HYBRID-GUIDED BLOCK COPOLYMER ASSEMBLY
    6.
    发明申请
    HYBRID-GUIDED BLOCK COPOLYMER ASSEMBLY 有权
    混合型嵌段共聚物组件

    公开(公告)号:US20150356989A1

    公开(公告)日:2015-12-10

    申请号:US14830534

    申请日:2015-08-19

    Abstract: A method for nano-patterning includes imprinting features in a resist with an imprint mold to form one or more topographic surface patterns on the imprinted resist. A block copolymer (“BCP”) material is deposited on the imprinted resist, wherein a molecular dimension L0 of the BCP material correlates by an integer multiple to a spacing dimension of the one or more topographic surface patterns on the imprinted resist. The deposited BCP is annealed and at least a portion of the annealed BCP is removed, forming a template having discrete domains.

    Abstract translation: 纳米图案的方法包括在抗蚀剂中用压印模具压印特征以在印刷抗蚀剂上形成一个或多个形貌表面图案。 在印刷抗蚀剂上沉积嵌段共聚物(“BCP”)材料,其中BCP材料的分子尺寸L0与印迹抗蚀剂上的一个或多个形貌表面图案的间隔尺寸相关联。 将沉积的BCP退火,并且去除退火的BCP的至少一部分,形成具有离散区域的模板。

    METHOD OF FABRICATION OF AN ANISOTROPY MAGNETIC LAYER OF A PATTERNED STACK
    8.
    发明申请
    METHOD OF FABRICATION OF AN ANISOTROPY MAGNETIC LAYER OF A PATTERNED STACK 有权
    方形堆叠的各向异性磁体层的制造方法

    公开(公告)号:US20150017483A1

    公开(公告)日:2015-01-15

    申请号:US14062776

    申请日:2013-10-24

    CPC classification number: G11B5/746 G11B5/855 H01F10/123 H01F41/34

    Abstract: Provided herein is a method including oxidizing tops of features of a patterned magnetic layer to form oxidized tops of the features; removing an excess of an applied first protective material down to at least the oxidized tops of the features to form a planarized layer; and applying a second protective material over the planarized layer.

    Abstract translation: 本文提供了一种方法,包括使图案化磁性层的特征的顶部氧化以形成特征的氧化顶部; 将过量的所施加的第一保护材料除去至少所述特征的氧化顶部以形成平坦化层; 以及在所述平坦化层上施加第二保护材料。

    Dual-imprint pattern for apparatus
    9.
    发明申请
    Dual-imprint pattern for apparatus 审中-公开
    装置的双重印记图案

    公开(公告)号:US20140193538A1

    公开(公告)日:2014-07-10

    申请号:US14160220

    申请日:2014-01-21

    CPC classification number: B29C59/022 G03F7/0002

    Abstract: Provided herein is an apparatus, including an imprint template including a dual-imprint pattern, wherein the dual-imprint pattern is characteristic of imprinting a first pattern on the template with a first template and a second pattern on the template with a second template, and wherein the first pattern and the second pattern at least partially overlap to form the dual-imprint pattern.

    Abstract translation: 本文提供了一种装置,其包括压印模板,其包括双重印记图案,其中所述双印记图案的特征在于,在所述模板上用第一模板和第二模板在第二模板上印刷模板上的第一图案,以及 其中所述第一图案和所述第二图案至少部分地重叠以形成所述双印刷图案。

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