公开(公告)号：US20230369018A1

公开(公告)日：2023-11-16

申请号：US18310740

申请日：2023-05-02

Applicant: SEMES CO., LTD.

Inventor： Sangjeong LEE ,  Youngun Bong ,  Yoonseok Choi ,  Jaewon Shin ,  Hanlim Kang ,  Jongwon Park ,  Hyunwoo Jo ,  Kyunghun Jang

IPC: H01J37/32

CPC classification number: H01J37/32119 ,  H01J37/3244 ,  H01J37/32091

Abstract: There is provided a substrate processing apparatus including a chamber having a processing space therein, a dielectric window arranged at an upper portion of the chamber and configured to cover an upper surface of the chamber, and an RF source disposed on the dielectric window and configured to supply RF power to generate plasma from gas in the processing space, wherein the RF source includes an RF electrode disposed on the dielectric window and an RF plate disposed on the RF electrode, the dielectric window includes a groove extending vertically downward from an uppermost surface of the dielectric window, and the RF plate has a ring shape.

公开(公告)号：US20230402983A1

公开(公告)日：2023-12-14

申请号：US18129735

申请日：2023-03-31

Applicant: SEMES CO., LTD.

Inventor： Yoonseok Choi ,  Hanlim Kang ,  Hyunwoo Jo ,  Sangjeong Lee

IPC: H03H1/00 ,  H01L21/306 ,  H01L21/3065 ,  H01L21/311

CPC classification number: H03H1/00 ,  H01L21/30621 ,  H01L21/3065 ,  H01L21/31122 ,  H01L21/31138

Abstract: Provided is a system including a microwave source configured to generate microwaves, a branch apparatus including an input port connected to the microwave source, first and second chambers configured to process a wafer by using the microwaves, a first filter configured to transfer the microwaves to or cut off the microwaves from the first chamber, and connected to a first output port of the branch apparatus, and a second filter configured to transfer the microwaves to or cut off the microwaves from the second chamber, and connected to a second output port of the branch apparatus.