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公开(公告)号：US20210223692A1
公开(公告)日：2021-07-22
申请号：US16994957
申请日：2020-08-17
发明人： Hyunji SONG , Sukkoo HONG , Sumin KIM , Yechan KIM , Juyoung KIM , Jinjoo KIM , Hyunwoo KIM , Juhyeon PARK , Songse YI
IPC分类号： G03F7/004 , G03F7/039 , C07D277/26 , C07D263/32 , C07D233/64 , C07D213/68
摘要： A photo-decomposable compound, a photoresist composition, and a method of manufacturing an IC device, the compound generating acid upon exposure and acts as a quenching base that neutralizes acid in an unexposed state and being represented by Formula 1: wherein, in Formula 1, Ra is a C5 to C40 substituted or unsubstituted cyclic hydrocarbon group including at least one nitrogen atom, Ya is a C1 to C20 divalent linear or cyclic hydrocarbon group, n is an integer of 1 to 5, and A+ is a counter ion.
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公开(公告)号：US20210255544A1
公开(公告)日：2021-08-19
申请号：US17003414
申请日：2020-08-26
发明人： Yechan KIM , Suk Koo HONG , Su Min KIM , Ju-Young KIM , Jinjoo KIM , Hyunwoo KIM , Juhyeon PARK , Hyunji SONG , Songse YI
摘要： A resist composition including a polymer; a photoacid generator; and a material represented by Formula 1:
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公开(公告)号：US20210263411A1
公开(公告)日：2021-08-26
申请号：US16991281
申请日：2020-08-12
发明人： Yechan KIM , Su Min KIM , Ju-Young KIM , Jinjoo KIM , Hyunwoo KIM , Juhyeon PARK , Hyunji SONG , Songse YI , Suk Koo HONG
IPC分类号： G03F7/004 , C08L25/06 , C07C381/12 , C08L35/00
摘要： A resist composition including a polymer; and a compound represented by Formula 1, in Formula 1, R1 is hydrogen, a halogen, an alkyl group having 1 to 7 carbon atoms, a carbonyl group having 1 to 7 carbon atoms, an ester group having 1 to 7 carbon atoms, an acetal group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, an ether group having 1 to 7 carbon atoms, or a group represented by Formula R, and R2, R3, R4 and R5 are hydrogen, a halogen, an alkyl group having 1 to 7 carbon atoms, an ester group having 1 to 7 carbon atoms, an acetal group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, or an ether group having 1 to 7 carbon atoms,
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公开(公告)号：US20210240079A1
公开(公告)日：2021-08-05
申请号：US17003373
申请日：2020-08-26
发明人： Juhyeon PARK , Su Min KIM , Yechan KIM , Ju-Young KIM , Jinjoo KIM , Hyunwoo KIM , Hyunji SONG , Songse YI , Suk Koo HONG
IPC分类号： G03F7/038 , G03F7/004 , G03F7/38 , H01L21/027 , H01L21/3213 , G03F7/20
摘要： A photolithography method and a method of manufacturing a semiconductor device, the photolithography method including applying a composition on a substrate to form a photoresist layer; performing an exposing process using extreme ultraviolet radiation (EUV) on the photoresist layer; and developing the photoresist layer to form photoresist patterns, wherein the composition includes a photosensitive resin, a photo-acid generator, a photo decomposable quencher, an additive, and a solvent, and the additive is a compound represented by the following Formula 4A: in Formula 4A, R1 to R5 are each independently hydrogen or iodine, at least one of R1 to R5 being iodine.
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公开(公告)号：US20230120542A1
公开(公告)日：2023-04-20
申请号：US18080348
申请日：2022-12-13
发明人： Sumin KIM , Hyunwoo KIM , Sukkoo HONG , Yechan KIM , Juyoung KIM , Jinjoo KIM , Juhyeon PARK , Hyunji SONG , Songse YI
IPC分类号： G03F7/004 , C07C381/12 , G03F7/039 , C07C309/12
摘要： A photo-decomposable compound includes an anion component including an adamantyl group and a cation component including a C5 to C40 cyclic hydrocarbon group and forming a complex with the anion component. At least one of the adamantyl group and the cyclic hydrocarbon group has a substituent, which decomposes by acid and generates an alkali soluble group. The substituent includes an acid-labile protecting group. A photoresist composition includes a chemically amplified polymer, the photo-decomposable compound, and a solvent. To manufacture an integrated circuit (IC) device, a photoresist film is formed using the photoresist composition on a feature layer, a first area of the photoresist film is exposed to generate a plurality of acids from the photo-decomposable compound in the first area, the chemically amplified polymer is deprotected due to the plurality of acids, and the first area is removed to form a photoresist pattern.
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公开(公告)号：US20210240078A1
公开(公告)日：2021-08-05
申请号：US17005636
申请日：2020-08-28
发明人： Sumin KIM , Hyunwoo KIM , Sukkoo HONG , Yechan KIM , Juyoung KIM , Jinjoo KIM , Juhyeon PARK , Hyunji SONG , Songse YI
IPC分类号： G03F7/004 , C07C381/12 , C07C309/12 , G03F7/039
摘要： A photo-decomposable compound includes an anion component including an adamantyl group and a cation component including a C5 to C40 cyclic hydrocarbon group and forming a complex with the anion component. At least one of the adamantyl group and the cyclic hydrocarbon group has a substituent, which decomposes by acid and generates an alkali soluble group. The substituent includes an acid-labile protecting group. A photoresist composition includes a chemically amplified polymer, the photo-decomposable compound, and a solvent. To manufacture an integrated circuit (IC) device, a photoresist film is formed using the photoresist composition on a feature layer, a first area of the photoresist film is exposed to generate a plurality of acids from the photo-decomposable compound in the first area, the chemically amplified polymer is deprotected due to the plurality of acids, and the first area is removed to form a photoresist pattern.
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