公开(公告)号：US20240213048A1

公开(公告)日：2024-06-27

申请号：US18391661

申请日：2023-12-21

申请人： SEMES CO., LTD.

发明人： Jongwha Kang ,  Sunwook Jung ,  Wooram Lee ,  Byoungdoo Choi ,  Arah Cho ,  Dongwoon Park

IPC分类号： H01L21/67 ,  H01L21/677

CPC分类号： H01L21/67051 ,  H01L21/6719 ,  H01L21/67225 ,  H01L21/67742

摘要： A substrate processing apparatus includes a processing unit including a processing vessel with an internal space and a support unit configured to support a substrate and rotate the substrate in a first rotation direction in the internal space, and an exhaust unit configured to exhaust a gas from the internal space, wherein the exhaust unit includes an exhaust pipe providing an exhaust path for the gas exhausted from the internal space, and one or more connectors connecting the processing vessel to the exhaust pipe, and one end of the exhaust pipe is closed, and an open outlet is formed at a remaining end of the exhaust pipe to discharge the gas.

公开(公告)号：US20230314948A1

公开(公告)日：2023-10-05

申请号：US18108655

申请日：2023-02-12

申请人： SEMES CO., LTD.

发明人： Youngjun Son ,  Byoungdoo Choi

IPC分类号： G03F7/16

CPC分类号： G03F7/162

摘要： Provided are a nozzle having a double pipe structure in which multi-suck-back is possible without driving a nozzle arm, and also, a reduced resist consumption (RRC) operation and a nozzle tip rinsing operation are possible without moving the nozzle arm, and a photoresist (PR) dispenser and a spin coater, each including the nozzle. The nozzle includes an inner pipe having a conical shape gradually narrowing downward, through which PR is transferred, and having a tip through which the PR is ejected, and an outer pipe surrounding the inner pipe, having a conical shape gradually narrowing downward, through which thinner is transferred, and having a tip through which the thinner is ejected, wherein the nozzle is coupled to a nozzle arm and moved, and multi-suck-back is performed without driving the nozzle arm.

公开(公告)号：US11148150B2

公开(公告)日：2021-10-19

申请号：US16659355

申请日：2019-10-21

申请人： SEMES CO., LTD.

发明人： Byoungdoo Choi ,  Yangyeol Ryu ,  Dong Sub Oh ,  Hye Bin Baek

IPC分类号： B05B1/04 ,  B05B1/34 ,  B05C5/02 ,  B05C5/00

摘要： The inventive concept relates to a liquid dispensing nozzle and an apparatus for treating a substrate. The liquid dispensing nozzle includes a first fluid channel that is formed in the nozzle and through which a processing liquid flows and a second fluid channel in communication with the first fluid channel, the second fluid channel being connected to a dispensing end of the nozzle. The second fluid channel has a larger width than the first fluid channel, and a central axis of the first fluid channel and a central axis of the second fluid channel are connected with each other in a straight line.