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公开(公告)号：US20230200053A1
公开(公告)日：2023-06-22
申请号：US17945235
申请日：2022-09-15
Applicant: Samsung Electronics Co., Ltd.
Inventor： Yangdoo Kim , Yonghwan Kim , Sangwuk Park , Sunghyun Park , Jinyoung Park , Minkyu Suh , Jungpyo Hong
IPC: H10B12/00
CPC classification number: H10B12/315 , H10B12/34 , H10B12/033
Abstract: A semiconductor memory device includes a substrate including a memory cell region, a plurality of capacitor structures arranged in the memory cell region of the substrate and including a plurality of lower electrodes, a capacitor dielectric layer, and an upper electrode, a first support pattern contacting sidewalls of the plurality of lower electrodes of the plurality of capacitor structures to support the plurality of lower electrodes, and a second support pattern located at a higher vertical level than a vertical level of the first support pattern and contacting the sidewalls of the plurality of lower electrodes to support the plurality of lower electrodes. The plurality of lower electrodes have a plurality of recessed electrode portions, respectively, in upper portions of the plurality of lower electrodes.
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公开(公告)号：US20220159788A1
公开(公告)日：2022-05-19
申请号：US17348753
申请日：2021-06-15
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Taehong Kim , Younghoo Kim , Sunghyun Park , Kuntack Lee
IPC: H05B1/02 , H01L21/687 , H01L21/67
Abstract: A substrate heating apparatus includes: a plurality of heating lamps disposed on a chuck stage; a window disposed on the chuck stage and including a window base and a central lens, wherein the chuck stage and the window are each configured to support a substrate above the heating lamps; and a mirror disposed between the heating lamps and the chuck stage, the mirror including a mirror base, a central reflector, and an edge reflector, wherein the plurality of heating lamps are configured to heat the substrate by emitting light through the window onto the substrate and emitting light onto the mirror, wherein the mirror is configured to reflect the light through the window onto the substrate, including reflecting portions of the light via the central and edge reflectors, and wherein the central lens is configured to focus the light onto the central portion of the substrate.
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公开(公告)号：US10885954B2
公开(公告)日：2021-01-05
申请号：US15840601
申请日：2017-12-13
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sang-Yeop Baeck , Inhak Lee , SangShin Han , Tae-Hyung Kim , JaeSeung Choi , Sunghyun Park , Hyunsu Choi
IPC: G11C7/10 , G11C11/419 , G11C11/4096 , G11C7/12 , G11C5/14 , G11C8/08 , G11C8/16 , G11C11/412
Abstract: A memory device includes a first write assist circuit providing a cell voltage or a write assist voltage to a first memory cell connected with a first bit line pair, a first write driver that provides write data to the first memory cell through the first bit line pair, a second write assist circuit that provides the cell voltage or the write assist voltage to a second memory cell connected with a second bit line pair, and a second write driver that provides write data to the second memory cell through the second bit line pair. One of the first and second write assist circuits provides the write assist voltage in response to a column selection signal for selecting one write driver, which provides write data, from among the first, and second write drivers, and the other thereof provides the cell voltage in response to the column selection signal.
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公开(公告)号：US11709593B2
公开(公告)日：2023-07-25
申请号：US16925489
申请日：2020-07-10
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Wonsuk Chung , Sunghyun Park , Soonyong Cho , Jaehwan Kim , Jisup Lee
IPC: G06F3/04886
CPC classification number: G06F3/04886
Abstract: Disclosed are an electronic apparatus and a method of controlling the same. The electronic apparatus includes a camera, a display, a memory, and a processor configured to execute at least one instruction to: detect a plurality of fingers in a plurality of first image frames obtained through the camera and, in response to an identification that a pose of the plurality of detected fingers corresponds to a trigger pose, enter a character input mode, detect a first motion of a finger among the plurality of fingers in a plurality of second image frames obtained through in the character input mode, identify a key corresponding to the first motion, from among a plurality of keys mapped to the finger, based on a position of the finger by the first motion and a reference point set to the finger, and control the display to display information corresponding to the identified key.
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公开(公告)号：US11482410B2
公开(公告)日：2022-10-25
申请号：US17398219
申请日：2021-08-10
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Hunjae Jang , Seungmin Shin , Kuntack Lee , Seungho Kim , Younghoo Kim , Taehong Kim , Sunghyun Park
Abstract: A wafer-cleaning apparatus includes an inner pin that supports a wafer. The wafer-cleaning apparatus further includes a nozzle disposed above the inner pin, a light source disposed under the inner pin, a window disposed between the light source and the wafer, and a window protector disposed between the wafer and the window. The nozzle supplies a chemical liquid to the wafer and the inner pin distributes a portion of the chemical liquid on an upper surface of the wafer by rotating the wafer. The window protector receives a portion of the chemical liquid that flows out of the wafer and the light source supplies the light to the wafer through the window protector and the window.
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Patent Agency Ranking
公开(公告)号：US12225634B2
公开(公告)日：2025-02-11
申请号：US17348753
申请日：2021-06-15
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Taehong Kim , Younghoo Kim , Sunghyun Park , Kuntack Lee
IPC: H01L21/67 , H01L21/687 , H05B1/02
Abstract: A substrate heating apparatus includes: a plurality of heating lamps disposed on a chuck stage; a window disposed on the chuck stage and including a window base and a central lens, wherein the chuck stage and the window are each configured to support a substrate above the heating lamps; and a mirror disposed between the heating lamps and the chuck stage, the mirror including a mirror base, a central reflector, and an edge reflector, wherein the plurality of heating lamps are configured to heat the substrate by emitting light through the window onto the substrate and emitting light onto the mirror, wherein the mirror is configured to reflect the light through the window onto the substrate, including reflecting portions of the light via the central and edge reflectors, and wherein the central lens is configured to focus the light onto the central portion of the substrate.
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公开(公告)号：US11189503B2
公开(公告)日：2021-11-30
申请号：US16420776
申请日：2019-05-23
Applicant: Samsung Electronics Co., Ltd.
Inventor： Young-Hoo Kim , Kuntack Lee , Yong-Jhin Cho , Chawon Koh , Sunghyun Park , Hyosan Lee , Ji Hoon Cha , Soo Young Choi
Abstract: Disclosed are substrate drying methods, photoresist developing methods, and/or photolithography methods. The substrate drying method including providing a drying liquid on a substrate, increasing a pressure of the drying liquid to produce a supercritical fluid, and removing the supercritical fluid to dry the substrate may be provided.
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公开(公告)号：US20180294018A1
公开(公告)日：2018-10-11
申请号：US15840601
申请日：2017-12-13
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sang-Yeop Baeck , Inhak Lee , SangShin Han , Tae-Hyung Kim , JaeSeung Choi , Sunghyun Park , Hyunsu Choi
IPC: G11C7/10 , G11C11/419 , G11C11/4096 , G11C7/12 , G11C11/412 , G11C5/14 , G11C8/08 , G11C8/16
Abstract: A memory device includes a first write assist circuit providing a cell voltage or a write assist voltage to a first memory cell connected with a first bit line pair, a first write driver that provides write data to the first memory cell through the first bit line pair, a second write assist circuit that provides the cell voltage or the write assist voltage to a second memory cell connected with a second bit line pair, and a second write driver that provides write data to the second memory cell through the second bit line pair. One of the first and second write assist circuits provides the write assist voltage in response to a column selection signal for selecting one write driver, which provides write data, from among the first, and second write drivers, and the other thereof provides the cell voltage in response to the column selection signal.
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9.发明授权Affective model device and method of deciding behavior of the affective model device 有权情感模型设备和情感模型设备行为决定方法公开(公告)号：US08805762B2
公开(公告)日：2014-08-12
申请号：US13896479
申请日：2013-05-17
Applicant: Samsung Electronics Co., Ltd.
Inventor： Hyun-Ryong Jung , Jamee Kim Lee , Lilia Moshkina , Ronald Arkin , Sunghyun Park , Chien-Ming Huang
Abstract: An affective model device and a method of deciding the behavior of an affective model device are provided. The affective model device has affective components representing trait, attitude, mood, emotion, and the like. The affective model device updates the emotion at regular time intervals or when a stimulus is received, and decides the behavior based on the updated emotion. The emotion may be updated depending on trait, attitude, and mood.
Abstract translation: 提供了情感模型设备和决定情感模型设备的行为的方法。 情感模型装置具有表现特质，态度，情绪，情绪等的情感成分。 情感模型设备以规则的时间间隔或当接收到刺激时更新情绪，并且基于更新的情感来决定行为。 情绪可能根据特质，态度和心情进行更新。
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公开(公告)号：US11798801B2
公开(公告)日：2023-10-24
申请号：US18048924
申请日：2022-10-24
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Hunjae Jang , Seungmin Shin , Kuntack Lee , Seungho Kim , Younghoo Kim , Taehong Kim , Sunghyun Park
CPC classification number: H01L21/02057 , B08B3/08 , B08B3/10 , B08B7/0035
Abstract: A wafer-cleaning apparatus includes an inner pin that supports a wafer. The wafer-cleaning apparatus further includes a nozzle disposed above the inner pin, a light source disposed under the inner pin, a window disposed between the light source and the wafer, and a window protector disposed between the wafer and the window. The nozzle supplies a chemical liquid to the wafer and the inner pin distributes a portion of the chemical liquid on an upper surface of the wafer by rotating the wafer. The window protector receives a portion of the chemical liquid that flows out of the wafer and the light source supplies the light to the wafer through the window protector and the window.
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