公开(公告)号：US11984297B2

公开(公告)日：2024-05-14

申请号：US17711181

申请日：2022-04-01

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： Sejin Oh ,  Youngdo Kim ,  Sanghun Kim ,  Sungyeol Kim ,  Younghwan Kim ,  Taemin Earmme ,  Changyun Lee ,  Sunghun Jang

IPC分类号： H01J37/32 ,  H01L21/311

CPC分类号： H01J37/32183 ,  H01J37/32165 ,  H01J37/32568 ,  H01L21/31116 ,  H01J2237/334

摘要： A plasma control device includes a matching circuit, a resonance circuit, and a controller. The matching circuit is connected to a first electrode of a plasma chamber including the first electrode and a second electrode, and matches impedance of a radio frequency (RF) power by an RF driving signal with an impedance of the first electrode. The RF driving signal is based on a first RF signal having a first frequency. The resonance circuit is connected between the second electrode and a ground voltage, and controls plasma distribution within the plasma chamber by providing resonance with respect to harmonics associated with the first frequency and by adjusting a ground impedance between the second electrode and the ground voltage. The controller provides the resonance circuit with a capacitance control signal associated with the resonance and switch control signals associated with the ground impedance.