公开(公告)号：US20240060185A1

公开(公告)日：2024-02-22

申请号：US18231400

申请日：2023-08-08

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Yeontae KIM ,  Yihwan KIM ,  Hunyong PARK ,  Keesoo PARK ,  Janghwi LEE ,  Sungho JANG

IPC: C23C16/48 ,  C23C16/458

CPC classification number: C23C16/482 ,  C23C16/4585

Abstract: A substrate processing apparatus includes a chamber including a susceptor to support a substrate, a reflective housing outside the chamber, a light source in the reflective housing, the light source being configured to emit a light toward the susceptor, and a light adjuster between the light source and the susceptor, the light adjuster including a support portion supported inside the chamber and a lens coupled to the support portion, and the lens including a transmission portion configured to transmit the light and a scattering pattern portion configured to scatter the light.

公开(公告)号：US20190113463A1

公开(公告)日：2019-04-18

申请号：US15940011

申请日：2018-03-29

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Seongkeun CHO ,  Akinori OKUBO ,  Tae Hyun KIM ,  Sangwoo BAE ,  Janghwi LEE

IPC: G01N21/88 ,  G01N21/21 ,  G01N21/95 ,  H01L21/66 ,  H01L21/67

CPC classification number: G01N21/8806 ,  G01N21/21 ,  G01N21/9501 ,  G01N2021/8848 ,  G01N2201/0683 ,  H01L21/67288 ,  H01L22/12

Abstract: An optical test system includes a stage region to accommodate an object to be tested, a first incident optical system which changes a first polarization state of a first light beam to a second polarization state and provide the first light beam in the second polarization state to the stage region in a first direction at a first incident angle which is not a right angle, a second incident optical system which changes a third polarization state of a second light beam to a fourth polarization state and inputs the second light beam in the fourth polarization state to the stage region in a second direction at a second incident angle which is not a right angle, and a main optical system to detect a first reflected light beam reflected from the stage region at a first reflection angle different from the first and second incident.