Invention Application
- Patent Title: SUBSTRATE CLEANING COMPOSITION, SUBSTRATE TREATING METHOD, AND SUBSTRATE TREATING APPARATUS
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Application No.: US16129089Application Date: 2018-09-12
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Publication No.: US20190080902A1Publication Date: 2019-03-14
- Inventor: Hae-Won CHOI , Ki-Moon KANG , Kihoon CHOI , Anton KORIAKIN , Chan Young HEO , Jaeseong LEE , Kwon Taek LIM , Yong Hun KIM , Sang Ho LEE
- Applicant: SEMES CO., LTD.
- Applicant Address: KR Cheonan-si
- Assignee: SEMES CO., LTD.
- Current Assignee: SEMES CO., LTD.
- Current Assignee Address: KR Cheonan-si
- Priority: KR10-2017-0117829 20170914; KR10-2018-0106336 20180906
- Main IPC: H01L21/02
- IPC: H01L21/02 ; B08B3/08 ; C09K13/08 ; C11D7/36 ; C11D7/50 ; C11D7/34 ; C11D11/00 ; H01L21/687 ; H01L21/67
Abstract:
Disclosed are an anhydrous substrate cleaning composition, a substrate treating method, and a substrate treating apparatus. The anhydrous substrate cleaning composition includes an etching composite that provides fluorine, a solvent that dissolves the etching composite, and a binder that is a composite including phosphorous.
Public/Granted literature
- US11004675B2 Substrate cleaning composition, substrate treating method, and substrate treating apparatus Public/Granted day:2021-05-11
Information query
IPC分类:
