公开(公告)号：US11887866B2

公开(公告)日：2024-01-30

申请号：US16657983

申请日：2019-10-18

Applicant: SEMES CO., LTD.

Inventor： Jae Seong Lee ,  Hae Won Choi ,  Ki Hoon Choi ,  Anton Koriakin ,  Chan Young Heo ,  Do Heon Kim ,  Ji Soo Jeon

IPC: H01L21/67 ,  B08B3/04

CPC classification number: H01L21/67028 ,  B08B3/04 ,  H01L21/67126

Abstract: A supercritical processing apparatus includes an upper vessel including a first fluid hole formed in a center thereof, and a lower vessel including a second fluid hole formed in a center thereof. A space is defined between the upper and lower vessels and configured to allow a substrate to be placed therein. The upper vessel further includes a first guide portion provided at a lower portion thereof to be gradually inclined downward toward a periphery thereof from the first fluid hole.