公开(公告)号：US20220258196A1

公开(公告)日：2022-08-18

申请号：US17575685

申请日：2022-01-14

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Jun SAWASHIMA ,  Takahiro YAMAGUCHI

IPC: B05C5/02 ,  B05C11/10 ,  B05C13/02

Abstract: Disclosed is a substrate treating apparatus in which a first treating unit is located rightward of a transportation space. The first treating unit includes a first holder. A second treating unit is located leftward of the transportation space. The second treating unit includes a second holder. The first holder has a center point positioned more rearward than a middle point of the first treating unit in plan view. The second holder has a center point positioned more forward than a middle point of the second treating unit in plan view. The second treating unit has a front end located more rearward than a front end of the first treating unit and more forward than a rear end of the first treating unit. The first liquid reservoir is located leftward of the transportation space and adjacent to and in front of the second treating unit.

公开(公告)号：US20210265177A1

公开(公告)日：2021-08-26

申请号：US17182535

申请日：2021-02-23

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Jun SAWASHIMA ,  Takahiro YAMAGUCHI ,  Saki MIYAGAWA ,  Kenji KOBAYASHI

IPC: H01L21/67

Abstract: A substrate treating apparatus includes a treatment housing, a holder, and a liquid supplying unit. The holder is accommodated in the treatment housing. The holder holds a substrate. The liquid supplying unit is accommodated in the treatment housing. The liquid supplying unit supplies a treating liquid to the substrate held by the holder. The substrate treating apparatus further includes two exhaust pipes. The exhaust pipes are each located on a lateral side of the treatment housing. The exhaust pipes each exhaust gas. The substrate treating apparatus includes a switching mechanism. The switching mechanism is located at a level equal to that of the treatment housing. The switching mechanism switches an exhaust path of the treatment housing to one of the two exhaust pipes.

公开(公告)号：US20160372341A1

公开(公告)日：2016-12-22

申请号：US15183234

申请日：2016-06-15

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Kenji KOBAYASHI ,  Jun SAWASHIMA ,  Akihiro NAKASHIMA

IPC: H01L21/67 ,  H01L21/306 ,  H01L21/311 ,  H01L21/66

CPC classification number: H01L22/10 ,  H01L21/6715 ,  H01L21/67248

Abstract: The temperature of a chemical liquid supplied to a pot is detected while allowing a processing liquid discharge port to discharge the chemical liquid toward the pot at a pre-dispensing position. The temperature of the chemical liquid rises in response to the lapse of time. When the temperature of the chemical liquid supplied to the pot reaches a second target temperature, the processing liquid discharge port is allowed to stop the discharge of the chemical liquid. Thereafter, a positional relationship between the processing liquid discharge port and the pot is changed, and the processing liquid discharge port is allowed to discharge the chemical liquid toward the substrate at the processing position.

Abstract translation: 检测供给到锅的药液的温度，同时允许处理液排出口在预分配位置向化学液体排出药液。 化学液体的温度随着时间的推移而升高。 当供给到锅的化学液体的温度达到第二目标温度时，允许处理液排出口停止药液的排出。 此后，改变处理液排出口和罐之间的位置关系，并且允许处理液排出口在处理位置将化学液体排向基板。

公开(公告)号：US20220134390A1

公开(公告)日：2022-05-05

申请号：US17496826

申请日：2021-10-08

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Jun SAWASHIMA ,  Takahiro YAMAGUCHI

IPC: B08B3/08 ,  B08B13/00

Abstract: Disclosed is a substrate treating apparatus for performing treatment with supply of fluids to a substrate. The apparatus includes a first treatment housing, a treating section provided inside of the first treatment housing and configured to treat a substrate placed on a mount table with the fluids, a first fluid supplying section located on a first lateral side of the treating section, seen from a front side face where maintenance is performed to the first treatment housing, and configured to supply a first fluid of the fluids to the treating section, and a second fluid supplying section located on a second lateral side of the treating section, seen from the front side face, and configured to supply a second fluid of the fluids to the treating section.

公开(公告)号：US20210249279A1

公开(公告)日：2021-08-12

申请号：US17245079

申请日：2021-04-30

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Kenji KOBAYASHI ,  Jun SAWASHIMA ,  Yuta NISHIMURA ,  Akito HATANO ,  Motoyuki SHIMAI ,  Toyohide HAYASHI

IPC: H01L21/67

Abstract: A supply flow passage branches into a plurality of upstream flow passages. The plurality of upstream flow passages include a branching upstream flow passage that branches into a plurality of downstream flow passages. A plurality of discharge ports are respectively disposed at a plurality of positions differing in distance from a rotational axis and discharge processing liquids, supplied via the plurality of upstream flow passages, toward an upper surface of a substrate held by a substrate holding unit.

公开(公告)号：US20230256477A1

公开(公告)日：2023-08-17

申请号：US18166603

申请日：2023-02-09

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Toru ENDO ,  Yuta YAMANOUCHI ,  Yuta SEGAWA ,  Rikuta AOKI ,  Tsung Ju LIN ,  Jun SAWASHIMA

IPC: B08B3/04 ,  B08B3/02 ,  B08B13/00

CPC classification number: B08B3/04 ,  B08B3/024 ,  B08B13/00 ,  B08B2203/0264

Abstract: A substrate processing apparatus includes a chemical liquid nozzle 31 that includes a chemical liquid discharge port 95 discharging a chemical liquid in a chemical liquid discharge direction D1, inclined with respect to an upper surface of a substrate W, toward a target position P1 within the upper surface of the substrate W, a spray shield 101 that includes a shield surface 104 directly opposing the upper surface of the substrate W and with which the shield surface 104 overlaps with the target position P1 in plan view and, when the chemical liquid nozzle 31 and the shield surface 104 are viewed from below, all portions of the chemical liquid discharge port 95 are disposed at an outer side of an outer edge of the shield surface 104 or on the outer edge of the shield surface 104, and a nozzle moving unit 38 that moves the chemical liquid nozzle 31 together with the spray shield 101.

公开(公告)号：US20160247697A1

公开(公告)日：2016-08-25

申请号：US15051034

申请日：2016-02-23

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Jun SAWASHIMA ,  Akito HATANO ,  Kenji KOBAYASHI ,  Yuta NISHIMURA ,  Motoyuki SHIMAI ,  Toyohide HAYASHI

IPC: H01L21/67 ,  H01L21/687

CPC classification number: H01L21/6708 ,  H01L21/67017 ,  H01L21/67051

Abstract: A supply flow passage branches into a plurality of upstream flow passages. A plurality of discharge ports are respectively disposed at a plurality of positions differing in distance from a rotational axis of a substrate. A return flow passage is connected to the upstream flow passage. A downstream heater heats liquid flowing through the upstream flow passage. A downstream switching unit supplies the liquid, supplied to the plurality of upstream flow passages from the supply flow passage, to one of the plurality of discharge ports and the return flow passage, selectively.

Abstract translation: 供给流路分支成多个上游流路。 多个排出口分别设置在与基板的旋转轴线不同的多个位置。 回流通道连接到上游流动通道。 下游加热器加热流过上游流动通道的液体。 下游开关单元选择性地将从供给流路供给到多个上游流路的液体供给到多个排出口和返回流路中的一个。

公开(公告)号：US20160240399A1

公开(公告)日：2016-08-18

申请号：US15044452

申请日：2016-02-16

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Kenji KOBAYASHI ,  Jun SAWASHIMA ,  Yuta NISHIMURA ,  Akihiro Nakashima ,  Motoyuki SHIMAI ,  Akito HATANO

IPC: H01L21/67 ,  H01L21/687

CPC classification number: H01L21/6708 ,  H01L21/67017 ,  H01L21/67028 ,  H01L21/67051 ,  H01L21/67109 ,  H01L21/67248

Abstract: A supply flow passage branches into a plurality of upstream flow passages. A plurality of discharge ports are respectively disposed at a plurality of positions differing in distance from a rotational axis of a substrate. Hydrogen peroxide water, that is one of components of a chemical liquid (SPM), is supplied to the upstream flow passage from a component liquid flow passage. A mixing ratio changing unit including a plurality of first flow control valves and a plurality of second flow control valves independently changes mixing ratios of sulfuric acid and hydrogen peroxide water included in the chemical liquid to be discharged from the plurality of discharge ports for each of the upstream flow passages.

Abstract translation: 供给流路分支成多个上游流路。 多个排出口分别设置在与基板的旋转轴线不同的多个位置。 作为化学液体（SPM）的成分之一的过氧化氢水从成分液体流路供给到上游流路。 包括多个第一流量控制阀和多个第二流量控制阀的混合比例改变单元独立地改变从多个排出口排出的药液中包含的硫酸和过氧化氢的混合比， 上游流通道。

公开(公告)号：US20160086810A1

公开(公告)日：2016-03-24

申请号：US14845554

申请日：2015-09-04

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Naozumi FUJIWARA ,  Toru EDO ,  Yuji SUGAHARA ,  Seiji ANO ,  Jun SAWASHIMA

IPC: H01L21/306 ,  H01L21/687 ,  H01L21/67

CPC classification number: H01L21/30604 ,  B08B1/04 ,  B08B3/02 ,  B08B3/024 ,  B08B3/04 ,  H01L21/02052 ,  H01L21/67017 ,  H01L21/67023 ,  H01L21/6704 ,  H01L21/67051 ,  H01L21/6715

Abstract: A substrate processing apparatus includes a rotating holder for a substrate, a first nozzle used to eject a jet flow, a second nozzle used to discharge a continuous flow, and a nozzle moving unit integrally moving the first and second nozzles. A landing position of the continuous flow is located closer to a rotation center than a landing position of the jet flow is. At least movement paths of the landing positions of the jet flow and the continuous flow or flow directions of the continuous flow and the jet flow are different from each other. The movement paths are made to be different from each other by locating the landing position of the continuous flow downstream of the movement path of the landing position of the jet flow. The flow directions are made to be different from each other by tilting the continuous flow.

Abstract translation: 基板处理装置包括用于基板的旋转保持器，用于喷射喷射流的第一喷嘴，用于排出连续流动的第二喷嘴，以及一体地移动第一和第二喷嘴的喷嘴移动单元。 连续流的着陆位置比喷流的着陆位置更靠近旋转中心。 喷射流的着陆位置的至少移动路径和连续流动和喷流的连续流动或流动方向彼此不同。 通过将连续流的着陆位置定位在喷射流的着陆位置的运动路径下游，使运动路径彼此不同。 通过使连续流动倾斜使流动方向彼此不同。

公开(公告)号：US20240042479A1

公开(公告)日：2024-02-08

申请号：US18484154

申请日：2023-10-10

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Takahiro YAMAGUCHI ,  Jun SAWASHIMA ,  Toru ENDO ,  Rikuta AOKI

IPC: B05C11/08 ,  B05D1/00 ,  B05C11/10

CPC classification number: B05C11/08 ,  B05D1/005 ,  B05C11/1002

Abstract: A substrate processing apparatus includes a rotational holding member that rotates a substrate around a predetermined rotational axis while holding the substrate, a liquid supply member that supplies a liquid to the substrate held by the rotational holding member, and a resin-made tubular guard that surrounds the substrate held by the rotational holding member. The tubular guard has an inner peripheral surface and an uneven portion disposed at the inner peripheral surface. The uneven portion has a plurality of recessed portions and a plurality of protruding portions placed between the recessed portions adjacent to each other. The recessed portion has a width smaller than a diameter of a liquid droplet scattering from the substrate held by the rotational holding member and a depth in which the liquid droplet does not come into contact with a bottom portion of the recessed portion in a state in which the liquid droplet is in contact with the protruding portions. The protruding portion has a width that is smaller than the diameter of the liquid droplet and that is smaller than the width of the recessed portion.