公开(公告)号：US20200274168A1

公开(公告)日：2020-08-27

申请号：US16796287

申请日：2020-02-20

Applicant: SAFT ,  H.E.F.

Inventor： Celine LAVAUD ,  Cecile TESSIER ,  Laurent DUBOST ,  Michel Joseph Pierre Marie MARTIN

IPC: H01M4/66 ,  H01M10/0525 ,  H01M10/39 ,  H01M10/0562 ,  H01M10/0566 ,  H01M4/90

Abstract: A metal foil including on at least one of its sides a layer of a material including: a metal or a metal alloy, carbon, hydrogen, and optionally oxygen, the atomic percentage of the metal or of the metals of the alloy in the material ranging from 10 to 60%, the atomic percentage of carbon in the material ranging from 35 to 70%, the atomic percentage of hydrogen in the material ranging from 2 to 20%, and the atomic percentage of oxygen if present in the material being less than or equal to 10%. The metal foil can be used in the manufacture of a cathode of a lithium-ion electrochemical cell. The deposition of this layer reduces the internal resistance of the cell.

公开(公告)号：US20190187567A1

公开(公告)日：2019-06-20

申请号：US16311293

申请日：2017-06-21

Applicant: H.E.F. ,  UNIVERSITE JEAN MONNET SAINT ETIENNE ,  CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)

Inventor： Maxime BICHOTTE ,  Yves JOURLIN ,  Laurent DUBOST

IPC: G03F7/20 ,  G03F9/00 ,  G03F1/76 ,  G03F1/80

CPC classification number: G03F7/70216 ,  B82Y30/00 ,  G03F1/00 ,  G03F1/68 ,  G03F1/76 ,  G03F1/80 ,  G03F7/2026 ,  G03F7/7035 ,  G03F9/70

Abstract: The invention relates to a system (2) for producing an optical mask (35) for surface microtexturing, said system (2) comprising: a substrate (10) having a surface (11) that is to be textured; a layer of material (20) which covers the surface (11) of the substrate (10) and has an outer surface (21) that is exposed to the outside environment; and a generating and depositing device for generating and depositing droplets (30) on the outer surface (21) of the layer of material (20), in a specific arrangement (31) under condensation, forming the optical mask (35) on the outer surface (21) of the layer of material (20). The invention also relates to a treatment plant comprising a system (2) of said type. The invention further relates to a method for producing a mask as well as to a surface microtexturing method.

公开(公告)号：US20190187554A1

公开(公告)日：2019-06-20

申请号：US16311287

申请日：2017-06-21

Applicant: H.E.F. ,  UNIVERSITE JEAN MONNET SAINT ETIENNE ,  CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)

Inventor： Maxime BICHOTTE ,  Yves JOURLIN ,  Laurent DUBOST

IPC: G03F1/76 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32

CPC classification number: G03F1/76 ,  G03F1/00 ,  G03F1/68 ,  G03F7/162 ,  G03F7/2002 ,  G03F7/322 ,  G03F7/70 ,  G03F7/7035

Abstract: The invention relates to a system (2) for producing an optical mask (35) for surface treatment, in particular surface microtexturing, said system (2) comprising: a layer of material (20) which has an outer surface (21) that is exposed to the outside environment; and a generating and depositing device for generating and depositing droplets (30) on the outer surface (21) of the layer of material (20) in which a specific arrangement (31), forming the optical mask (35) on the outer surface (21) of the layer of material (20). The invention also relates to a treatment plant comprising a system (2) of said type. The invention further relates to a method for producing a mask as well as to a method for surface treatment.