SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
    1.
    发明申请
    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD 有权
    基板处理装置和基板处理方法

    公开(公告)号:US20160372341A1

    公开(公告)日:2016-12-22

    申请号:US15183234

    申请日:2016-06-15

    CPC classification number: H01L22/10 H01L21/6715 H01L21/67248

    Abstract: The temperature of a chemical liquid supplied to a pot is detected while allowing a processing liquid discharge port to discharge the chemical liquid toward the pot at a pre-dispensing position. The temperature of the chemical liquid rises in response to the lapse of time. When the temperature of the chemical liquid supplied to the pot reaches a second target temperature, the processing liquid discharge port is allowed to stop the discharge of the chemical liquid. Thereafter, a positional relationship between the processing liquid discharge port and the pot is changed, and the processing liquid discharge port is allowed to discharge the chemical liquid toward the substrate at the processing position.

    Abstract translation: 检测供给到锅的药液的温度,同时允许处理液排出口在预分配位置向化学液体排出药液。 化学液体的温度随着时间的推移而升高。 当供给到锅的化学液体的温度达到第二目标温度时,允许处理液排出口停止药液的排出。 此后,改变处理液排出口和罐之间的位置关系,并且允许处理液排出口在处理位置将化学液体排向基板。

    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

    公开(公告)号:US20210028032A1

    公开(公告)日:2021-01-28

    申请号:US16979194

    申请日:2018-12-28

    Abstract: A substrate processing apparatus includes a temperature detector and a controller. The temperature detector detects a temperature of processing liquid before the temperature of the processing liquid in pre-dispensing in progress reaches a target temperature. The controller sets discharge stop duration of the processing liquid in the pre-dispensing based on target temperature prediction duration. The target temperature prediction duration is prediction duration until the temperature of the processing liquid reaches the target temperature from a detection temperature. The detection temperature is the temperature of the processing liquid detected by the temperature detector before the temperature of the processing liquid reaches the target temperature. The target temperature prediction duration is determined based on a temperature profile. The temperature profile indicates a record of the temperature of the processing liquid changing over time when the pre-dispensing processing was performed in the past according to the pre-dispensing condition.

    HEATER ABNORMALITY DETECTING APPARATUS, PROCESSING LIQUID SUPPLYING APPARATUS, AND SUBSTRATE PROCESSING SYSTEM
    3.
    发明申请
    HEATER ABNORMALITY DETECTING APPARATUS, PROCESSING LIQUID SUPPLYING APPARATUS, AND SUBSTRATE PROCESSING SYSTEM 审中-公开
    加热器异常检测装置,加工液体供应装置和基板处理系统

    公开(公告)号:US20160251754A1

    公开(公告)日:2016-09-01

    申请号:US15052028

    申请日:2016-02-24

    CPC classification number: G01N27/00 H01L21/67017 H01L21/67051 H01L21/67288

    Abstract: A heater abnormality detecting apparatus is arranged to detect an abnormality of a heater, the heater contacting a processing liquid to heat the processing liquid and having a heating element made of metal and a coating made of resin and covering a periphery of the heating element, and the apparatus includes a grounding unit grounding the processing liquid in contact with the heater, a power supplying unit supplying power to the heating element to make the heating element generate heat, an electric current measuring unit measuring an electric current flowing through the heating element, and a tear formation detecting unit detecting formation of a tear in the coating based on a magnitude of the electric current detected by the electric current measuring unit.

    Abstract translation: 加热器异常检测装置被设置为检测加热器的异常,加热器接触处理液以加热处理液并具有由金属制成的加热元件和由树脂制成的涂层并覆盖加热元件的周边,以及 所述装置包括:接地单元,使与所述加热器接触的处理液接地;供电单元,向所述加热元件供电以使所述加热元件产生热量;电流测量单元,测量流过所述加热元件的电流;以及 撕裂形成检测单元,其基于由电流测量单元检测到的电流的大小来检测涂层中的撕裂的形成。

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