公开(公告)号：US11765793B2

公开(公告)日：2023-09-19

申请号：US16932286

申请日：2020-07-17

Applicant: SEMES CO., LTD.

Inventor： Muhyeon Lee ,  Gui Su Park ,  Byungsun Bang ,  Jungbong Choi ,  Youngil Lee ,  Kangseop Yun ,  Seung Eun Na ,  Ye Jin Choi ,  Kyounghwan Kim

IPC: H05B3/06 ,  H01L21/683 ,  H01L21/67 ,  H05B3/00 ,  H01L21/687

CPC classification number: H05B3/0047 ,  H01L21/6708 ,  H01L21/683 ,  H01L21/68714 ,  H05B3/06 ,  H01L21/67 ,  H01L21/67005 ,  H01L21/67115

Abstract: An apparatus for treating a substrate includes a process chamber having a treatment space defined therein, a support unit for supporting the substrate in the treatment space, a liquid supply unit for supplying treating liquid to the substrate supported on the support unit, and a heating unit disposed in the support unit for heating the substrate supported on the support unit, wherein the heating unit includes a plurality of lamps to heat the substrate, and a window disposed above the lamps to transmit light emitted from the lamps, wherein the window includes a base in a form of a plate, and light adjustment means formed on the base to spread or converge light emitted from the lamps.

公开(公告)号：US10453672B2

公开(公告)日：2019-10-22

申请号：US15297728

申请日：2016-10-19

Applicant: SEMES CO., LTD.

Inventor： Byungsun Bang ,  Junhee Youn ,  Kilsung Kwon

IPC: B08B3/14 ,  H01L21/02 ,  B01D19/00 ,  B08B3/08 ,  B08B3/10 ,  C02F1/20 ,  H01L21/67 ,  C02F103/34

Abstract: Disclosed are a dissolved ozone removal unit that removes dissolved ozone from liquid, an apparatus for treating a substrate, a method of removing dissolved ozone, and a method of cleaning a substrate. The method of removing dissolved ozone in liquid includes supplying micro bubbles to the liquid, and allowing dissolved ozone to exit from the liquid by energy or radical ions that are generated while the micro bubbles are dissolved in the liquid.

公开(公告)号：US20210066077A1

公开(公告)日：2021-03-04

申请号：US17004079

申请日：2020-08-27

Applicant: SEMES CO., LTD.

Inventor： Byungsun Bang ,  Youngil Lee

IPC: H01L21/02 ,  H01L21/67

Abstract: The inventive concept relates to a method for treating a substrate. In an embodiment, a method for etching a substrate having a silicon nitride layer includes etching the silicon nitride layer by dispensing a first treatment liquid having a set temperature and a set concentration onto the substrate heated to a set temperature, in which a second treatment liquid is additionally dispensed for a set period of time in an overlapping manner while the first treatment liquid is dispensed in the silicon nitride layer etching process.

公开(公告)号：US20180337070A1

公开(公告)日：2018-11-22

申请号：US15979956

申请日：2018-05-15

Applicant: SEMES CO., LTD.

Inventor： Byungsun Bang ,  Buyoung Jung ,  Jungbong Choi ,  Bong Joo Kim ,  Youngil Lee ,  Gil Hun Song ,  Gui Su Park ,  Kwang Ryul Kim ,  Kwang-Seop Lee ,  Jin Tack Yu

IPC: H01L21/67 ,  H01L21/02 ,  B08B7/00 ,  B08B3/04 ,  B08B3/08 ,  B08B7/04 ,  C03C23/00 ,  B23K26/402

CPC classification number: H01L21/67028 ,  B08B3/041 ,  B08B3/08 ,  B08B7/0042 ,  B08B7/04 ,  B23K26/402 ,  C03C23/0025 ,  H01L21/0206 ,  H01L21/0217

Abstract: Disclosed are a substrate treating apparatus and a substrate treating method. The substrate treating method includes removing a portion of the thin film by irradiating a laser to the substrate, and after the removing of the portion of the thin film, removing the remaining portion of the thin film by supplying a chemical to the substrate.

公开(公告)号：US11745291B2

公开(公告)日：2023-09-05

申请号：US16862086

申请日：2020-04-29

Applicant: SEMES CO., LTD.

Inventor： Ohyeol Kwon ,  Jun Keon Ahn ,  Byungsun Bang

IPC: B23K26/362 ,  G02B27/14 ,  G02B27/09 ,  G02B26/10 ,  B23K26/06 ,  B23K26/082 ,  B23K26/402 ,  B23K26/0622 ,  B23K103/00

CPC classification number: B23K26/362 ,  B23K26/0604 ,  B23K26/0622 ,  B23K26/0626 ,  B23K26/082 ,  B23K26/402 ,  G02B26/10 ,  G02B27/09 ,  G02B27/14 ,  B23K2103/42 ,  B23K2103/54

Abstract: An apparatus includes a support unit supporting a substrate including a film, a laser generation unit that generates a laser beam to process the film, a beam splitter that splits the laser beam into a first laser beam travelling along a first path toward an upper edge of the substrate and a second laser beam travelling along a second path toward a lower edge of the substrate, a first beam shaping unit on the first path shaping the first laser beam, a second beam shaping unit on the second path shaping the second laser beam, a first beam scanning unit downstream of the first beam shaping unit that applies the first laser beam to the upper edge in the manner of scanning, and a second beam scanning unit downstream of the second beam shaping unit that applies the second laser beam to the lower edge in the manner of scanning.

公开(公告)号：US10758875B2

公开(公告)日：2020-09-01

申请号：US15856197

申请日：2017-12-28

Applicant: SEMES CO., LTD.

Inventor： Byungsun Bang ,  Jin Tack Yu ,  Youngjun Choi ,  Jonghan Kim ,  Young Jin Jang

IPC: B01F3/22 ,  B08B3/08 ,  H01L21/67 ,  B01F3/08 ,  B08B3/02 ,  B08B3/10 ,  B05B1/34 ,  B01F5/00 ,  B05B7/04

Abstract: Disclosed are an apparatus and a method for liquid-treating a substrate. The substrate treating apparatus includes a liquid supply unit configured to supply a treatment liquid in which a first liquid and a second liquid are mixed, onto the substrate unit, wherein the liquid supply unit includes a nozzle configured to discharge the treatment liquid, a first liquid supply line supplying the first liquid to the nozzle, and a second liquid supply supplying the second liquid to the nozzle, and the nozzle includes a body having a mixing space in which the first liquid and the second liquid are mixed and a buffer space extending from the mixing space, in the interior thereof, and a collision member located in the buffer space and configured to decrease a flow velocity of the treatment liquid supplied to the buffer space.

公开(公告)号：US12278121B2

公开(公告)日：2025-04-15

申请号：US16986418

申请日：2020-08-06

Applicant: SEMES CO., LTD.

Inventor： Kangseop Yun ,  Seung Hoon Oh ,  Ye Jin Choi ,  Youngil Lee ,  Byungsun Bang ,  Jungbong Choi ,  Gui Su Park

IPC: H01L21/67 ,  H01L21/687

Abstract: The inventive concept provides a support unit for supporting a substrate. The support unit includes a support plate that has an interior space and on which the substrate is placed, a heating member that is provided in the interior space and that heats the substrate placed on the support plate, a heat insulating plate provided in the interior space and disposed under the heating member, a reflective plate provided in the interior space and disposed under the heat insulating plate, and a heat dissipation plate provided in the interior space and disposed under the a reflective plate.

公开(公告)号：US11000879B2

公开(公告)日：2021-05-11

申请号：US15603188

申请日：2017-05-23

Applicant: SEMES CO., LTD.

Inventor： Byungsun Bang

IPC: B05D3/06 ,  H01L21/67 ,  H01L21/02 ,  B05C9/14 ,  B05C11/08 ,  B05C11/10 ,  B05C21/00 ,  B05D3/02 ,  B05D3/10 ,  B05D5/08 ,  B05D1/00

Abstract: Provided is a method and apparatus for treating a substrate with a liquid. The substrate treating method comprises a pre-treating step for supplying the treatment liquid containing hydrogen fluoride (HF) to the substrate and treating the substrate before the surface modification step and a surface modification step for supplying an alkene-based chemical onto a substrate to change the surface of the substrate to a hydrophobic state. As a result, the surface of the substrate is uniform, and generation of particles can be reduced when the substrate is removed.

公开(公告)号：US10825699B2

公开(公告)日：2020-11-03

申请号：US16224891

申请日：2018-12-19

Applicant: SEMES CO., LTD.

Inventor： Buyoung Jung ,  Jonghan Kim ,  Young Jin Jang ,  Jin Tack Yu ,  Youngjun Choi ,  Daehun Kim ,  Byungsun Bang ,  Jonghyeon Woo ,  Heehwan Kim ,  Cheol-Yong Shin ,  Gui Su Park

IPC: H01L21/67 ,  H01L21/683

Abstract: Disclosed are a standby port and a substrate processing apparatus having the same. The standby port exhausts fumes generated when a processing liquid is discharged into the standby port before the supply of the processing liquid onto a substrate, thereby preventing pollution of a chamber atmosphere.