公开(公告)号：US20250096018A1

公开(公告)日：2025-03-20

申请号：US18811189

申请日：2024-08-21

Applicant: SEMES CO., LTD.

Inventor： Changhwa JEONG ,  Jungsoo LEE ,  Youngkyu OH ,  Chungoh HONG ,  Jiyun AHN

IPC: H01L21/67 ,  H01L21/677 ,  H01L21/68

Abstract: A substrate processing apparatus includes an loading stage configured to receive first and second substrates and including a first substrate alignment portion for aligning the first substrate and a second substrate alignment portion for aligning the second substrate, the first substrate alignment portion being spaced apart from the first substrate alignment portion; an coating stage configured to sequentially receive the first substrate and the second substrate from the loading stage and including a first discharge nozzle for discharging a first chemical solution onto the first substrate and a second discharge nozzle for discharging a second chemical solution onto the second substrate; and an unloading stage configured to sequentially unload the first substrate and the second substrate from the coating stage.

公开(公告)号：US20240145264A1

公开(公告)日：2024-05-02

申请号：US18496224

申请日：2023-10-27

Applicant: SEMES CO., LTD.

Inventor： Sungho KIM ,  Jungsoo LEE ,  Hyekyoung KIM

IPC: H01L21/67

CPC classification number: H01L21/67034 ,  H01L21/67017

Abstract: An apparatus for processing a substrate may include a drying chamber configured to dry at least two divided substrates from an original substrate, the drying chamber may have a drying space where the at least two divided substrates disposed therein. The apparatus for processing a substrate may include a dryness compensation part configured to compensate a difference of drynesses of chemical liquids coated on the at least two divided substrates such that the chemical liquids coated on the at least two divided substrates has a substantially same dryness.