公开(公告)号：US20220189795A1

公开(公告)日：2022-06-16

申请号：US17547182

申请日：2021-12-09

Applicant: SEMES CO., LTD.

Inventor： SANG MIN LEE ,  YOUNG HUN LEE ,  MYUNG SEOK CHA

IPC: H01L21/67

Abstract: The inventive concept provides a temperature controlling method. The temperature controlling method for controlling a temperature of a tank storing a treating fluid transferred to the chamber, comprises supplying the treating fluid to the inner space of the tank, heating the treating fluid at the inner space, and transferring the heated treating fluid to the chamber, wherein the temperature of the inner space is controlled based on a measured pressure of the inner space.

公开(公告)号：US20220178446A1

公开(公告)日：2022-06-09

申请号：US17544950

申请日：2021-12-08

Applicant: SEMES CO., LTD.

Inventor： SEUNG HOON OH ,  SANG MIN LEE ,  JONG DOO LEE ,  JIN MO JAE ,  YOUNG HUN LEE

IPC: F16J15/3204 ,  B08B7/00

Abstract: A sealing member for use in sealing a chamber for treating a substrate, the sealing member inserted in a groove formed in the chamber, includes a bottom part, a top part opposite the bottom part, an inner part connecting a first side of the bottom part to the top part, an outer part opposite the inner part and connecting a second side of the bottom part to the top part, and a recessed portion between the top part and the outer part.

公开(公告)号：US20220406624A1

公开(公告)日：2022-12-22

申请号：US17837135

申请日：2022-06-10

Applicant: SEMES CO., LTD.

Inventor： MYUNG SEOK CHA ,  SANG MIN LEE ,  JIN WOO JUNG ,  DO HYEON YOON

IPC: H01L21/67 ,  H01L21/02 ,  C23C16/44

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a chamber providing an inner space; a fluid supply unit configured to supply a treating fluid to the inner space; and a fluid exhaust unit configured to exhaust the treating fluid from the inner space, and wherein the fluid exhaust unit includes: an exhaust line connected to the chamber; and a pressure adjusting member installed at the exhaust line and configured to maintain a pressure of the inner space to a set pressure, and wherein the fluid supply unit includes: a fluid supply source; and a supply line provided between the fluid supply source and the chamber, and wherein at the supply line or the exhaust line a flow rate measuring member configured to measure a flow rate per unit time of the treating fluid flowing at the inner space is installed.

公开(公告)号：US20220205718A1

公开(公告)日：2022-06-30

申请号：US17564632

申请日：2021-12-29

Applicant: SEMES CO., LTD.

Inventor： SANG MIN LEE ,  SEUNG HOON OH ,  JONG DOO LEE ,  MI SO PARK

IPC: F26B5/00 ,  F26B5/04

Abstract: An apparatus for treating the substrate includes a process chamber having a first body and a second body which are combined with each other to have a treating space in which a substrate is treated, and a friction prevention member placed on a contact surface between the first body and the second body. The friction prevention member may have a groove formed at a surface corresponding to the contact surface. An adhesive for adhering the friction prevention member to the first body or adhering the friction prevention member to the second body may be provided in the groove. The groove may form an open-end pattern in which a first end of the open-end pattern is adjacent to a second end of the open-end pattern.