公开(公告)号：US20150356989A1

公开(公告)日：2015-12-10

申请号：US14830534

申请日：2015-08-19

Applicant: Seagate Technology LLC

Inventor： Yuan Xu ,  Kim Y. Lee ,  David S. Kuo ,  Koichi Wago ,  Wei Hu

IPC: G11B5/84

CPC classification number: G11B5/84 ,  G11B5/746 ,  G11B5/855 ,  Y10T428/24479 ,  Y10T428/24802

Abstract: A method for nano-patterning includes imprinting features in a resist with an imprint mold to form one or more topographic surface patterns on the imprinted resist. A block copolymer (“BCP”) material is deposited on the imprinted resist, wherein a molecular dimension L0 of the BCP material correlates by an integer multiple to a spacing dimension of the one or more topographic surface patterns on the imprinted resist. The deposited BCP is annealed and at least a portion of the annealed BCP is removed, forming a template having discrete domains.

Abstract translation: 纳米图案的方法包括在抗蚀剂中用压印模具压印特征以在印刷抗蚀剂上形成一个或多个形貌表面图案。 在印刷抗蚀剂上沉积嵌段共聚物（“BCP”）材料，其中BCP材料的分子尺寸L0与印迹抗蚀剂上的一个或多个形貌表面图案的间隔尺寸相关联。 将沉积的BCP退火，并且去除退火的BCP的至少一部分，形成具有离散区域的模板。

公开(公告)号：US20140308439A1

公开(公告)日：2014-10-16

申请号：US14315307

申请日：2014-06-25

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： Zhaohui Fan ,  Yuan Xu ,  Justin Jia-Jen Hwu ,  Koichi Wago ,  David Shiao-Min Kuo

IPC: G11B5/84 ,  C23C16/513 ,  C23C16/455

CPC classification number: G11B5/8408 ,  C23C16/45525 ,  C23C16/513 ,  G11B5/855 ,  H01F41/32 ,  Y10T428/24802

Abstract: The embodiments disclose a method of protecting patterned magnetic materials of a stack, including depositing a thin continuous film of an inert material that is inert to the magnetic materials of a patterned stack upon which the thin continuous film is being deposited and forming a thin interim interface layer from the thin continuous film to protect top and sidewall areas of non-etched higher relief magnetic islands and magnetic film etched surfaces of the patterned stack from air exposure damage and damage from contact with backfilled materials.

Abstract translation: 这些实施方案公开了一种保护叠层的图案化磁性材料的方法，包括沉积惰性材料的薄连续薄膜，惰性材料对图案化叠层的磁性材料是惰性的，薄膜连续薄膜将沉积在其上并形成薄的临时界面 层，以保护未蚀刻的更高的浮雕磁岛的顶部和侧壁区域以及图案化叠层的磁性膜蚀刻表面从空气暴露损坏和与回填材料接触的损坏。

公开(公告)号：US09460747B2

公开(公告)日：2016-10-04

申请号：US14830534

申请日：2015-08-19

Applicant: Seagate Technology LLC

Inventor： Yuan Xu ,  Kim Y. Lee ,  David S. Kuo ,  Koichi Wago ,  Wei Hu

IPC: G11B5/84 ,  G11B5/74 ,  G11B5/855

CPC classification number: G11B5/84 ,  G11B5/746 ,  G11B5/855 ,  Y10T428/24479 ,  Y10T428/24802

Abstract: A method for nano-patterning includes imprinting features in a resist with an imprint mold to form one or more topographic surface patterns on the imprinted resist. A block copolymer (“BCP”) material is deposited on the imprinted resist, wherein a molecular dimension L0 of the BCP material correlates by an integer multiple to a spacing dimension of the one or more topographic surface patterns on the imprinted resist. The deposited BCP is annealed and at least a portion of the annealed BCP is removed, forming a template having discrete domains.

Abstract translation: 纳米图案的方法包括在抗蚀剂中用压印模具压印特征以在印刷抗蚀剂上形成一个或多个形貌表面图案。 在印刷抗蚀剂上沉积嵌段共聚物（“BCP”）材料，其中BCP材料的分子尺寸L0与印迹抗蚀剂上的一个或多个形貌表面图案的间隔尺寸相关联。 将沉积的BCP退火，并且去除退火的BCP的至少一部分，形成具有离散区域的模板。