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1.
公开(公告)号:US12278121B2
公开(公告)日:2025-04-15
申请号:US16986418
申请日:2020-08-06
Applicant: SEMES CO., LTD.
Inventor: Kangseop Yun , Seung Hoon Oh , Ye Jin Choi , Youngil Lee , Byungsun Bang , Jungbong Choi , Gui Su Park
IPC: H01L21/67 , H01L21/687
Abstract: The inventive concept provides a support unit for supporting a substrate. The support unit includes a support plate that has an interior space and on which the substrate is placed, a heating member that is provided in the interior space and that heats the substrate placed on the support plate, a heat insulating plate provided in the interior space and disposed under the heating member, a reflective plate provided in the interior space and disposed under the heat insulating plate, and a heat dissipation plate provided in the interior space and disposed under the a reflective plate.
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公开(公告)号:US11961748B2
公开(公告)日:2024-04-16
申请号:US17380339
申请日:2021-07-20
Applicant: SEMES CO., LTD.
Inventor: Kangseop Yun , Youngil Lee , Jungbong Choi
IPC: H01L21/67 , H01L21/687
CPC classification number: H01L21/67115 , H01L21/6708 , H01L21/68714
Abstract: A support unit for supporting a substrate includes a heating member and a reflector, and the reflector includes a curved surface that reflects thermal energy generated by the heating member toward an edge region of the substrate.
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3.
公开(公告)号:US11798822B2
公开(公告)日:2023-10-24
申请号:US17061629
申请日:2020-10-02
Applicant: SEMES CO., LTD.
Inventor: Ye Jin Choi , Daehun Kim , Kangseop Yun
IPC: H01L21/67
CPC classification number: H01L21/67115 , H01L21/6715 , H01L21/67109
Abstract: Disclosed is a support unit for supporting a substrate. The support unit includes a support plate having an inner space defined therein, a heating member disposed in the inner space and emitting light for heating the substrate supported on the support unit, and a reflective member disposed along an edge region of the support plate and reflecting thermal energy of the light to an edge region of the substrate supported on the support unit.
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公开(公告)号:US11765793B2
公开(公告)日:2023-09-19
申请号:US16932286
申请日:2020-07-17
Applicant: SEMES CO., LTD.
Inventor: Muhyeon Lee , Gui Su Park , Byungsun Bang , Jungbong Choi , Youngil Lee , Kangseop Yun , Seung Eun Na , Ye Jin Choi , Kyounghwan Kim
IPC: H05B3/06 , H01L21/683 , H01L21/67 , H05B3/00 , H01L21/687
CPC classification number: H05B3/0047 , H01L21/6708 , H01L21/683 , H01L21/68714 , H05B3/06 , H01L21/67 , H01L21/67005 , H01L21/67115
Abstract: An apparatus for treating a substrate includes a process chamber having a treatment space defined therein, a support unit for supporting the substrate in the treatment space, a liquid supply unit for supplying treating liquid to the substrate supported on the support unit, and a heating unit disposed in the support unit for heating the substrate supported on the support unit, wherein the heating unit includes a plurality of lamps to heat the substrate, and a window disposed above the lamps to transmit light emitted from the lamps, wherein the window includes a base in a form of a plate, and light adjustment means formed on the base to spread or converge light emitted from the lamps.
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