公开(公告)号：US10283390B2

公开(公告)日：2019-05-07

申请号：US15167414

申请日：2016-05-27

Applicant: Semes Co., Ltd.

Inventor： Daehun Kim ,  Gui Su Park

IPC: H01L21/677 ,  H01L21/67

Abstract: An apparatus for processing a substrate includes a load port on that a substrate transfer container accommodating a substrate is laid, a processing part configured to process a substrate, and an index part including an index robot configured to carry a substrate between the substrate transfer container and the processing part, wherein the processing part includes a first transfer chamber configured to have a first main carrying robot carrying a substrate and disposed adjacent to the index part, a second transfer chamber configured to have a second main carrying robot carrying a substrate and disposed adjacent to the first transfer chamber, and a shuttle buffer part configured to move between the first transfer chamber and the second transfer chamber for transferring a substrate between the second main carrying robot and the index robot.

公开(公告)号：US10825699B2

公开(公告)日：2020-11-03

申请号：US16224891

申请日：2018-12-19

Applicant: SEMES CO., LTD.

Inventor： Buyoung Jung ,  Jonghan Kim ,  Young Jin Jang ,  Jin Tack Yu ,  Youngjun Choi ,  Daehun Kim ,  Byungsun Bang ,  Jonghyeon Woo ,  Heehwan Kim ,  Cheol-Yong Shin ,  Gui Su Park

IPC: H01L21/67 ,  H01L21/683

Abstract: Disclosed are a standby port and a substrate processing apparatus having the same. The standby port exhausts fumes generated when a processing liquid is discharged into the standby port before the supply of the processing liquid onto a substrate, thereby preventing pollution of a chamber atmosphere.

公开(公告)号：US11798822B2

公开(公告)日：2023-10-24

申请号：US17061629

申请日：2020-10-02

Applicant: SEMES CO., LTD.

Inventor： Ye Jin Choi ,  Daehun Kim ,  Kangseop Yun

IPC: H01L21/67

CPC classification number: H01L21/67115 ,  H01L21/6715 ,  H01L21/67109

Abstract: Disclosed is a support unit for supporting a substrate. The support unit includes a support plate having an inner space defined therein, a heating member disposed in the inner space and emitting light for heating the substrate supported on the support unit, and a reflective member disposed along an edge region of the support plate and reflecting thermal energy of the light to an edge region of the substrate supported on the support unit.