公开(公告)号：US09638995B2

公开(公告)日：2017-05-02

申请号：US14199889

申请日：2014-03-06

Applicant: Seagate Technology LLC

Inventor： René van de Veerdonk ,  XiaoMin Yang ,  Kim Lee ,  Justin Hwu

IPC: G03F7/00 ,  B82Y10/00 ,  G11B5/74 ,  G11B5/855

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  G11B5/746 ,  G11B5/855

Abstract: The embodiments disclose a method including depositing a resist layer using a mixture of several different length polymer strings materials spanning a range of natural periodicity, and imprinting the mixture of several different length polymer strings using sheared guiding patterns to increase flexibility.

公开(公告)号：US20140265025A1

公开(公告)日：2014-09-18

申请号：US14199889

申请日：2014-03-06

Applicant: Seagate Technology LLC

Inventor： René van de Veerdonk ,  XiaoMin Yang ,  Kim Lee ,  Justin Hwu

IPC: B29C59/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  G11B5/746 ,  G11B5/855

Abstract: The embodiments disclose a method including depositing a resist layer using a mixture of several different length polymer strings materials spanning a range of natural periodicity, and imprinting the mixture of several different length polymer strings using sheared guiding patterns to increase flexibility.

Abstract translation: 实施方案公开了一种方法，其包括使用几种不同长度的聚合物串材料的混合物沉积抗蚀剂层，该材料跨越一定范围的天然周期，并使用剪切的导向图案印刷几种不同长度的聚合物串的混合物以增加挠性。

公开(公告)号：US09171703B2

公开(公告)日：2015-10-27

申请号：US14137792

申请日：2013-12-20

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： Shuaigang Xiao ,  David Kuo ,  Kim Y. Lee ,  XiaoMin Yang ,  Justin Hwu

IPC: G03F7/26 ,  H01J37/32 ,  C23C16/01 ,  C23C14/34

CPC classification number: H01J37/32651 ,  C23C14/34 ,  C23C16/01 ,  G03F7/0002 ,  G03F7/40 ,  H01J2237/0203 ,  H01J2237/026 ,  H01J2237/3341 ,  H01L21/0337

Abstract: Provided herein is an apparatus, including a patterned resist overlying a substrate; a number of features of the patterned resist, wherein the number of features respectively includes a number of sidewalls; and a sidewall-protecting material disposed about the number of sidewalls, wherein the sidewall-protecting material is characteristic of a conformal, thin-film deposition, and wherein the sidewall-protecting material facilitates a high-fidelity pattern transfer of the patterned resist to the substrate during etching.

Abstract translation: 本文提供了一种装置，包括覆盖衬底的图案化抗蚀剂; 图案化抗蚀剂的许多特征，其中特征的数量分别包括多个侧壁; 以及围绕所述侧壁数量设置的侧壁保护材料，其中所述侧壁保护材料是共形的薄膜沉积的特征，并且其中所述侧壁保护材料促进所述图案化抗蚀剂的高保真图案转移到 衬底。

公开(公告)号：US20150179414A1

公开(公告)日：2015-06-25

申请号：US14137792

申请日：2013-12-20

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： Shuaigang Xiao ,  David Kuo ,  Kim Y. Lee ,  XiaoMin Yang ,  Justin Hwu

IPC: H01J37/32 ,  C23C14/34 ,  C23C16/01

CPC classification number: H01J37/32651 ,  C23C14/34 ,  C23C16/01 ,  G03F7/0002 ,  G03F7/40 ,  H01J2237/0203 ,  H01J2237/026 ,  H01J2237/3341 ,  H01L21/0337

Abstract: Provided herein is an apparatus, including a patterned resist overlying a substrate; a number of features of the patterned resist, wherein the number of features respectively includes a number of sidewalls; and a sidewall-protecting material disposed about the number of sidewalls, wherein the sidewall-protecting material is characteristic of a conformal, thin-film deposition, and wherein the sidewall-protecting material facilitates a high-fidelity pattern transfer of the patterned resist to the substrate during etching.

Abstract translation: 本文提供了一种装置，包括覆盖衬底的图案化抗蚀剂; 图案化抗蚀剂的许多特征，其中特征的数量分别包括多个侧壁; 以及围绕所述侧壁数量设置的侧壁保护材料，其中所述侧壁保护材料是共形的薄膜沉积的特征，并且其中所述侧壁保护材料促进所述图案化抗蚀剂的高保真图案转移到 衬底。