,  Ryo Kuroda

发明人： Tomohiro Yamada ,  Yoichiro Handa ,  Satoru Nishiuma ,  Ryo Kuroda

IPC分类号： G01N21/59 ,  B29D11/00

CPC分类号： B29D11/00365 ,  B29D11/00807 ,  G01N21/554

摘要： An optical element 4 of the present invention includes a conductive microstructure 6 having a conductive property, and detects an optical spectrum signal varied by the binding of measured molecules on the surface of the conductive microstructure 6. The optical element 4 has a distribution in the direction to the electric displacement vector generated inside the conductive microstructure 6 by the binding capacity of the measured molecules on the surface of the conductive microstructure 6. As a result, it is possible to provide an optical element capable of measuring the density at high accuracy without depending on the binding position of the measured molecules.

摘要翻译： 本发明的光学元件4包括具有导电特性的导电微结构6，并且检测由导电微结构6的表面上测量分子的结合而变化的光谱信号。光学元件4在方向 通过导电微结构6的表面上测量的分子的结合能力，在导电性微结构体6内产生的电位移矢量。结果，可以提供能够以高精度测量密度的光学元件，而不依赖于 在测量分子的结合位置。

公开(公告)号：US20080246970A1

公开(公告)日：2008-10-09

申请号：US12131433

申请日：2008-06-02

申请人： Ryo Kuroda ,  Natsuhiko Mizutani ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

发明人： Ryo Kuroda ,  Natsuhiko Mizutani ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

IPC分类号： G01N21/55

CPC分类号： G01N21/648 ,  G01N21/554 ,  Y10T436/11

摘要： A sensor device is formed from a metal film having a plurality of openings, a sensor material positioned within each of the openings, a light source that emits light having a first wavelength, and a light detector that detects light emitted from the light source and transmitted through or reflected from the openings. The plurality of openings are arranged periodically in a first direction in the metal film, and both a size of each of the plurality of openings and an interval thereof in the first direction are equal to or less than the wavelength of the light.

摘要翻译： 传感器装置由具有多个开口的金属膜形成，位于每个开口内的传感器材料，发射具有第一波长的光的光源和检测从光源发出的光并发射的光检测器 从开口穿过或反射。 多个开口在金属膜中沿第一方向周期性地布置，并且多个开口中的每一个的尺寸和第一方向上的间隔都等于或小于光的波长。

公开(公告)号：US07190438B2

公开(公告)日：2007-03-13

申请号：US10779786

申请日：2004-02-18

申请人： Takako Yamaguchi ,  Ryo Kuroda

发明人： Takako Yamaguchi ,  Ryo Kuroda

IPC分类号： G03B27/02 ,  G03B27/14 ,  G03F1/00 ,  G03F1/14

CPC分类号： G03F7/7035 ,  B82Y10/00 ,  G03F1/50 ,  G03F7/70325 ,  G03F7/70783

摘要： A near-field exposure apparatus including a light source, a stage on which an object to be exposed to light is placed, and a photomask with a deformable membrane portion having on a first surface a light shielding membrane that has a micro aperture and a substrate for supporting a peripheral region of a second surface of the deformable membrane portion. Exposure is conducted with the deformable membrane portion in a sagged condition. The photomask has a stress relieving structure to relieve stress that is generated at a border between the deformable membrane portion and the substrate when the deformable membrane portion sags. The stress relieving structure is one of: a reinforcing member placed at the border, the substrate being partially thinned near the border, and an intermediate layer that is formed between the substrate and the second surface of the deformable membrane portion.

摘要翻译： 一种近场曝光装置，包括光源，放置有要暴露于光的物体的台，以及具有可变形膜部分的光掩模，该第一表面具有具有微孔的遮光膜和基板 用于支撑可变形膜部分的第二表面的周边区域。 用可变形膜部分处于下垂状态进行曝光。 光掩模具有减轻应力消除结构，以减轻当可变形膜部分下垂时在可变形膜部分和基底之间的边界处产生的应力。 应力消除结构是：位于边界处的加强构件，边界附近部分变薄的基板和形成在基板和可变形膜部分的第二表面之间的中间层。

公开(公告)号：US20050064303A1

公开(公告)日：2005-03-24

申请号：US10936806

申请日：2004-09-09

申请人： Tomohiro Yamada ,  Ryo Kuroda ,  Natsuhiko Mizutani

发明人： Tomohiro Yamada ,  Ryo Kuroda ,  Natsuhiko Mizutani

IPC分类号： G03C5/04 ,  G03F1/08 ,  G03F1/14 ,  G03F9/00 ,  H01J3/14

CPC分类号： G03F1/54 ,  G03F1/50

摘要： A near-field light generating structure for generating near-field light has a pattern of a fine metal structure comprising a light blocking layer or a pattern of a fine opening provided in the light blocking layer. The fine metal structure or the fine opening has a size of not more than a wavelength of incident light. The fine metal structure or the fine opening has a sectional shape, in a plane parallel with the incident light, which is asymmetrical in terms of a member adjacent to the fine metal structure or the fine opening.

摘要翻译： 用于产生近场光的近场光产生结构具有包括遮光层的细金属结构图案或设置在遮光层中的精细开口图案。 细金属结构或微细开口具有不大于入射光波长的尺寸。 细金属结构或微细开口在与入射光平行的平面中具有与邻近细金属结构或微细开口的构件不对称的截面形状。

公开(公告)号：US06721040B2

公开(公告)日：2004-04-13

申请号：US10051985

申请日：2002-01-16

申请人： Kenji Saito ,  Ryo Kuroda ,  Yasuhisa Inao

发明人： Kenji Saito ,  Ryo Kuroda ,  Yasuhisa Inao

IPC分类号： G03B2772

CPC分类号： B82Y10/00 ,  G03F7/70325

摘要： There is provided an exposure method including the steps for arranging an object to be exposed and a transparent plate that includes a thin film, within such a range that near field light from the thin film may operate on the object, the thin film having a light transmittance that changes according to an intensity of light of incidence, and exposing the object with the near field light generated by projecting a pattern on a mask onto the thin film of the transparent plate.

摘要翻译： 提供了一种曝光方法，包括用于布置待曝光的物体的步骤和包括薄膜的透明板，在这样的范围内，来自薄膜的近场光可以在物体上操作，薄膜具有光 透射率根据入射光的强度而变化，并且通过将掩模上的图案投影到透明板的薄膜上而产生的近场光曝光物体。

公开(公告)号：US06632593B2

公开(公告)日：2003-10-14

申请号：US09781331

申请日：2001-02-13

申请人： Takako Yamaguchi ,  Ryo Kuroda

发明人： Takako Yamaguchi ,  Ryo Kuroda

IPC分类号： G03C500

CPC分类号： G03F7/7035 ,  B82Y10/00 ,  G03F7/16 ,  G03F7/2014 ,  G03F7/70325

摘要： A method of forming a pattern by using a photomask having both a minute aperture where a main component of transmitted light is evanescent light and an aperture where a main component of transmitted light is propagating light. The method includes the steps of forming a photoresist having a film thickness at most equal to a width of the minute aperture on a substrate to be processed, exposing the photoresist by incident light for exposure, and adjusting the film thickness of the photoresist and the conditions of the exposure so as to prevent a photoresist pattern made by the propagating light from extending to an adjacent pattern made by the evanescent light.

摘要翻译： 通过使用具有透射光的主要成分的微小孔的光掩模和透射光的主要成分传播的光的孔，形成图案的方法。 该方法包括以下步骤：形成具有至多等于待处理基板上的微孔宽度的膜厚度的光致抗蚀剂，通过用于曝光的入射光曝光光致抗蚀剂，并调节光致抗蚀剂的膜厚度和条件 的曝光，以防止由传播光产生的光致抗蚀剂图案延伸到由渐逝光制成的相邻图案。