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公开(公告)号:US20220122673A1
公开(公告)日:2022-04-21
申请号:US17227501
申请日:2021-04-12
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: SEUNGYEON KIM , DAESEOK BYEON , PANSUK KWAK , HONGSOO JEON
IPC: G11C16/24 , H01L27/11556 , H01L27/11582 , G11C5/06 , G11C16/26
Abstract: A memory device includes; a memory cell array including a first memory block and a second memory block adjacently disposed in a first direction, driving signal lines respectively corresponding to vertically stacked word lines, and a pass transistor circuit including an odd number of pass transistor groups and connected between the driving signal lines and the memory cell array. One of the odd number of pass transistor groups includes a first pass transistor connected between a first word line of the first memory block and a first driving signal line among the driving signal lines, and a second pass transistor connected between a first word line of the second memory block and the first driving signal line adjacently disposed to the first pass transistor in a second direction.
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公开(公告)号:US20220406385A1
公开(公告)日:2022-12-22
申请号:US17898885
申请日:2022-08-30
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: SEUNGYEON KIM , DAESEOK BYEON , PANSUK KWAK , HONGSOO JEON
IPC: G11C16/24 , G11C5/06 , G11C16/26 , H01L27/11556 , H01L27/11582
Abstract: A memory device includes; a memory cell array including a first memory block and a second memory block adjacently disposed in a first direction, driving signal lines respectively corresponding to vertically stacked word lines, and a pass transistor circuit including an odd number of pass transistor groups and connected between the driving signal lines and the memory cell array. One of the odd number of pass transistor groups includes a first pass transistor connected between a first word line of the first memory block and a first driving signal line among the driving signal lines, and a second pass transistor connected between a first word line of the second memory block and the first driving signal line adjacently disposed to the first pass transistor in a second direction.
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公开(公告)号:US20210005629A1
公开(公告)日:2021-01-07
申请号:US17025479
申请日:2020-09-18
Applicant: Samsung Electronics Co., Ltd.
Inventor: BONGSOON LIM , SANG-WAN NAM , SANG-WON PARK , SANG-WON SHIM , HONGSOO JEON , YONGHYUK CHOI
IPC: H01L27/11582 , H01L27/11565 , H01L27/11556 , H01L27/11573 , H01L23/522 , G11C7/18 , H01L27/11519 , H01L27/11526 , G11C8/14
Abstract: A three-dimensional semiconductor memory device may include a peripheral circuit structure including transistors on a first substrate, and a cell array structure on the peripheral circuit structure, the cell array structure including: a first stack structure block comprising first stack structures arranged side by side in a first direction on a second substrate, a second stack structure block comprising second stack structures arranged side by side in the first direction on the second substrate, a separation structure disposed on the second substrate between the first stack structure block and the second stack structure block and comprising first mold layers and second mold layers, and a contact plug penetrating the separation structure. The cell array structure may include a first metal pad and the peripheral circuit structure may include a second metal pad. The first metal pad may be in contact with the second metal pad.
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公开(公告)号:US20230115503A1
公开(公告)日:2023-04-13
申请号:US17836831
申请日:2022-06-09
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: SUJEONG KIM , BONGSOON LIM , HONGSOO JEON
IPC: H01L27/11575 , H01L27/11519 , H01L27/11556 , H01L27/11548 , H01L27/11565 , H01L27/11582
Abstract: A semiconductor device may include stacks extended in a first direction on a substrate, separation structures extended in the first direction and respectively provided between the stacks, vertical channels penetrating each of the stacks, bit lines extended in a second direction crossing the first direction, each of the vertical channels being overlapped with a pair of the bit lines, and contact plugs connecting the bit lines to the vertical channels. Each of the stacks may include electrodes stacked on the substrate and at least two upper separation patterns dividing an upper one of the electrodes into several portions in the second direction. The vertical channels may be classified into a plurality of types, depending on a distance from one of the separation structures in the second direction, and each of the bit lines may be connected to all types of the vertical channels.
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公开(公告)号:US20230056261A1
公开(公告)日:2023-02-23
申请号:US17982255
申请日:2022-11-07
Applicant: Samsung Electronics Co., Ltd.
Inventor: BONGSOON LIM , SANG-WAN NAM , SANG-WON PARK , SANG-WON SHIM , HONGSOO JEON , YONGHYUK CHOI
IPC: H01L23/535 , H01L27/11573 , H01L27/11582
Abstract: A three-dimensional semiconductor memory device may include a first stack structure block including first stack structures arranged in a first direction on a substrate, a second stack structure block including second stack structures arranged in the first direction on the substrate, a separation structure disposed on the substrate between the first and second stack structure blocks and including first mold layers and second mold layers, and a contact plug penetrating the separation structure. A bottom surface of the contact plug may contact the substrate.
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公开(公告)号:US20220181284A1
公开(公告)日:2022-06-09
申请号:US17513132
申请日:2021-10-28
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: HOMOON SHIN , JOOYONG PARK , HONGSOO JEON , PANSUK KWAK
IPC: H01L23/00 , H01L25/065 , H01L25/18 , H01L25/00
Abstract: An integrated circuit device includes; a peripheral circuit structure including a peripheral circuit, a first insulating layer covering the peripheral circuit, extension lines in the first insulating layer, and a first bonding pad in the first insulating layer, and a cell array structure including a conductive plate, a memory cell array below the conductive plate, a second insulating layer covering the memory cell array, a second bonding pad in the second insulating layer, a conductive via on the conductive plate, and a line connected to the conductive via. The first bonding pad contacts the second bonding pad, and the integrated circuit device further includes contact plugs electrically connecting the line to the extension lines.
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公开(公告)号:US20200168547A1
公开(公告)日:2020-05-28
申请号:US16592886
申请日:2019-10-04
Applicant: Samsung Electronics Co., Ltd.
Inventor: BONGSOON LIM , SANG-WAN NAM , SANG-WON PARK , SANG-WON SHIM , HONGSOO JEON , YONGHYUK CHOI
IPC: H01L23/535 , H01L27/11582 , H01L27/11573
Abstract: A three-dimensional semiconductor memory device may include a first stack structure block including first stack structures arranged in a first direction on a substrate, a second stack structure block including second stack structures arranged in the first direction on the substrate, a separation structure disposed on the substrate between the first and second stack structure blocks and including first mold layers and second mold layers, and a contact plug penetrating the separation structure. A bottom surface of the contact plug may contact the substrate.
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公开(公告)号:US20190157292A1
公开(公告)日:2019-05-23
申请号:US15996483
申请日:2018-06-03
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: CHANHO KIM , PANSUK KWAK , CHAEHOON KIM , HONGSOO JEON , JEUNGHWAN PARK , BONGSOON LIM
IPC: H01L27/11582 , G11C16/04 , H01L27/1157 , G11C16/24
Abstract: At least one latch of a page buffer of a nonvolatile memory device includes a capacitor that selectively stores a voltage of a sensing node. The capacitor includes at least one first contact having a second height corresponding to a first height of each of cell strings, and at least one second contact to which a ground voltage is supplied. The at least one second contact has a third height corresponding to the first height, disposed adjacent to the at least one first contact, and electrically separated from the at least one first contact.
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