公开(公告)号：US20190080902A1

公开(公告)日：2019-03-14

申请号：US16129089

申请日：2018-09-12

Applicant: SEMES CO., LTD.

Inventor： Hae-Won CHOI ,  Ki-Moon KANG ,  Kihoon CHOI ,  Anton KORIAKIN ,  Chan Young HEO ,  Jaeseong LEE ,  Kwon Taek LIM ,  Yong Hun KIM ,  Sang Ho LEE

IPC: H01L21/02 ,  B08B3/08 ,  C09K13/08 ,  C11D7/36 ,  C11D7/50 ,  C11D7/34 ,  C11D11/00 ,  H01L21/687 ,  H01L21/67

Abstract: Disclosed are an anhydrous substrate cleaning composition, a substrate treating method, and a substrate treating apparatus. The anhydrous substrate cleaning composition includes an etching composite that provides fluorine, a solvent that dissolves the etching composite, and a binder that is a composite including phosphorous.