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    SEMICONDUCTOR DEVICES
    6.
    发明申请
    SEMICONDUCTOR DEVICES 有权

    公开(公告)号：US20240395862A1

    公开(公告)日：2024-11-28

    申请号：US18509925

    申请日：2023-11-15

    Applicant: SAMSUNG ELECTRONICS CO., LTD.

    Inventor： Sungmin KIM ,  Yeonsook KIM ,  Yoon-Hee LEE ,  Yechan KIM

    IPC: H01L29/06 ,  H01L23/48 ,  H01L27/092 ,  H01L29/417 ,  H01L29/423 ,  H01L29/775 ,  H01L29/786

    Abstract: Provided is a semiconductor device comprising: a semiconductor substrate; source/drain patterns spaced apart in a first direction on the semiconductor substrate; and channel patterns on the semiconductor substrate, wherein at least one of the channel patterns is between adjacent source/drain patterns among the source/drain patterns, wherein at least one of the channel patterns includes a plurality of semiconductor patterns, and the plurality of semiconductor patterns are spaced apart from each other in a second direction that is perpendicular to an upper surface of the semiconductor substrate, wherein the semiconductor substrate includes a {110} crystal plane, wherein at least one of the channel patterns includes a surface pattern, wherein the surface pattern includes first surfaces and second surfaces, wherein the first surfaces include protruding edges, wherein the second surfaces are respectively connected to the first surfaces through protruding edges, and wherein the protruding edges are arranged in a third direction.

    RESIST COMPOSITION
    7.
    发明申请
    RESIST COMPOSITION 有权

    公开(公告)号：US20210263411A1

    公开(公告)日：2021-08-26

    申请号：US16991281

    申请日：2020-08-12

    Applicant: SAMSUNG ELECTRONICS CO., LTD.

    Inventor： Yechan KIM ,  Su Min KIM ,  Ju-Young KIM ,  Jinjoo KIM ,  Hyunwoo KIM ,  Juhyeon PARK ,  Hyunji SONG ,  Songse YI ,  Suk Koo HONG

    IPC: G03F7/004 ,  C08L25/06 ,  C07C381/12 ,  C08L35/00

    Abstract: A resist composition including a polymer; and a compound represented by Formula 1, in Formula 1, R1 is hydrogen, a halogen, an alkyl group having 1 to 7 carbon atoms, a carbonyl group having 1 to 7 carbon atoms, an ester group having 1 to 7 carbon atoms, an acetal group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, an ether group having 1 to 7 carbon atoms, or a group represented by Formula R, and R2, R3, R4 and R5 are hydrogen, a halogen, an alkyl group having 1 to 7 carbon atoms, an ester group having 1 to 7 carbon atoms, an acetal group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, or an ether group having 1 to 7 carbon atoms,

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