公开(公告)号：US12125717B2

公开(公告)日：2024-10-22

申请号：US17533348

申请日：2021-11-23

Applicant: SEMES CO., LTD.

Inventor： Ki Sang Eum ,  Jin Ho Choi ,  Byoung Doo Choi ,  Seung Han Lee ,  Sun Wook Jung ,  Si Eun Kim

IPC: H01L21/67 ,  C23C16/44 ,  C23C16/455 ,  H01L21/02 ,  H01L21/687

CPC classification number: H01L21/67051 ,  C23C16/4412 ,  C23C16/45502 ,  H01L21/68764 ,  H01L21/02337

Abstract: An apparatus for treating a substrate, the apparatus comprising: a processing container having an inner space; a support unit having a support plate configured to support and rotate the substrate in the inner space; a liquid supply unit supplying treating liquid to the substrate supported by the support unit; and an exhaust unit exhausting an air flow in the inner space, wherein the processing container includes a bottom wall and a side wall extending from the outside end of the bottom wall, the processing container including a first gas-liquid separator provided at the side wall.

公开(公告)号：US12228861B2

公开(公告)日：2025-02-18

申请号：US17522007

申请日：2021-11-09

Applicant: SEMES CO., LTD.

Inventor： Ki Sang Eum ,  Jin Ho Choi ,  Sun Wook Jung ,  Byoung Doo Choi ,  Hee Man Ahn ,  Si Eun Kim

IPC: G03F7/16 ,  C23C16/458

Abstract: An apparatus for treating a substrate includes a treating vessel having an inner space, a support unit that supports and rotates the substrate in the inner space, and an exhaust unit that releases an air flow in the inner space. The exhaust unit includes an air-flow guide duct into which the air flow is introduced in a tangential direction with respect to a rotating direction of the substrate supported on the support unit.