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1.
公开(公告)号:US20230415207A1
公开(公告)日:2023-12-28
申请号:US18328203
申请日:2023-06-02
Applicant: SEMES CO., LTD.
Inventor: Sunghun EOM , Kangsul KIM , Youngjun SON , Seongyeol CHOI
CPC classification number: B08B3/12 , H01L21/67057 , H01L21/02052
Abstract: An apparatus for cleaning a back side of a substrate may include a cleaning assembly which may include a cleaning solution supply part receiving a cleaning solution and an ultrasonic wave supply part applying an ultrasonic wave to the cleaning solution such that a column of the cleaning solution is formed from the cleaning solution supply part toward the back side of the substrate. The back side of the substrate may be cleaned by contacting the column of the cleaning solution with the back side of the substrate.
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2.
公开(公告)号:US20230207336A1
公开(公告)日:2023-06-29
申请号:US18145917
申请日:2022-12-23
Applicant: SEMES CO., LTD.
Inventor: Chulnam KIM , Sunghun EOM , Ickkyun KIM
CPC classification number: H01L21/67023 , H01L22/10 , H01L21/67253
Abstract: An apparatus for processing a substrate may include a chemical liquid discharging part configured to discharge a chemical liquid having a first specific gravity onto a substrate, a chemical liquid supplying part configured to provide the chemical liquid to the chemical liquid discharging part, a fluid supplying part configured to provide a fluid having a second specific gravity different from the first specific gravity, a chemical liquid supplying part configured to provide a chemical liquid having a second specific gravity different from the first specific gravity, and a monitoring port including a trapping part configured to trap the fluid flowing into the chemical liquid supplying part and a sensing part configured to sense an inflow of the fluid. A heat transfer may be generated between the fluid and the chemical liquid such that the chemical liquid has a desired temperature. The fluid may be trapped at a top portion or a bottom portion of the trapping part in accordance with a difference between the first specific gravity and the second specific gravity.
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