公开(公告)号：US12255050B2

公开(公告)日：2025-03-18

申请号：US17968179

申请日：2022-10-18

Applicant: SEMES CO., LTD.

Inventor： Yoon Seok Choi ,  Yun Sang Kim ,  Sun Wook Jung

IPC: H01J37/32 ,  H01L21/683 ,  H01Q7/00

Abstract: The inventive concept provides an antenna member. In an embodiment, the antenna member includes a first coil and a second coil which have a rotational symmetry to each other, and wherein the first coil includes a first supply terminal applied with a current and a first ground terminal connected to the ground, the second coil includes a second supply terminal applied with the current and a second ground terminal connected to the ground, and wherein the first coil and the second coil each include a first portion having an arc-shape and a second portion having an arc-shape which as a whole form one winding, and when seen from a side, the second portion has a relatively lower height than the first portion, and the second portion of the second coil is positioned below the first portion of the first coil, and the second portion of the first coil is positioned below the first portion of the second coil.

公开(公告)号：US12125717B2

公开(公告)日：2024-10-22

申请号：US17533348

申请日：2021-11-23

Applicant: SEMES CO., LTD.

Inventor： Ki Sang Eum ,  Jin Ho Choi ,  Byoung Doo Choi ,  Seung Han Lee ,  Sun Wook Jung ,  Si Eun Kim

IPC: H01L21/67 ,  C23C16/44 ,  C23C16/455 ,  H01L21/02 ,  H01L21/687

CPC classification number: H01L21/67051 ,  C23C16/4412 ,  C23C16/45502 ,  H01L21/68764 ,  H01L21/02337

Abstract: An apparatus for treating a substrate, the apparatus comprising: a processing container having an inner space; a support unit having a support plate configured to support and rotate the substrate in the inner space; a liquid supply unit supplying treating liquid to the substrate supported by the support unit; and an exhaust unit exhausting an air flow in the inner space, wherein the processing container includes a bottom wall and a side wall extending from the outside end of the bottom wall, the processing container including a first gas-liquid separator provided at the side wall.

公开(公告)号：US12228861B2

公开(公告)日：2025-02-18

申请号：US17522007

申请日：2021-11-09

Applicant: SEMES CO., LTD.

Inventor： Ki Sang Eum ,  Jin Ho Choi ,  Sun Wook Jung ,  Byoung Doo Choi ,  Hee Man Ahn ,  Si Eun Kim

IPC: G03F7/16 ,  C23C16/458

Abstract: An apparatus for treating a substrate includes a treating vessel having an inner space, a support unit that supports and rotates the substrate in the inner space, and an exhaust unit that releases an air flow in the inner space. The exhaust unit includes an air-flow guide duct into which the air flow is introduced in a tangential direction with respect to a rotating direction of the substrate supported on the support unit.

公开(公告)号：US12140868B2

公开(公告)日：2024-11-12

申请号：US17749437

申请日：2022-05-20

Applicant: SEMES CO., LTD.

Inventor： Sun Wook Jung ,  Ki Sang Eum ,  Jin Ho Choi ,  Byoung Doo Choi ,  Hee Man Ahn

IPC: G03F7/16 ,  B05C11/10

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes substrate treating apparatus comprising: a treating container having an inner space; a support unit configured to support and rotate a substrate within the inner space; an exhaust duct configured to exhaust the inner space; and at least one guide member combined with the treating container and configured to guide an airflow within the inner space, and wherein the at least one guide member is arranged such that the airflow within the inner space obliquely flows with respect to a rotation direction of the substrate supported by the support unit when seen from above.

公开(公告)号：US11656557B2

公开(公告)日：2023-05-23

申请号：US17531941

申请日：2021-11-22

Applicant: SEMES CO., LTD.

Inventor： Ki Sang Eum ,  Jung Yul Lee ,  Sun Wook Jung ,  Yang Yeol Ryu

IPC: G03F7/20

CPC classification number: G03F7/70916

Abstract: An apparatus for treating a substrate includes a processing container having an inner space; a support unit having a support plate configured to support and rotate the substrate in the inner space; a liquid supply unit configured to supply treating liquid to the substrate supported by the support unit; and an exhaust unit configured to exhaust an air flow in the inner space, wherein the exhaust unit includes an air flow guide duct guiding a flow direction of an air flow flowing on the substrate to an outer side of the substrate due to a rotation of the substrate supported by the support unit, and the air flow guide duct having an inlet into which an air flow is introduced, the inlet provided at a substantially same level with the substrate supported by the support unit.

公开(公告)号：US10153137B2

公开(公告)日：2018-12-11

申请号：US15293393

申请日：2016-10-14

Applicant: SEMES CO., LTD.

Inventor： Seok Won Hwang ,  Kisang Eum ,  Sun Wook Jung

IPC: H01J37/32

Abstract: The inventive concepts provide a substrate treating apparatus. The substrate treating apparatus includes a process chamber in which a treatment space is provided, a support unit supporting a substrate in the process chamber, a gas supply unit supplying a gas into the process chamber, and a plasma source generating plasma from the gas. The support unit includes a support plate on which a substrate is loaded, a focus ring disposed to surround the support plate, an electric field adjusting ring disposed under the focus ring, and an actuator vertically moving the electric field adjusting ring.

公开(公告)号：US20170110295A1

公开(公告)日：2017-04-20

申请号：US15293393

申请日：2016-10-14

Applicant: SEMES CO., LTD.

Inventor： Seok Won HWANG ,  Kisang Eum ,  Sun Wook Jung

IPC: H01J37/32

CPC classification number: H01J37/32697 ,  H01J37/3244 ,  H01J37/32642 ,  H01J37/3266 ,  H01J37/32724 ,  H01J2237/1502 ,  H01J2237/151 ,  H01J2237/334

Abstract: The inventive concepts provide a substrate treating apparatus. The substrate treating apparatus includes a process chamber in which a treatment space is provided, a support unit supporting a substrate in the process chamber, a gas supply unit supplying a gas into the process chamber, and a plasma source generating plasma from the gas. The support unit includes a support plate on which a substrate is loaded, a focus ring disposed to surround the support plate, an electric field adjusting ring disposed under the focus ring, and an actuator vertically moving the electric field adjusting ring.