公开(公告)号：US20230133714A1

公开(公告)日：2023-05-04

申请号：US17976996

申请日：2022-10-31

Applicant: SEMES CO., LTD.

Inventor： Dong Uk KIM ,  In Hoe KIM ,  Hyoung Kyu SON

IPC: H01J37/32 ,  H01L21/67

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a chamber having an inner space; a separation unit provided at the inner space and configured to be combined with the chamber to divide the inner space into a plurality of treating spaces and a transfer space; a plurality of support units provided at each of the plurality of treating spaces and configured to support a substrate; a plurality of gas supply units provided at each of the plurality of treating spaces and configured to supply a process gas to the substrate supported on the plurality of support units; and a transfer unit provided at the transfer space and configured to transfer the substrate between the plurality of treating spaces.

公开(公告)号：US20250003536A1

公开(公告)日：2025-01-02

申请号：US18607484

申请日：2024-03-17

Applicant: SEMES CO., LTD.

Inventor： Joon Hee LEE ,  Wook Sang JANG ,  Dong Uk KIM

IPC: F16L23/22 ,  F16J15/10 ,  H01J37/32 ,  H01L21/683

Abstract: Proposed are a sealing member that prevents fluid leakage even in a cryogenic environment, a fluid supplying device including the sealing member, and a substrate processing apparatus including the fluid supplying device. A sealing member according to an embodiment includes a sealing jacket having a ring shape, an upper O-ring mounted on an upper surface of the sealing jacket, a lower O-ring mounted on a lower surface of the sealing jacket, and a pressure ring inserted into a receiving portion of the sealing jacket and pressing the upper surface and the lower surface.

公开(公告)号：US20250140533A1

公开(公告)日：2025-05-01

申请号：US18796952

申请日：2024-08-07

Applicant: SEMES CO., LTD.

Inventor： Soon Cheon CHO ,  Joon Hee LEE ,  Kyung Hwa JUNG ,  Ji Chul KANG ,  Jung Hoon PARK ,  Dong Uk KIM

IPC: H01J37/32 ,  H01L21/683

Abstract: Disclosed are a substrate support device and a method of controlling prevention of leakage of temperature control fluid. In a substrate support device that controls temperature through supply of temperature control fluid, a sealing member configured to be actively controlled in volume expansion taking into consideration a difference in coefficient of expansion between a fluid supply block supplying the temperature control fluid and an electrostatic chuck due to the materials thereof is employed, thereby preventing leakage of the temperature control fluid.

公开(公告)号：US20240404793A1

公开(公告)日：2024-12-05

申请号：US18413805

申请日：2024-01-16

Applicant: SEMES CO., LTD.

Inventor： Wook Sang JANG ,  Jae Woong SIM ,  Dong Uk KIM ,  In Hoe KIM

IPC: H01J37/32

Abstract: Disclosed are a substrate treating apparatus and a fluid supply unit that reduce the outer diameter while preventing condensation from occurring even without wrapping a pipe supplying a refrigerant with a heat insulating material. The substrate treating apparatus includes: a process chamber having a treatment space for treating a substrate; an inner pipe connected to the process chamber and for supplying a heat exchange fluid to an interior of the process chamber; a cooler connected to the inner pipe, and for cooling the heat exchange fluid and supplying the cooled heat exchange fluid to the inner pipe; an outer pipe disposed on an outer side of the inner pipe while surrounding the inner pipe to form a suction space between the inner pipe and the outer pipe; an intake part connected to the suction space, and for sucking the suction space; and a spacing maintaining part disposed in the suction space, and for maintaining a spacing distance between the inner pipe and the outer pipe.