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    SUBSTRATE INSPECTION METHOD AND DEVICE
    2.
    发明申请
    SUBSTRATE INSPECTION METHOD AND DEVICE 有权

    公开(公告)号：US20230033089A1

    公开(公告)日：2023-02-02

    申请号：US17668622

    申请日：2022-02-10

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Doyoung Yoon ,  Junghoon Kim ,  Ilsuk Park ,  Kwangil Shin

    IPC: G06T7/00 ,  G06V10/22 ,  G06V10/14

    Abstract: A substrate inspection method includes: (i) acquiring a plurality of defect of interest (DOI) images of a substrate having a DOI, under a corresponding plurality of different optical conditions, (ii) acquiring a plurality of DOI difference images from differences between the plurality of DOI images and a reference image, and (iii) acquiring a plurality of DOI difference-of-difference (DOD) images from differences between the plurality of DOI difference images. The method also includes setting two optical conditions corresponding to a DOI DOD image having the highest signal-to-noise ratio (SNR) among the plurality of DOI DOD images, as a first optical condition and a second optical condition, and acquiring a first image of the substrate under the first optical condition and a second image of the substrate under the second optical condition. A first difference image is also acquired, which is a difference between the first image and the reference image, and a second difference image is acquired, which is a difference between the second image and the reference image. A DOD image is acquired that is a difference between the first difference image and the second difference image. A low-SNR defect candidate region is then detected from the first difference image, the second difference image, and the DOD image.

    Method and electronic device for providing security
    3.
    发明申请
    Method and electronic device for providing security 审中-公开
    用于提供安全性的方法和电子设备

    公开(公告)号：US20140344918A1

    公开(公告)日：2014-11-20

    申请号：US14120327

    申请日：2014-05-14

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Bokun Choi ,  Junghoon Kim ,  Boram Namgoong ,  Byoungtack Roh ,  Jihyun Park ,  Youngjin Lee

    IPC: G06F21/44

    CPC classification number: G06F21/88 ,  G06F21/31 ,  G06F21/32 ,  G06F21/36 ,  G06F2221/2105 ,  G06F2221/2111 ,  G06F2221/2113

    Abstract: A method for securing an electronic device is provided. The method includes determining a security level of the electronic device, the security level comprising one of a high security level and a low security level, and adjusting a security level of the electronic device, based on the current status of the electronic device. An electronic device includes a screen configured to display information, a processor configured to determine a security level of the electronic device, the security level comprising one of a high security level and a low security level, and adjust a security level of the electronic device, based on the current status of the electronic device. Other embodiments are also disclosed.

    Abstract translation: 提供一种用于固定电子设备的方法。 该方法包括基于电子设备的当前状态来确定电子设备的安全级别，安全级别包括高安全级别和低安全级别之一，以及调整电子设备的安全级别。 电子设备包括被配置为显示信息的屏幕，被配置为确定电子设备的安全级别的处理器，包括高安全级别和低安全级别之一的安全级别，并且调整电子设备的安全级别， 基于电子设备的当前状态。 还公开了其他实施例。

    Method of manufacturing semiconductor device
    4.
    发明授权
    Method of manufacturing semiconductor device 有权

    公开(公告)号：US11537041B2

    公开(公告)日：2022-12-27

    申请号：US16937266

    申请日：2020-07-23

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Chulho Kim ,  Chorong Park ,  Soohan Kim ,  Junghoon Kim ,  Jeonghun Park

    IPC: G03F1/42 ,  H01L21/66 ,  H01L21/027 ,  H01L23/544

    Abstract: A method of manufacturing a semiconductor device includes: forming a first outer box and a second outer box on a wafer, providing a photoresist layer on the wafer; and by removing a portion of the photoresist layer, forming a photoresist pattern including a first opening and a second opening that are horizontally apart from each other, wherein the first opening defines a first inner box superimposed on the first outer box in a plan view, the second opening defines a second inner box superimposed on the second outer box in the plan view, and a horizontal distance between the first opening and the second opening is about 150 μm to about 400 μm.

    METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
    5.
    发明申请
    METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE 有权

    公开(公告)号：US20210132489A1

    公开(公告)日：2021-05-06

    申请号：US16937266

    申请日：2020-07-23

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Chulho Kim ,  Chorong Park ,  Soohan Kim ,  Junghoon Kim ,  Jeonghun Park

    IPC: G03F1/42 ,  H01L21/66 ,  H01L23/544 ,  H01L21/027

    Abstract: A method of manufacturing a semiconductor device includes: forming a first outer box and a second outer box on a wafer, providing a photoresist layer on the wafer; and by removing a portion of the photoresist layer, forming a photoresist pattern including a first opening and a second opening that are horizontally apart from each other, wherein the first opening defines a first inner box superimposed on the first outer box in a plan view, the second opening defines a second inner box superimposed on the second outer box in the plan view, and a horizontal distance between the first opening and the second opening is about 150 μm to about 400 μm.

    Substrate inspection method and device
    6.
    发明授权
    Substrate inspection method and device 有权

    公开(公告)号：US12175655B2

    公开(公告)日：2024-12-24

    申请号：US17668622

    申请日：2022-02-10

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Doyoung Yoon ,  Junghoon Kim ,  Ilsuk Park ,  Kwangil Shin

    IPC: G06T7/00 ,  G06V10/14 ,  G06V10/22

    Abstract: A substrate inspection method includes: (i) acquiring a plurality of defect of interest (DOI) images of a substrate having a DOI, under a corresponding plurality of different optical conditions, (ii) acquiring a plurality of DOI difference images from differences between the plurality of DOI images and a reference image, and (iii) acquiring a plurality of DOI difference-of-difference (DOD) images from differences between the plurality of DOI difference images. The method also includes setting two optical conditions corresponding to a DOI DOD image having the highest signal-to-noise ratio (SNR) among the plurality of DOI DOD images, as a first optical condition and a second optical condition, and acquiring a first image of the substrate under the first optical condition and a second image of the substrate under the second optical condition. A first difference image is also acquired, which is a difference between the first image and the reference image, and a second difference image is acquired, which is a difference between the second image and the reference image. A DOD image is acquired that is a difference between the first difference image and the second difference image. A low-SNR defect candidate region is then detected from the first difference image, the second difference image, and the DOD image.

    STORAGE SYSTEM AND METHOD OF DATA MANAGEMENT OF THE SAME
    8.
    发明公开
    STORAGE SYSTEM AND METHOD OF DATA MANAGEMENT OF THE SAME 审中-公开

    公开(公告)号：US20240126435A1

    公开(公告)日：2024-04-18

    申请号：US18207373

    申请日：2023-06-08

    Applicant: SAMSUNG ELECTRONICS CO., LTD.

    Inventor： Junghoon Kim ,  Hyuntate Kim ,  Hojin Ahn ,  Jihun You ,  Doogie Lee ,  Yeni Jang

    IPC: G06F3/06

    CPC classification number: G06F3/0608 ,  G06F3/064 ,  G06F3/0652 ,  G06F3/0679

    Abstract: A storage system includes a host device including a file system configured to set a plurality of block expiration times respectively corresponding to a plurality of data blocks included in a file, and a storage device configured to store data according to control of the host device. The storage device includes a nonvolatile memory device configured to store the plurality of data blocks provided from the host device, a storage timer configured to provide a count value by counting time, and a data deletion manager. The data deletion manager generates a data deletion information table including a plurality of block deletion times based on the plurality of block expiration times provided from the host device. The data deletion manager deletes each data block of the plurality of data blocks stored in the nonvolatile memory device based on the data deletion information table and the count value.

    Electronic device and method for processing image
    10.
    发明授权
    Electronic device and method for processing image 有权

    公开(公告)号：US11488284B2

    公开(公告)日：2022-11-01

    申请号：US16749281

    申请日：2020-01-22

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Chunu Han ,  Junghoon Kim ,  Sangyoul Yoon ,  S M Zahid Ishraque

    IPC: G06T5/00 ,  G06T5/50 ,  G06V10/20 ,  G06V10/22 ,  G06V10/75

    Abstract: A method for processing an image and an electronic device therefor are provided. The electronic device includes an image sensor, a memory, and a processor. The processor is configured to obtain a raw image using the image sensor, identify recognition information about a plurality of sub-regions corresponding to a plurality of objects included in the raw image, based on image recognition using the raw image, generate a first image by performing a first calibration process on the raw image using a first parameter set associated with first recognition information corresponding to a first sub-region among the plurality of sub-regions, generate a second image by performing a second calibration process on the raw image using a second parameter set associated with second recognition information corresponding to a second sub-region among the plurality of sub-regions, and generate a third image by using a region of the first image corresponding to the first sub-region and a region of the second image corresponding to the second sub-region.

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