公开(公告)号：US06721040B2

公开(公告)日：2004-04-13

申请号：US10051985

申请日：2002-01-16

申请人： Kenji Saito ,  Ryo Kuroda ,  Yasuhisa Inao

发明人： Kenji Saito ,  Ryo Kuroda ,  Yasuhisa Inao

IPC分类号： G03B2772

CPC分类号： B82Y10/00 ,  G03F7/70325

摘要： There is provided an exposure method including the steps for arranging an object to be exposed and a transparent plate that includes a thin film, within such a range that near field light from the thin film may operate on the object, the thin film having a light transmittance that changes according to an intensity of light of incidence, and exposing the object with the near field light generated by projecting a pattern on a mask onto the thin film of the transparent plate.

摘要翻译： 提供了一种曝光方法，包括用于布置待曝光的物体的步骤和包括薄膜的透明板，在这样的范围内，来自薄膜的近场光可以在物体上操作，薄膜具有光 透射率根据入射光的强度而变化，并且通过将掩模上的图案投影到透明板的薄膜上而产生的近场光曝光物体。

公开(公告)号：US20070146680A1

公开(公告)日：2007-06-28

申请号：US10554993

申请日：2005-06-24

申请人： Yasuhisa Inao ,  Ryo Kuroda ,  Natsuhiko Mizutani

发明人： Yasuhisa Inao ,  Ryo Kuroda ,  Natsuhiko Mizutani

IPC分类号： G03B27/62

CPC分类号： G03F7/7035 ,  B82Y10/00 ,  G03F1/50 ,  G03F1/60 ,  G03F7/2014 ,  G03F7/70325 ,  G03F7/70433 ,  G03F7/70691 ,  G03F9/703 ,  G03F9/7053 ,  G03F9/7088

摘要： Disclosed is an exposure apparatus, an exposure method and an exposure mask, for improved optical lithography. Specifically, in accordance with one preferred form of the invention, the exposure apparatus is arranged to be used with an exposure mask having an elastically deformable holding member and a light blocking film provided on the holding member and being formed with an opening pattern, wherein for exposure the exposure mask is flexed to be brought into contact with an object to be exposed. The exposure apparatus includes a distance detecting system for detecting a distance between the exposure mask before being flexed and the object to be exposed, and a distance controlling system for controlling the distance between the exposure mask before being flexed and the object to be exposed, on the basis of a signal from the distance detecting system.

摘要翻译： 公开了一种用于改进的光刻技术的曝光装置，曝光方法和曝光掩模。 具体地，根据本发明的一个优选形式，曝光装置被布置成与具有可弹性变形的保持构件和设置在保持构件上并形成有开口图案的遮光膜的曝光掩模一起使用，其中， 暴露曝光掩模被弯曲以与待曝光的物体接触。 曝光装置包括用于检测在弯曲之前的曝光掩模与待曝光的物体之间的距离的距离检测系统，以及用于控制在弯曲之前的曝光掩模与待曝光的物体之间的距离的距离控制系统， 来自距离检测系统的信号的基础。

公开(公告)号：US20070065734A1

公开(公告)日：2007-03-22

申请号：US11548756

申请日：2006-10-12

申请人： Yasuhisa Inao ,  Ryo Kuroda ,  Natsuhiko Mizutani

发明人： Yasuhisa Inao ,  Ryo Kuroda ,  Natsuhiko Mizutani

IPC分类号： G03C5/00 ,  G03F1/00

CPC分类号： G03F7/7035 ,  B82Y10/00 ,  G03F1/50 ,  G03F7/2014 ,  G03F7/70325 ,  G03F7/70566

摘要： An exposure method for exposing a workpiece on the basis of near-field light escaping from an opening of a mask. The method includes projecting non-polarized exposure light having a predetermined wavelength, emitted from a laser light source and passed through a depolarization device and a diffusion device, onto an exposure mask having a light blocking film formed with a plurality of rectangular openings therein, the openings having (i) a width in a widthwise direction not greater than one-third of the wavelength of the exposure light and (ii) two or more lengthwise directions extending along the mask surface, so that near-field light escaping from the openings performs exposure of a pattern on the basis of the openings.

摘要翻译： 一种用于基于从掩模的开口逸出的近场光暴露工件的曝光方法。 该方法包括将从激光源射出并通过去极化装置和扩散装置的具有预定波长的非偏振曝光光投射到具有形成有多个矩形开口的遮光膜的曝光掩模上， 具有（i）宽度方向的宽度不大于曝光光的波长的三分之一的开口和（ii）沿着掩模表面延伸的两个或更多个长度方向，使得从开口逸出的近场光执行 在开口的基础上曝光图案。

公开(公告)号：US06628392B2

公开(公告)日：2003-09-30

申请号：US09931720

申请日：2001-08-20

申请人： Ryo Kuroda ,  Yasuhiro Shimada ,  Junichi Seki ,  Takako Yamaguchi ,  Yasuhisa Inao

发明人： Ryo Kuroda ,  Yasuhiro Shimada ,  Junichi Seki ,  Takako Yamaguchi ,  Yasuhisa Inao

IPC分类号： G01B1100

CPC分类号： G03F9/703 ,  G03F9/7038 ,  G03F9/7049 ,  G03F9/7088

摘要： Disclosed herein is a light modulating apparatus comprising first and second two periodic structures each having a period smaller than the wavelength of light emitted from a light source, and a moving means for relatively moving the two periodic structures, wherein the surface of the first periodic structure is brought near to the surface of the second periodic structure to a space not longer than the wavelength to arrange them in a state opposed to each other, the light incident on the first periodic structure is converted into near-field light by the first periodic structure, the converted near-field light is transmitted through the second periodic structure and converted into propagation light by scattering the near-field light on the back surface of the second periodic structure, and the intensity of the propagation light is modulated by relatively moving the two periodic structures by the moving means.

摘要翻译： 这里公开了一种光调制装置，其包括第一和第二两个周期性结构，每个周期结构的周期小于从光源发射的光的波长;以及移动装置，用于相对移动两个周期性结构，其中第一周期性结构的表面 被带到第二周期性结构的表面附近到不长于波长的空间以将它们布置成彼此相对的状态，入射到第一周期性结构的光被第一周期性结构转换成近场光 转换的近场光透过第二周期结构传播，并通过散射第二周期结构的背面上的近场光而转换为传播光，并且传播光的强度通过相对移动两个 通过移动装置的周期性结构。

公开(公告)号：US07733491B2

公开(公告)日：2010-06-08

申请号：US12131433

申请日：2008-06-02

申请人： Ryo Kuroda ,  Natsuhiko Mizutani ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

发明人： Ryo Kuroda ,  Natsuhiko Mizutani ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

IPC分类号： G12Q1/68 ,  G01N1/02 ,  G01N21/55

CPC分类号： G01N21/648 ,  G01N21/554 ,  Y10T436/11

摘要： A sensor device is formed from a metal film having a plurality of openings, a sensor material positioned within each of the openings, a light source that emits light having a first wavelength, and a light detector that detects light emitted from the light source and transmitted through or reflected from the openings. The plurality of openings are arranged periodically in a first direction in the metal film, and both a size of each of the plurality of openings and an interval thereof in the first direction are equal to or less than the wavelength of the light.

摘要翻译： 传感器装置由具有多个开口的金属膜形成，位于每个开口内的传感器材料，发射具有第一波长的光的光源和检测从光源发出的光并发射的光检测器 从开口穿过或反射。 多个开口在金属膜中沿第一方向周期性地布置，并且多个开口中的每一个的尺寸和第一方向上的间隔都等于或小于光的波长。

公开(公告)号：US07262851B2

公开(公告)日：2007-08-28

申请号：US11166106

申请日：2005-06-27

申请人： Ryo Kuroda ,  Yasuhisa Inao

发明人： Ryo Kuroda ,  Yasuhisa Inao

IPC分类号： G01B11/00

CPC分类号： G03F9/7076 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7038 ,  G03F9/7042

摘要： Disclosed is a method and apparatus for detecting a relative positional deviation between first and second objects. In one preferred form of the invention, the detecting method includes the steps of (i) providing the first and second objects with diffraction gratings, respectively, each having a grating pitch larger than a wavelength of a light source used, (ii) placing the first and second objects so that a dielectric material layer having a thickness smaller than the wavelength of the light source used is interposed between the first and second objects, and so that the diffraction gratings of the first and second objects are opposed to each other, (iii) projecting light from the light source onto the diffraction gratings of the first and second objects, and (iv) detecting the relative positional deviation between the first and second objects on the basis of diffraction light projected from the diffraction gratings to a space.

摘要翻译： 公开了一种用于检测第一和第二物体之间的相对位置偏差的方法和装置。 在本发明的一个优选形式中，检测方法包括以下步骤：（i）分别为第一和第二物体提供衍射光栅，每个衍射光栅具有大于所使用的光源的波长的光栅间距，（ii） 第一和第二物体，使得具有小于所使用的光源的波长的厚度的介电材料层插入在第一和第二物体之间，并且使得第一和第二物体的衍射光栅彼此相对（（ iii）将来自光源的光投射到第一和第二物体的衍射光栅上，以及（iv）基于从衍射光栅投影到衍射光栅的衍射光来检测第一和第二物体之间的相对位置偏差。

公开(公告)号：US20060007440A1

公开(公告)日：2006-01-12

申请号：US11166106

申请日：2005-06-27

申请人： Ryo Kuroda ,  Yasuhisa Inao

发明人： Ryo Kuroda ,  Yasuhisa Inao

IPC分类号： G01B11/00

CPC分类号： G03F9/7076 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7038 ,  G03F9/7042

摘要： Disclosed is a method and apparatus for detecting a relative positional deviation between first and second objects. In one preferred form of the invention, the detecting method includes the steps of (i) providing the first and second objects with diffraction gratings, respectively, each having a grating pitch larger than a wavelength of a light source used, (ii) placing the first and second objects so that a dielectric material layer having a thickness smaller than the wavelength of the light source used is interposed between the first and second objects, and so that the diffraction gratings of the first and second objects are opposed to each other, (iii) projecting light from the light source onto the diffraction gratings of the first and second objects, and (iv) detecting the relative positional deviation between the first and second objects on the basis of diffraction light projected from the diffraction gratings to a space.

摘要翻译： 公开了一种用于检测第一和第二物体之间的相对位置偏差的方法和装置。 在本发明的一个优选形式中，检测方法包括以下步骤：（i）分别为第一和第二物体提供衍射光栅，每个衍射光栅具有大于所使用的光源的波长的光栅间距，（ii） 第一和第二物体，使得具有小于所使用的光源的波长的厚度的介电材料层插入在第一和第二物体之间，并且使得第一和第二物体的衍射光栅彼此相对（（ iii）将来自光源的光投射到第一和第二物体的衍射光栅上，以及（iv）基于从衍射光栅投影到衍射光栅的衍射光来检测第一和第二物体之间的相对位置偏差。

公开(公告)号：US20080246970A1

公开(公告)日：2008-10-09

申请号：US12131433

申请日：2008-06-02

申请人： Ryo Kuroda ,  Natsuhiko Mizutani ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

发明人： Ryo Kuroda ,  Natsuhiko Mizutani ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

IPC分类号： G01N21/55

CPC分类号： G01N21/648 ,  G01N21/554 ,  Y10T436/11

摘要： A sensor device is formed from a metal film having a plurality of openings, a sensor material positioned within each of the openings, a light source that emits light having a first wavelength, and a light detector that detects light emitted from the light source and transmitted through or reflected from the openings. The plurality of openings are arranged periodically in a first direction in the metal film, and both a size of each of the plurality of openings and an interval thereof in the first direction are equal to or less than the wavelength of the light.

摘要翻译： 传感器装置由具有多个开口的金属膜形成，位于每个开口内的传感器材料，发射具有第一波长的光的光源和检测从光源发出的光并发射的光检测器 从开口穿过或反射。 多个开口在金属膜中沿第一方向周期性地布置，并且多个开口中的每一个的尺寸和第一方向上的间隔都等于或小于光的波长。

公开(公告)号：US07399445B2

公开(公告)日：2008-07-15

申请号：US10340152

申请日：2003-01-10

申请人： Ryo Kuroda ,  Natsuhiko Mizutani ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

发明人： Ryo Kuroda ,  Natsuhiko Mizutani ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

IPC分类号： C12Q1/68 ,  G01N1/02

CPC分类号： G01N21/648 ,  G01N21/554 ,  Y10T436/11

摘要： A sensor device is formed from a metal film having a plurality of openings, a sensor material positioned within each of the openings, a light source that emits light having a first wavelength, and a light detector that detects light emitted from the light source and transmitted through or reflected from the openings. The plurality of openings are arranged periodically in a first direction in the metal film, and both a size of each of the plurality of openings and an interval thereof in the first direction are equal to or less than the wavelength of the light.

摘要翻译： 传感器装置由具有多个开口的金属膜形成，位于每个开口内的传感器材料，发射具有第一波长的光的光源和检测从光源发出的光并发射的光检测器 从开口穿过或反射。 多个开口在金属膜中沿第一方向周期性地布置，并且多个开口中的每一个的尺寸和第一方向上的间隔都等于或小于光的波长。

公开(公告)号：US07144682B2

公开(公告)日：2006-12-05

申请号：US10654913

申请日：2003-09-05

申请人： Yasuhisa Inao ,  Ryo Kuroda ,  Natsuhiko Mizutani

发明人： Yasuhisa Inao ,  Ryo Kuroda ,  Natsuhiko Mizutani

IPC分类号： G03F7/20

CPC分类号： G03F7/7035 ,  B82Y10/00 ,  G03F1/50 ,  G03F7/2014 ,  G03F7/70325 ,  G03F7/70566

摘要： A method for exposing a workpiece on the basis of near-field light escaping from an exposure mask having a light blocking film with a plurality of rectangular openings. The method includes protecting non-polarized near-field exposure light from a light source through the openings of the exposure mask to perform exposure of a pattern on the workpiece. The widths of the rectangular openings are smaller than that at a cross-point between a first curve on a coordinate of widths of the openings versus a near-field light intensity for an incident-light electric-field direction perpendicular to a lengthwise direction of a small-opening pattern and a second curve on the same coordinate for an incident-light electric-field direction parallel to the lengthwise direction of the small-opening pattern.

摘要翻译： 基于从具有多个矩形开口的具有遮光膜的曝光掩模逃逸的近场光来曝光工件的方法。 该方法包括通过曝光掩模的开口保护来自光源的非偏振近场曝光光，以进行图案在工件上的曝光。 矩形开口的宽度小于开口宽度坐标上的第一曲线与垂直于纵向方向的入射光电场方向的近场光强度之间的交叉点处的宽度 小开口图案和平行于小开口图案的长度方向的入射光电场方向的相同坐标上的第二曲线。