公开(公告)号：US20160289839A1

公开(公告)日：2016-10-06

申请号：US15185177

申请日：2016-06-17

Applicant: SCREEN Semiconductor Solutions Co., Ltd.

Inventor： Masahiko HARUMOTO ,  Tadashi MIYAGI ,  Yukihiko INAGAKI ,  Koji KANEYAMA

IPC: C23C16/56 ,  G03F7/32 ,  G03F7/20 ,  C23C16/02 ,  H01L21/033

CPC classification number: C23C16/56 ,  B05C11/00 ,  C23C16/0227 ,  G03F7/0002 ,  G03F7/162 ,  G03F7/20 ,  G03F7/3021 ,  G03F7/32 ,  H01J37/02 ,  H01L21/0335 ,  H01L21/0337 ,  H01L21/0338 ,  H01L21/67115 ,  H01L21/67126 ,  H01L21/6715 ,  H01L21/67178

Abstract: An underlayer is formed to cover the upper surface of a substrate and a guide pattern is formed on the underlayer. A DSA film constituted by two types of polymers is formed in a region on the underlayer where the guide pattern is not formed. Thermal processing is performed while a solvent is supplied to the DSA film on the substrate. Thus, a microphase separation of the DSA film occurs. As a result, patterns made of the one polymer and patterns made of another polymer are formed. Exposure processing and development processing are performed in this order on the DSA film after the microphase separation such that the patterns made of another polymer are removed.

Abstract translation: 形成底层以覆盖基板的上表面，并且在底层上形成引导图案。 在未形成引导图案的底层上的区域中形成由两种类型的聚合物构成的DSA膜。 在向基板上的DSA膜供给溶剂的同时进行热处理。 因此，发生DSA膜的微相分离。 结果，形成由一种聚合物制成的图案和由另一种聚合物制成的图案。 在微相分离之后，在DSA膜上依次进行曝光处理和显影处理，从而除去由另一种聚合物制成的图案。

公开(公告)号：US20180044795A1

公开(公告)日：2018-02-15

申请号：US15794416

申请日：2017-10-26

Applicant: SCREEN Semiconductor Solutions Co., Ltd.

Inventor： Masahiko HARUMOTO ,  Tadashi MIYAGI ,  Yukihiko INAGAKI ,  Koji KANEYAMA

IPC: C23C16/56 ,  H01L21/033 ,  G03F7/32 ,  G03F7/20 ,  B05C11/00 ,  G03F7/30 ,  G03F7/16 ,  G03F7/00 ,  H01L21/67 ,  H01J37/02 ,  C23C16/02

CPC classification number: C23C16/56 ,  B05C11/00 ,  C23C16/0227 ,  G03F7/0002 ,  G03F7/162 ,  G03F7/20 ,  G03F7/3021 ,  G03F7/32 ,  H01J37/02 ,  H01L21/0335 ,  H01L21/0337 ,  H01L21/0338 ,  H01L21/67115 ,  H01L21/67126 ,  H01L21/6715 ,  H01L21/67178

Abstract: An underlayer is formed to cover the upper surface of a substrate and a guide pattern is formed on the underlayer. A DSA film constituted by two types of polymers is formed in a region on the underlayer where the guide pattern is not formed. Thermal processing is performed while a solvent is supplied to the DSA film on the substrate. Thus, a microphase separation of the DSA film occurs. As a result, patterns made of the one polymer and patterns made of another polymer are formed. Exposure processing and development processing are performed in this order on the DSA film after the microphase separation such that the patterns made of another polymer are removed.