公开(公告)号：US11791173B2

公开(公告)日：2023-10-17

申请号：US16741002

申请日：2020-01-13

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Seung Hoon Choi ,  Ja Eung Koo ,  No Ui Kim ,  Hyun Kyo Seo ,  Tae Min Earmme ,  Bo Un Yoon ,  Youn Cheol Jeong

IPC: H01L21/67 ,  H01L21/02 ,  B24B37/34

CPC classification number: H01L21/67051 ,  B24B37/34 ,  H01L21/02057 ,  H01L21/02096 ,  H01L21/67046

Abstract: Substrate cleaning equipment includes a substrate holder which supports a substrate, a swing body, a head, a first cleaning liquid supply structure, and a second cleaning liquid supply structure. The swing body moves along a sweep line on a main surface of the substrate. The head is coupled to the swing body and includes a pad attachment surface facing the substrate holder. The first cleaning liquid supply structure is coupled to the swing body and sprays a first cleaning liquid onto the main surface of the substrate. The second cleaning liquid supply structure sprays a second cleaning liquid onto the main surface of the substrate. A buffing pad is attached to the pad attachment surface.

公开(公告)号：US11648644B2

公开(公告)日：2023-05-16

申请号：US16517849

申请日：2019-07-22

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Eun Seok Lee ,  Ja Eung Koo ,  Kuen Byul Kim ,  Jeong Min Na ,  Chang Gil Ryu ,  Hyeon Dong Song ,  Young Seok Jang ,  Jin Suk Hong

IPC: B24B53/017 ,  B24B57/02 ,  B24D13/14 ,  B24B53/12 ,  B24B37/34 ,  B24B37/10 ,  B24B21/18

CPC classification number: B24B53/017 ,  B24B37/34 ,  B24B53/12 ,  B24B57/02 ,  B24D13/145 ,  B24B21/18 ,  B24B37/105

Abstract: A polishing pad conditioning apparatus according to an example embodiment of the present inventive concept includes an apparatus body, a pivot arm provided on the apparatus body and including a housing having an internal space and provided at a distal end portion of the pivot arm and a head unit disposed at the distal end portion of the pivot arm. The head unit includes: a rotary motor provided in the internal space of the housing, the rotary motor including a rotary shaft; a foreign material blocking member connected to the rotary shaft; a disk holder connected to the rotary shaft; and a conditioning disk coupled to the disk holder. The foreign material blocking member includes a fluid flow groove configured to guide a movement of fluid for preventing foreign objects from entering the housing on an outer surface of the foreign material blocking member.