DUAL PORT SRAM CELL AND METHOD OF DESIGNING THE SAME

    公开(公告)号:US20230113482A1

    公开(公告)日:2023-04-13

    申请号:US17957826

    申请日:2022-09-30

    Abstract: A dual-port static random access memory (SRAM) cell is provided. The dual-port SRAM cell includes: P-type active patterns that are spaced apart from one another along a first direction, each of the P-type active patterns extending in a second direction perpendicular to the first direction and including at least one transistor. The P-type active patterns include first through sixth P-type active patterns which are sequentially arranged along the first direction. A first cutting area is provided between the second P-type active pattern and a first boundary of the dual-port SRAM cell that extends along the first direction, and a second cutting area is provided between the fifth P-type active pattern and a second boundary that is opposite to the first boundary and extends along the first direction.

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