公开(公告)号：US10357806B2

公开(公告)日：2019-07-23

申请号：US14747287

申请日：2015-06-23

Applicant: SEMES CO., LTD.

Inventor： Jong Han Kim ,  Yoon-Jong Ju ,  Yu Hwan Kim ,  Edwin Lee ,  Seong Soo Lee

IPC: B08B3/02 ,  H01L21/67 ,  B05B17/00 ,  B05B13/02

Abstract: The inventive concepts provide an apparatus for treating a substrate. The apparatus includes a housing proving an inner space in which a substrate is treated, a spin head supporting and rotating the substrate in the housing, an injection unit comprising a first nozzle member spraying a first treatment solution to the substrate put on the spin head, and a controller controlling the first nozzle member. The first nozzle member includes a body, a vibrator, a pump, and a power source.

公开(公告)号：US10186419B2

公开(公告)日：2019-01-22

申请号：US14931004

申请日：2015-11-03

Applicant: Semes Co., Ltd.

Inventor： Kihoon Choi ,  In-Il Jung ,  Seong-Soo Kim ,  Yoon-Jong Ju

IPC: H01L21/02 ,  B24C1/00 ,  H01L21/67 ,  B24C11/00

Abstract: Disclosed is an apparatus and method for treating a substrate. The method includes supplying cleaning particles to the substrate to clean the substrate. The cleaning particles are solid particles. The solid particles provide a shock wave to the substrate.