公开(公告)号：US20210159092A1

公开(公告)日：2021-05-27

申请号：US16951718

申请日：2020-11-18

Applicant: SEMES CO., LTD.

Inventor： Jung Suk GOH ,  Sun Mi KIM ,  Ji Su HONG ,  Kuk Saeng KIM ,  Cheng Bin CUI ,  Pil Kyun HEO

IPC: H01L21/67 ,  B08B3/04

Abstract: Disclosed is a substrate treatment apparatus. The apparatus includes a support unit that supports and rotates a substrate and a spray unit equipped with one or more nozzles to spray a dual fluid that is a mixture of a cleaning agent and carbon dioxide onto the substrate.

公开(公告)号：US20230343610A1

公开(公告)日：2023-10-26

申请号：US18215128

申请日：2023-06-27

Applicant: SEMES CO., LTD.

Inventor： Jung Suk GOH ,  Sun Mi KIM ,  Ji Su HONG ,  Kuk Saeng KIM ,  Cheng Bin CUI ,  Pil Kyun HEO

IPC: H01L21/67 ,  B08B3/04

CPC classification number: H01L21/6708 ,  B08B3/041 ,  H01L21/67253

Abstract: Disclosed is a substrate treatment apparatus. The apparatus includes a support unit that supports and rotates a substrate and a spray unit equipped with one or more nozzles to spray a dual fluid that is a mixture of a cleaning agent and carbon dioxide onto the substrate.

公开(公告)号：US20210134614A1

公开(公告)日：2021-05-06

申请号：US17079445

申请日：2020-10-24

Applicant: SEMES CO., LTD.

Inventor： Young Dae CHUNG ,  Won Geun KIM ,  Jee Young LEE ,  Ji Hoon JEONG ,  Tae Shin KIM ,  Jung Suk GOH ,  Cheng Bin CUI ,  Ye Rim YEON

IPC: H01L21/67

Abstract: A substrate treatment apparatus includes a substrate support unit, a chemical supply unit supplying a chemical solution onto an upper surface of a substrate supported on the substrate support unit, a laser irradiation unit applying a laser pulse to the substrate to heat the substrate, and a controller controlling the laser irradiation unit to emit the laser pulse such that the substrate is repeatedly heated and cooled to maintain a preset temperature.